SCHEMBL10016729

SCHEMBL10016729

CC(C)C(=O)OC1C2CC3C(=O)OC1(C)C3C2

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.32
POLB P06746 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12868920 0.89
SCHEMBL12705184 0.87
SCHEMBL14560956 0.87
SCHEMBL10061185 0.85 ABCB1 (0.32)
SCHEMBL11960973 0.84
SCHEMBL441717 0.82 ABCB1 (0.31)
SCHEMBL12764998 0.82 CYP19A1 (0.32)
SCHEMBL685122 0.81
SCHEMBL686162 0.81
SCHEMBL12869724 0.81 CYP19A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1267210-B1 Positive resist composition FUJIFILM CORP (JP) 2018-02-21 EP disclosed
WO-2012050015-A1 POLYMERIZABLE FLUORINE-CONTAINING SULFONATE, FLUORINE-CONTAINING SULFONATE RESIN, RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME セントラル硝子株式会社 (JP) 2012-04-19 WO disclosed
US-7960087-B2 Positive photosensitive composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2011-06-14 US disclosed