Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.64 |
| ▸ | FOLH1 | Q04609 | 11/20 | 0.59 |
| ▸ | NAALAD2 | Q9Y3Q0 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphoric Acid SCHEMBL9456210 | 0.83 | TDP1 (0.74) | TDP1FOLH1CA2CA4MEN1 | |
| SCHEMBL28035961 | 0.83 | FOLH1 (0.55) | TDP1FOLH1NAALAD2CA2CA4 | |
| SCHEMBL165643 | 0.80 | TDP1 (1.00) | TDP1FOLH1LMNATSHR | |
| SCHEMBL17517216 | 0.80 | TDP1 (1.00) | TDP1FOLH1LMNATSHR | |
| SCHEMBL22151 | 0.80 | TDP1 (1.00) | TDP1FOLH1LMNATSHR | |
| SCHEMBL16925719 | 0.80 | TDP1 (1.00) | TDP1FOLH1LMNATSHR | |
| SCHEMBL21409648 | 0.79 | FOLH1 (0.40) | TDP1FOLH1NAALAD2 | |
| Butedronic Acid SCHEMBL645294 | 0.79 | TDP1 (0.59) | TDP1FOLH1NAALAD2CA2CA4 | |
| Cyclopentane SCHEMBL9195149 | 0.78 | TDP1 (0.82) | TDP1FOLH1LMNATSHR | |
| Butedronic Acid SCHEMBL11226134 | 0.77 | TDP1 (0.56) | TDP1FOLH1NAALAD2CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 570 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3956411-B1 | SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | CMC MAT LLC (US) | 2025-12-10 | — | — | EP | claimed |
| CN-119662134-A | Silicon wafer polishing composition and preparation process thereof | 万华化学集团电子材料有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-115851134-B | High-precision silicon wafer polishing composition and application thereof | 万华化学集团电子材料有限公司 | 2024-09-10 | — | — | CN | claimed |
| CN-115785819-B | Silicon wafer polishing composition and application thereof | 万华化学集团电子材料有限公司 | 2024-08-16 | — | — | CN | claimed |
| CN-113710761-B | Surface coated abrasive particles for tungsten polishing applications | CMC材料有限责任公司 | 2024-04-09 | — | — | CN | claimed |
| EP-3692107-B1 | SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | CMC MAT LLC (US) | 2024-02-28 | — | — | EP | claimed |
| CN-116804133-A | Highly hydrophilic polishing composition and preparation method and application thereof | 万华化学集团电子材料有限公司 | 2023-09-26 | — | — | CN | claimed |
| CN-115386300-B | Polishing composition suitable for silicon wafer regeneration, preparation method and application thereof | 万华化学集团电子材料有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-115785819-A | Silicon wafer polishing composition and application thereof | 万华化学集团电子材料有限公司 | 2023-03-14 | — | — | CN | claimed |
| CN-115386300-A | Polishing composition suitable for silicon wafer regeneration, preparation method and application thereof | 万华化学集团电子材料有限公司 | 2022-11-25 | — | — | CN | claimed |
| US-20180371293-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2018-12-27 | — | — | US | claimed |
| US-20180057712-A1 | POLISHING COMPOSITION FOR MAGNETIC DISC SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2018-03-01 | — | — | US | claimed |
| US-20170321086-A1 | POLISHING COMPOSITION FOR MAGNETIC DISC SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2017-11-09 | — | — | US | claimed |
| EP-0541318-B1 | Cooling water treatment composition and method | DIVERSEY CORP (CA) | 1997-10-15 | — | — | EP | claimed |
| EP-0526181-B1 | Controlling mineral deposits in cooling systems | DIVERSEY CORP (CA) | 1997-05-14 | — | — | EP | claimed |
| EP-0541318-A1 | Cooling water treatment composition and method | Diversey Corporation (CA) | 1993-05-12 | — | — | EP | claimed |
| EP-0526181-A1 | Controlling mineral deposits in cooling systems | Diversey Corporation (CA) | 1993-02-03 | — | — | EP | claimed |
| US-RE30064-E | USE OF COLOR DEVELOPER CONTAINING P-PHENYLENEDIAMINE DEVELOPER AND ORGANIC COMPOUND CONTAINING PHOSPHONO AND CARBOXY GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-08-07 | — | — | US | claimed |
| US-4162161-A | SILVER HALIDE, STANNOUS SALT, PHOSPHONOCARBOXYLIC ACID | FUJI PHOTO FILM CO., LTD. (JP) | 1979-07-24 | — | — | US | claimed |
| US-4083723-A | P-PHENYLENEDIAMINE AND DERIVATIVES AND A COMPOUND WITH A CARBOXY AND A PHOSPHONO GROUP AS A COLOR DEVELOPER | FUJI PHOTO FILM CO., LTD. (JA) | 1978-04-11 | — | — | US | claimed |