⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12298748 | 1.00 | — | — | |
| SCHEMBL10829735 | 0.74 | — | — | |
| SCHEMBL16313150 | 0.70 | — | — | |
| SCHEMBL27367152 | 0.65 | — | — | |
| SCHEMBL14134113 | 0.63 | — | — | |
| SCHEMBL8740583 | 0.62 | — | — | |
| SCHEMBL18013403 | 0.62 | — | — | |
| SCHEMBL19301342 | 0.62 | — | — | |
| SCHEMBL19301366 | 0.62 | — | — | |
| SCHEMBL19301376 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120301829-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20120301829-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-29 | — | — | US | disclosed |
| WO-2012018534-A2 | SUBSTITUTED BIPHENYLENE COMPOUNDS AND METHODS OF USE THEREOF FOR THE TREATMENT OF VIRAL DISEASES | SCHERING CORPORATION (US) | 2012-02-09 | — | — | WO | disclosed |
| US-8067379-B2 | Sulfur compounds as inhibitors of hepatitis C virus NS3 serine protease | SCHERING CORPORATION (US) | 2011-11-29 | — | — | US | disclosed |
| US-20070042968-A1 | Sulfur compounds as inhibitors of Hepatitis C virus NS3 serine protease | SCHERING CORPORATION | 2007-02-22 | — | — | US | disclosed |