SCHEMBL10015535

SCHEMBL10015535

CC[C@@H](C)n1ccnc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14317920 1.00
SCHEMBL408049 1.00
Ethane SCHEMBL27729336 0.98 CYP17A1 (0.44)
Iodide SCHEMBL20816028 0.98 CYP17A1 (0.44)
Bromide SCHEMBL25395862 0.98 CYP17A1 (0.44)
Hydrochloric Acid SCHEMBL25396071 0.98 CYP17A1 (0.44)
Water SCHEMBL28822856 0.98 CYP17A1 (0.44)
Methane SCHEMBL27640067 0.98 CYP17A1 (0.44)
Butane SCHEMBL27786045 0.96 CYP17A1 (0.42)
SCHEMBL29007526 0.94 CYP17A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170027871-A1 PHARMACEUTICAL COMBINATION FORMULATION COMPRISING AMLODIPINE, LOSARTAN AND ROSUVASTATIN HANMI PHARM. CO., LTD. (KR) 2017-02-02 US disclosed
US-20160333413-A1 BREAST CANCER PROGNOSTICATION AND SCREENING KITS AND METHODS OF USING SAME UNIVERSITY OF NOTRE DAME (US) 2016-11-17 US disclosed
US-9291909-B2 Composition comprising a polymeric thermal acid generator and processes thereof AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-03-22 US disclosed
US-20140342290-A1 COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCESSES THEREOF AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-11-20 US disclosed
EP-2420839-A2 An in vitro method for the prognosis of progression of a cancer and of the outcome in a patient and means for performing said method INSERM (Institut National de la Santé et de la Recherche Médicale) (FR) 2012-02-22 EP disclosed
US-20100183851-A1 Photoresist Image-forming Process Using Double Patterning CAO YI 2010-07-22 US disclosed
US-7745077-B2 Composition for coating over a photoresist pattern AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-06-29 US disclosed
US-20090317739-A1 Composition for Coating over a Photoresist Pattern MERCK PATENT GMBH (DE) 2009-12-24 US disclosed