SCHEMBL1857930

SCHEMBL1857930

C=CCOCC(C)OCC[O]

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.38
CA2 P00918 2/20 0.38
CA9 Q16790 1/20 0.38
CA7 P43166 1/20 0.37
TDP1 Q9NUW8 3/20 0.34
POLB P06746 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
ALDH1A1 P00352 1/20 0.30
PKM P14618 1/20 0.30
CTDSP1 Q9GZU7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21847573 0.82 TDP1 (0.46) CA1CA2CA9CA7TDP1
SCHEMBL827408 0.81 CA1 (0.45) CA1CA2CA9CA7TDP1
SCHEMBL16361587 0.81 CA1 (0.45) CA1CA2CA9CA7TDP1
SCHEMBL17109943 0.81 CA1 (0.41) CA1CA2CA9CA7TDP1
SCHEMBL15998910 0.78 CA1 (0.39) CA1CA2CA9CA7TDP1
SCHEMBL3690008 0.78 CA1 (0.42) CA1CA2CA9CA7TDP1
SCHEMBL365108 0.78 TDP1 (0.35) TDP1
SCHEMBL7524404 0.78 CA1 (0.42) CA1CA2CA9CA7TDP1
SCHEMBL439895 0.78 CA1 (0.42) CA1CA2CA9CA7TDP1
SCHEMBL31626283 0.78 CA1 (0.42) CA1CA2CA9CA7TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11624984-B2 Process liquid composition for extreme ultraviolet lithography and pattern forming method using same YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-04-11 US claimed
US-20210214649-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY, AND METHOD FOR FORMING PATTERN BY USING SAME YCCHEM CO., LTD. (KR) 2021-07-15 US claimed
US-20210088910-A1 PROCESS LIQUID COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2021-03-25 US claimed
CN-112313582-A Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same 荣昌化学制品株式会社 2021-02-02 CN claimed
CN-112272799-A Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same 荣昌化学制品株式会社 2021-01-26 CN claimed
EP-2016108-B1 PREPARATION OF COMB-BRANCHED POLYMERS COATEX SAS (FR) 2011-05-25 EP claimed
EP-2016108-A1 PREPARATION OF COMB-BRANCHED POLYMERS Lyondell Chemical Technology, L.P. (US) 2009-01-21 EP claimed
WO-2007130261-A1 PREPARATION OF COMB-BRANCHED POLYMERS COATEX S.A.S. (FR) 2007-11-15 WO claimed
US-7232875-B1 Preparation of comb-branched polymers LYONDELL CHEMICAL TECHNOLOGY, L.P. (US) 2007-06-19 US claimed
US-6270393-B1 Abrasive slurry and preparation process thereof TDK CORPORATION (JP) 2001-08-07 US claimed
WO-1994024252-A1 A COMPOSITION OF DETERGENT FOR CLOTHING SUNKYONG INDUSTRIES CO., LTD. (KR) 1994-10-27 WO claimed
JP-62280763-A None JP disclosed
WO-2024128300-A1 COSMETIC EMULSION COMPOSITION COMPRISING SPHERICAL HYDROPHOBIC SILICA AEROGEL FOR WATERY FRESH SENSATION L'OREAL (FR) 2024-06-20 WO disclosed
US-11945970-B2 Water repellent composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-04-02 US disclosed
US-20240093119-A1 OIL COMPOUND FOR SILICONE-BASED DEFOAMING AGENTS, METHOD FOR PRODUCING SAME, AND DEFOAMING AGENT CONTAINING OIL COMPOUND FOR SILICONE-BASED DEFOAMING AGENTS DOW TORAY CO., LTD. (JP) 2024-03-21 US disclosed
US-6194513-B1 COMPRISING MIXTURE OF CARBOXYLATED URETHANE POLYMER MIXTURE MADE FROM 2,6-HEXANEDIOL AND 4,4-METHYLENEBIS(CYCLOHEXYLISOCYANATE); HYDROXYLATED METHYLMETHACRYLATE ACRYLIC POLYMER; EPOXYLATED SILANE OLIN CORPORATION 2001-02-27 US disclosed
EP-0926231-A1 Liquid detergent composition and use thereof KAO CORPORATION (JP) 1999-06-30 EP disclosed
US-5688356-A POLYCAPROLACTONEDIOL OR TRIOL, METHYLENE BIS(CYCLOHEXYL ISOCYANATE) WITH DIMETHYLOLPROPIONIC ACID EXTENDED WITH DIAMINES OLIN CORPORATION (US) 1997-11-18 US disclosed
WO-1994024252-A1 A COMPOSITION OF DETERGENT FOR CLOTHING SUNKYONG INDUSTRIES CO., LTD. (KR) 1994-10-27 WO disclosed
JP-S62280763-A ONE COMPONENT DEVELOPING SYSTEM RICOH CO LTD 1987-12-05 JP disclosed