⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8161557 | 0.75 | — | — | |
| SCHEMBL2846075 | 0.75 | — | — | |
| SCHEMBL10420603 | 0.68 | — | — | |
| SCHEMBL15052687 | 0.68 | — | — | |
| SCHEMBL11700376 | 0.67 | — | — | |
| SCHEMBL5665559 | 0.67 | — | — | |
| SCHEMBL30976571 | 0.66 | — | — | |
| SCHEMBL5177665 | 0.66 | — | — | |
| SCHEMBL13089 | 0.64 | — | — | |
| SCHEMBL3582156 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115598925-A | Composition for optical sensor, and solid-state imaging element and camera module using the optical sensor | JSR株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-113121779-B | Biperfluor branched ether chain oxetane series fluorine-containing polymer and preparation method thereof | 南京理工大学 | 2022-06-28 | — | — | CN | disclosed |
| CN-113121779-A | Biperfluor branched ether chain oxetane series fluorine-containing polymer and preparation method thereof | 南京理工大学 | 2021-07-16 | — | — | CN | disclosed |
| WO-2021065908-A1 | METHOD FOR PRODUCING PROPIONIC ACID DERIVATIVE | ダイキン工業株式会社 | 2021-04-08 | — | — | WO | disclosed |
| CN-110850680-A | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2020-02-28 | — | — | CN | disclosed |
| CN-104871089-B | Photosensitive resin composition, method for producing cured film, organic EL display device, and liquid crystal display device | 富士胶片株式会社 | 2020-01-14 | — | — | CN | disclosed |
| US-9012129-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JO) | 2015-04-21 | — | — | US | disclosed |
| US-20140120472-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-01 | — | — | US | disclosed |
| US-8476435-B2 | Method for producing fluorine-containing polyether carboxylic acid amide | UNIMATEC CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-8415085-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-09 | — | — | US | disclosed |
| US-20120264061-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120041201-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING POLYETHER CARBOXYLIC ACID AMIDE | UNIMATEC CO., LTD. (JP) | 2012-02-16 | — | — | US | disclosed |