SCHEMBL10000223

SCHEMBL10000223

Bc1c(F)c(F)c(-c2c(F)c(F)c(-c3c(F)c(F)c(-c4c(F)c(F)c(F)c(F)c4F)c(F)c3F)c(F)c2F)c(F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2623421 1.00
SCHEMBL14596503 1.00
SCHEMBL10445931 0.89
SCHEMBL92145 0.88
Ammonia Solution, Strong SCHEMBL19326625 0.84
Water SCHEMBL7105081 0.84
SCHEMBL15299589 0.83
SCHEMBL14546100 0.79
SCHEMBL7174935 0.78
SCHEMBL14157195 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9720319-B2 Colored composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, image display device, and compound FUJIFILM CORPORATION (JP) 2017-08-01 US disclosed
US-20170153546-A1 PERMANENT DIELECTRIC COMPOSITIONS CONTAINING PHOTOACID GENERATOR AND BASE PROMERUS, LLC (US) 2017-06-01 US disclosed
US-20160376234-A1 COLORING CURABLE RESIN COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, COMPOUND, AND CATION FUJIFILM CORPORATION (JP) 2016-12-29 US disclosed
US-20160216604-A1 COLORED COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2016-07-28 US disclosed
US-9334373-B2 Fire retardant materials and devices including same THE BOARD OF REGENTS OF THE NEVADA SYSTEM OF HIGHER EDUCATION ON BEHALF OF THE UNIVERSITY OF NEVADA, LAS VEGAS (US) 2016-05-10 US disclosed
US-9268222-B2 Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head CANON KABUSHIKI KAISHA (JP) 2016-02-23 US disclosed
US-20140329175-A1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD CANON KABUSHIKI KAISHA (JP) 2014-11-06 US disclosed
US-8865392-B2 Photosensitive resin composition and cured product thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2014-10-21 US disclosed
US-8232331-B2 Nonaqueous ink, ink set, image-forming method, image-forming apparatus and recorded article FUJIFILM CORPORATION (JP) 2012-07-31 US disclosed
US-20120049164-A1 Cross-Linked Hole Transport Layer With Hole Transport Additive UNIVERSAL DISPLAY CORPORATION (US) 2012-03-01 US disclosed