SCHEMBL10013263

SCHEMBL10013263

CCC(C)(I)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1038317 0.80
Ammonia Solution, Strong SCHEMBL9346362 0.76
Hydrogen Sulfide SCHEMBL11063848 0.76
SCHEMBL1314986 0.76
SCHEMBL12075585 0.76
SCHEMBL83837 0.74
SCHEMBL7859046 0.74
SCHEMBL15304159 0.73
SCHEMBL3940222 0.73
SCHEMBL7871139 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250069948-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2025-02-27 US claimed
EP-4448831-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS Lam Research Corporation (US) 2024-10-23 EP claimed
WO-2023114640-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2023-06-22 WO claimed
US-20260136848-A1 DEPOSITION OF METAL-CONTAINING FILMS LAM RES CORP (US) 2026-05-14 US disclosed
US-20250250675-A1 METHOD OF DEPOSITING METAL FILMS APPLIED MATERIALS, INC. (US) 2025-08-07 US disclosed
US-12281387-B2 Method of depositing metal films APPLIED MATERIALS, INC. (US) 2025-04-22 US disclosed
US-20250069948-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2025-02-27 US disclosed
EP-4448831-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS Lam Research Corporation (US) 2024-10-23 EP disclosed
CN-118434908-A Metal deposition in recessed features using halogen-containing deposition inhibitors 朗姆研究公司 2024-08-02 CN disclosed
WO-2024081263-A1 DEPOSITION OF METAL-CONTAINING FILMS LAM RESEARCH CORPORATION (US) 2024-04-18 WO disclosed
US-20230227975-A1 METHOD OF DEPOSITING METAL FILMS APPLIED MATERIALS, INC. (US) 2023-07-20 US disclosed
EP-2633834-A1 Bioabsorbable Surgical Composition Covidien LP (US) 2013-09-04 EP disclosed
US-8349681-B2 Ultrahigh density monolithic, three dimensional vertical NAND memory device SANDISK TECHNOLOGIES INC. (US) 2013-01-08 US disclosed
EP-2495350-A2 Microwave plasma processing device with a plasma processing gas supply member Toyo Seikan Kaisha, Ltd. (JP) 2012-09-05 EP disclosed
US-20120108021-A1 PMOS SiGe-LAST INTEGRATION PROCESS TEXAS INSTRUMENTS INCORPORATED (US) 2012-05-03 US disclosed
EP-1301486-B1 IMIDAZOLIDINONES AS NS3-SERINE PROTEASE INHIBITORS OF HEPATITIS C VIRUS SCHERING CORP (US) 2009-07-01 EP disclosed
US-7530675-B2 Piezoelectric actuator device XEROX CORPORATION (US) 2009-05-12 US disclosed
US-7413788-B2 Write-once-read-many optical recording media and process for recording and reproducing information on the media RICOH COMPANY, LTD. (JP) 2008-08-19 US disclosed
US-20080062839-A1 OPTICAL DISC ANALYSIS SYSTEM INCLUDING RELATED METHODS FOR BIOLOGICAL AND MEDICAL IMAGING VINDUR TECHNOLOGIES, INC. (NO) 2008-03-13 US disclosed
US-20080018714-A1 Piezoelectric actuator device XEROX CORPORATION 2008-01-24 US disclosed