SCHEMBL10035946

SCHEMBL10035946

OCCOCCOCCOCCOCCOCCOCCOCCOCCOCCCCCCCCCCc1ccccc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.54
KMT2A Q03164 3/20 0.54
USP2 O75604 1/20 0.54
ALDH1A1 P00352 1/20 0.54
LMNA P02545 1/20 0.54
CYP3A4 P08684 1/20 0.54
MAPK1 P28482 1/20 0.54
CASP1 P29466 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
SLCO1B3 Q9NPD5 1/20 0.54
SLCO1B1 Q9Y6L6 1/20 0.54
TDP1 Q9NUW8 2/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
MAPT P10636 2/20 0.47
RXFP1 Q9HBX9 1/20 0.47
THRB P10828 1/20 0.47
HTT P42858 1/20 0.47
SIGMAR1 Q99720 1/20 0.46
IDO1 P14902 1/20 0.46
FFAR1 O14842 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27873875 0.98 TDP1 (0.53) MEN1KMT2AUSP2ALDH1A1LMNA
SCHEMBL8553636 0.98 TDP1 (0.53) MEN1KMT2AUSP2ALDH1A1LMNA
SCHEMBL9407052 0.98 TDP1 (0.53) MEN1KMT2AUSP2ALDH1A1LMNA
SCHEMBL6001883 0.96 TDP1 (0.52) MEN1KMT2AUSP2ALDH1A1LMNA
SCHEMBL13459003 0.92 IDO1 (0.53) MEN1KMT2AUSP2ALDH1A1LMNA
SCHEMBL10390214 0.91 TDP1 (0.50) MEN1KMT2AUSP2ALDH1A1LMNA
SCHEMBL97369 0.91 TDP1 (0.53) MEN1KMT2ATDP1L3MBTL1MAPT
SCHEMBL9574223 0.91 TDP1 (0.53) MEN1KMT2ATDP1L3MBTL1MAPT
SCHEMBL96692 0.91 TDP1 (0.53) MEN1KMT2ATDP1L3MBTL1MAPT
SCHEMBL9574291 0.91 TDP1 (0.53) MEN1KMT2ATDP1L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8551928-B2 Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor element FUJIFILM CORPORATION (JP) 2013-10-08 US disclosed
US-20120108485-A1 MULTI-AGENT TYPE CLEANING KIT FOR SEMICONDUCTOR SUBSTRATES, CLEANING METHOD USING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR ELEMENT FUJIFILM CORPORATION (JP) 2012-05-03 US disclosed