SCHEMBL28348752

SCHEMBL28348752

CCCOC(C)CC(=O)OCC

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.43
GAA P10253 1/20 0.43
SI P14410 1/20 0.43
MGAM2 Q2M2H8 1/20 0.43
ALDH1A1 P00352 7/20 0.40
TRPA1 O75762 1/20 0.40
ALOX15 P16050 3/20 0.38
CYP3A4 P08684 2/20 0.38
TSHR P16473 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
HSD17B10 Q99714 2/20 0.37
CHRM1 P11229 1/20 0.37
ADORA1 P30542 1/20 0.37
CYP1A2 P05177 1/20 0.35
LMNA P02545 2/20 0.34
CYP2D6 P10635 1/20 0.33
KDM4E B2RXH2 1/20 0.33
HTT P42858 1/20 0.33
SOAT1 P35610 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28796546 0.90 NAAA (0.36) ALDH1A1TSHRTDP1CHRM1LMNA
SCHEMBL2943133 0.85 MGAM (0.48) MGAMGAASIMGAM2ALDH1A1
SCHEMBL8574175 0.83 MGAM (0.46) MGAMGAASIMGAM2ALDH1A1
SCHEMBL27251646 0.83 PRKCA (0.33) ALDH1A1LMNA
SCHEMBL12462618 0.83 MGAM (0.39) MGAMGAASIMGAM2ALDH1A1
SCHEMBL11589611 0.82 GAA (0.38) MGAMGAASIMGAM2ALDH1A1
SCHEMBL11656896 0.82 GAA (0.38) MGAMGAASIMGAM2ALDH1A1
SCHEMBL12515882 0.82 MGAM (0.38) MGAMGAASIMGAM2ALDH1A1
SCHEMBL28339170 0.82 TSHR (0.37) MGAMGAASIMGAM2TSHR
SCHEMBL31182143 0.81 L3MBTL1 (0.45) MGAMGAASIMGAM2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108604061-B Cured film and positive photosensitive resin composition 东丽株式会社 2021-07-16 CN disclosed
CN-110730790-B Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same 中央硝子株式会社 2021-06-15 CN disclosed
CN-107272342-B Negative photosensitive resin composition 东友精细化工有限公司 2021-03-05 CN disclosed
CN-107073516-B Method for producing structure having concave pattern, resin composition, method for forming conductive film, electronic circuit, and electronic device JSR株式会社 2020-09-15 CN disclosed
CN-107949876-B Window substrate, method of manufacturing the same, and image display device having the same 东友精细化工有限公司 2020-07-31 CN disclosed
CN-110730790-A Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same 中央硝子株式会社 2020-01-24 CN disclosed
CN-105143977-B Method for producing substrate having concave pattern, composition, method for forming conductive film, electronic circuit, and electronic device JSR株式会社 2020-01-07 CN disclosed
CN-104950578-B Colored photosensitive resin composition and color filter produced therefrom 东友精细化工有限公司 2019-12-06 CN disclosed