⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL537928 | 1.00 | — | — | |
| SCHEMBL9837532 | 0.73 | — | — | |
| SCHEMBL1619190 | 0.71 | — | — | |
| SCHEMBL8169846 | 0.71 | TP53 (0.33) | — | |
| SCHEMBL11002293 | 0.68 | — | — | |
| SCHEMBL4644591 | 0.67 | — | — | |
| SCHEMBL7595578 | 0.66 | SMN1; SMN2 (0.33) | — | |
| SCHEMBL596708 | 0.66 | — | — | |
| SCHEMBL13737596 | 0.63 | — | — | |
| SCHEMBL15304331 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102603701-B | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM & HAAS ELECT MAT | 2014-11-12 | — | — | CN | disclosed |
| US-8771917-B2 | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) | 2014-07-08 | — | — | US | disclosed |
| US-20130011783-A1 | MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-01-10 | — | — | US | disclosed |
| CN-102603701-A | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM & HAAS ELECT MAT | 2012-07-25 | — | — | CN | disclosed |
| EP-2472324-A1 | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns | Rohm and Haas Electronic Materials LLC (US) | 2012-07-04 | — | — | EP | disclosed |