⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10072585 | 0.92 | — | — | |
| SCHEMBL4403387 | 0.86 | — | — | |
| SCHEMBL4403431 | 0.81 | — | — | |
| SCHEMBL4403414 | 0.78 | HTR2A (0.34) | — | |
| SCHEMBL4405523 | 0.77 | MEN1 (0.32) | — | |
| SCHEMBL4448561 | 0.76 | — | — | |
| SCHEMBL4438927 | 0.76 | CYP2A6 (0.30) | — | |
| SCHEMBL4443408 | 0.75 | — | — | |
| SCHEMBL4448548 | 0.75 | — | — | |
| SCHEMBL4402567 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |