SCHEMBL10036883

SCHEMBL10036883

CCC1(COCC(O)COC(COCC2(CC)COC2)COCC2(CC)COC2)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10036886 0.98
SCHEMBL12732070 0.93 USP2 (0.31)
SCHEMBL1666633 0.90 TSHR (0.33)
SCHEMBL21941196 0.85 TSHR (0.32)
SCHEMBL20998067 0.85 HSD17B10 (0.34)
SCHEMBL19328167 0.85 TSHR (0.30)
SCHEMBL26525588 0.85 TDP1 (0.39)
SCHEMBL12799254 0.84 EPHX1 (0.35)
SCHEMBL26525591 0.84 TDP1 (0.38)
SCHEMBL12702640 0.83 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2206745-B1 RADIATION CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME DAINIPPON INK & CHEMICALS (JP) 2012-05-16 EP disclosed
US-7923481-B2 Radiation curable composition and method for producing the same DIC CORPORATION (JP) 2011-04-12 US disclosed
US-7923481-B2 Radiation curable composition and method for producing the same DIC CORPORATION (JP) 2011-04-12 US disclosed
US-20100210751-A1 RADIATION CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME DIC CORPORATION (JP) 2010-08-19 US disclosed
US-20100210751-A1 RADIATION CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME DIC CORPORATION (JP) 2010-08-19 US disclosed
EP-2206745-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME DIC Corporation (JP) 2010-07-14 EP disclosed