SCHEMBL10066840

SCHEMBL10066840

CC1CC2C(C1)C1CCC2C1C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 5/20 0.38
TDP1 Q9NUW8 4/20 0.38
GRM2 Q14416 2/20 0.37
GRM3 Q14832 2/20 0.37
CTDSP1 Q9GZU7 1/20 0.37
PPP5C P53041 1/20 0.36
LMNA P02545 3/20 0.36
KDM4E B2RXH2 2/20 0.36
APEX1 P27695 1/20 0.36
GMNN O75496 1/20 0.36
PMP22 Q01453 1/20 0.36
TFPI2 P48307 1/20 0.36
TP53 P04637 1/20 0.36
TSHR P16473 1/20 0.36
NFKB1 P19838 1/20 0.36
THPO P40225 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.34
MAPK1 P28482 1/20 0.34
SLC1A2 P43004 1/20 0.33
SLC1A1 P43005 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3984067 0.88 POLB (0.37) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL34468414 0.88 POLB (0.37) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL19911967 0.87 POLB (0.42) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL15747205 0.87 POLB (0.42) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL12231001 0.82 POLB (0.48) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL10067519 0.76 POLB (0.34) POLBTDP1GRM2GRM3LMNA
SCHEMBL24197654 0.73 POLB (0.39) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL25472592 0.73 POLB (0.39) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL3981113 0.73 PPP5C (0.38) POLBTDP1GRM2GRM3CTDSP1
SCHEMBL6805455 0.72 PPP5C (0.45) POLBTDP1GRM2GRM3CTDSP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120178023-A1 (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT NEC CORPORATION 2012-07-12 US disclosed
US-8119751-B2 2012-02-21 US disclosed
US-20090023878-A1 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION 2009-01-22 US disclosed
US-7432035-B2 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2008-10-07 US disclosed
US-20070218403-A1 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION 2007-09-20 US disclosed
US-7186495-B2 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2007-03-06 US disclosed