SCHEMBL10092153

SCHEMBL10092153

CC[SiH](C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16304050 0.85
SCHEMBL16304045 0.85
SCHEMBL515101 0.78
SCHEMBL15437297 0.78
SCHEMBL3631529 0.77
SCHEMBL18197062 0.77
Ammonia Solution, Strong SCHEMBL28300541 0.75
SCHEMBL9560893 0.73
SCHEMBL13293506 0.73
SCHEMBL11672674 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100552084-C Form the method and the dielectric film of dielectric film IBM (US) 2009-10-21 CN claimed
CN-1782125-A Method for forming dielectric film and dielectric film IBM (US) 2006-06-07 CN claimed
EP-3507104-B1 PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU BRIDGESTONE CORP (JP) 2024-03-27 EP disclosed
CN-116096769-A Olefin/siloxane interpolymers and olefin/cyclic silane interpolymers 陶氏环球技术有限责任公司 2023-05-09 CN disclosed
CN-115461143-A Compositions, methods, and systems for sample processing 10X基因组学有限公司 2022-12-09 CN disclosed
EP-4097155-A1 ACTINICALLY-CROSSLINKABLE POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF Clearlab SG Pte Ltd (SG) 2022-12-07 EP disclosed
US-10975178-B2 Production of cis-1,4-polydienes with multiple silane functional groups prepared by in-situ hydrosilylation of polymer cement BRIDGESTONE CORPORATION (JP) 2021-04-13 US disclosed
US-20190211120-A1 Production Of Cis-1,4-Polydienes With Multiple Silane Functional Groups Prepared By In-Situ Hydrosilylation Of Polymer Cement BRIDGESTONE CORPORATION (JP) 2019-07-11 US disclosed
EP-3507104-A1 PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU Bridgestone Corporation (JP) 2019-07-10 EP disclosed
CN-105593234-B Novel organopolysiloxane, the surface conditioning agent comprising it, the resin combination comprising it and their gel-like product or cured product 道康宁东丽株式会社 2018-10-26 CN disclosed
WO-2018045291-A1 PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BY IN-SITU HYDROSILYLATION OF POLYMER CEMENT BRIDGESTONE CORPORATION (JP) 2018-03-08 WO disclosed
CN-105593234-A Novel organopolysiloxane, surface treatment agent comprising the same, resin composition comprising the same, and gelatinous product or cured product thereof DOW CORNING TORAY CO LTD 2016-05-18 CN disclosed
US-9085591-B2 Organosilicon amine electrolyte materials containing polyether chain and application thereof in electrolytes of lithium-ion batteries GUANGZHOU INSTITUTE OF ENERGY CONVERSION, CHINESE ACADEMY OF SCIENCES (CN) 2015-07-21 US disclosed
WO-2015023001-A1 NOVEL ORGANOPOLYSILOXANE, SURFACE TREATMENT AGENT COMPRISING THE SAME, RESIN COMPOSITION COMPRISING THE SAME, AND GELATINOUS PRODUCT OR CURED PRODUCT THEREOF DOW CORNING TORAY CO., LTD. (JP) 2015-02-19 WO disclosed
US-20140371330-A1 Novel Co-Modified Organopolysiloxane, And Treatment Agent And External Use Preparation Comprising The Same DOW TORAY CO., LTD. (JP) 2014-12-18 US disclosed
US-20130084490-A1 ORGANOSILICON AMINE ELECTROLYTE MATERIALS CONTAINING POLYETHER CHAIN AND APPLICATION THEREOF IN ELECTROLYTES OF LITHIUM-ION BATTERIES GUANGZHOU INSTITUTE OF ENERGY CONVERSION,CHINESE ACADEMY OF SCIENCES (CN) 2013-04-04 US disclosed
US-20120019938-A1 CURABLE RESIN COMPOSITION FOR CEMENTED LENS, IMAGING LENS, AND METHOD FOR MANUFACTURING IMAGING LENS FUJIFILM CORPORATION (JP) 2012-01-26 US disclosed
CN-100552084-C Form the method and the dielectric film of dielectric film IBM (US) 2009-10-21 CN disclosed
CN-1782125-A Method for forming dielectric film and dielectric film IBM (US) 2006-06-07 CN disclosed