Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.53 |
| ▸ | CA1 | P00915 | 13/20 | 0.48 |
| ▸ | PPARA | Q07869 | 3/20 | 0.39 |
| ▸ | CA2 | P00918 | 12/20 | 0.35 |
| ▸ | MMP1 | P03956 | 3/20 | 0.35 |
| ▸ | MMP2 | P08253 | 3/20 | 0.35 |
| ▸ | MMP9 | P14780 | 3/20 | 0.35 |
| ▸ | MMP8 | P22894 | 3/20 | 0.35 |
| ▸ | MMP13 | P45452 | 3/20 | 0.35 |
| ▸ | CA12 | O43570 | 2/20 | 0.34 |
| ▸ | CA7 | P43166 | 2/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10063058 | 0.87 | EPHX1 (0.46) | EPHX1CA1PPARACA2MMP1 | |
| SCHEMBL19042170 | 0.87 | EPHX1 (0.66) | EPHX1CA1PPARACA2CA12 | |
| SCHEMBL7023194 | 0.86 | EPHX1 (0.69) | EPHX1CA1PPARACA2CA12 | |
| SCHEMBL19042171 | 0.85 | EPHX1 (0.75) | EPHX1CA1PPARACA2CA12 | |
| SCHEMBL5955600 | 0.85 | CA1 (0.51) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL4784342 | 0.84 | CA1 (0.52) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL9157457 | 0.84 | CA1 (0.52) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL9068698 | 0.84 | CA1 (0.52) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL9069199 | 0.84 | CA1 (0.52) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL9069154 | 0.84 | CA1 (0.52) | EPHX1CA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170184962-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184964-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184963-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| EP-2444845-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-20120082936-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20110223537-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-09-15 | — | — | US | disclosed |