SCHEMBL1002579

SCHEMBL1002579

[Ga+3].[N-]=[N+]=[N-].[N-]=[N+]=[N-].[N-]=[N+]=[N-]

nearest known ligand 0.80

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.80
CA9 Q16790 2/20 0.67
ALDH1A1 P00352 1/20 0.67
TSHR P16473 1/20 0.67
TDP1 Q9NUW8 1/20 0.67
CA6 P23280 1/20 0.38
CA5A P35218 1/20 0.38
CA5B Q9Y2D0 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL165 0.89
SCHEMBL1512953 0.89
SCHEMBL9005288 0.89
SCHEMBL25235463 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1
SCHEMBL25266468 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1
SCHEMBL23632800 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1
SCHEMBL25267014 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1
SCHEMBL25223811 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1
SCHEMBL25267093 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1
SCHEMBL25231872 0.80 CA1 (0.80) CA1CA9ALDH1A1TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1432853-B1 PROCESS FOR OBTAINING BULK MONOCRYSTALLINE GALLIUM- CONTAINING NITRIDE AMMONO SP ZOO (PL) 2013-04-24 EP claimed
US-7252712-B2 Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride AMMONO SP. Z O.O. (PL) 2007-08-07 US claimed
EP-1770189-A2 Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride AMMONO Sp.z o.o. (PL) 2007-04-04 EP claimed
US-7160388-B2 Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride NICHIA CORPORATION (JP) 2007-01-09 US claimed
US-20040139912-A1 Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride AMMONO SP. Z O.O. (PL) 2004-07-22 US claimed
EP-1432853-A2 PROCESS AND APPARATUS FOR OBTAINING BULK MONOCRYSTALLINE GALLIUM- CONTAINING NITRIDE AMMONO Sp. z o.o. (PL) 2004-06-30 EP claimed
US-20020189531-A1 Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride AMMONO SP. Z O.O. (PL) 2002-12-19 US claimed
WO-2002101120-A2 PROCESS AND APPARATUS FOR OBTAINING BULK MONOCRYSTALLINE GALLIUM-CONTAINING NITRIDE AMMONO SP. ZO.O (PL) 2002-12-19 WO claimed
US-20250027204-A1 Spray Pyrolysis of Li-Salt Films MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2025-01-23 US disclosed
CN-117881427-A Conjugates of saponins, oligonucleotides and GALNAC 萨普雷米科技有限公司 2024-04-12 CN disclosed
WO-2023086105-A1 SPRAY PYROLYSIS OF LITHIUM SALT FILMS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2023-05-19 WO disclosed
CN-109411581-B Light emitting diode epitaxial wafer and manufacturing method thereof 华灿光电(浙江)有限公司 2020-07-07 CN disclosed
CN-110828641-A LED assembly and LED display device 罗姆股份有限公司 2020-02-21 CN disclosed
CN-109848577-A The laser processing of chip 株式会社迪思科 2019-06-07 CN disclosed
CN-1461498-A light emitting device using LED chip MATSUSHITA ELECTRIC WORKS LTD (JP) 2003-12-10 CN disclosed
CN-1444254-A Nitride semiconductor, semiconductor device and method for manufacturing the same SONY CORP (JP) 2003-09-24 CN disclosed
CN-1437225-A Dry itching process for gallium nitrid compound semiconductor, etc. SHAMK INTERNAT INST CO LTD (JP) 2003-08-20 CN disclosed
EP-1061083-A1 Adduct of a dialkylgalliumazide with hydrazine for MOCVD of GaN Korea Research Institute of Chemical Technology (KR) 2000-12-20 EP disclosed
US-5675028-A Bisamido azides of gallium, aluminum and indium and their use as precursors for the growth of nitride films BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 1997-10-07 US disclosed
US-5171734-A COATING A SUBSTRATE IN A FLUIDIZED BED MAINTAINED AT A TEMPERATURE BELOW THE VAPORIZATION TEMPERATURE OF THE RESULTING COATING COMPOSITION SRI INTERNATIONAL (US) 1992-12-15 US disclosed