SCHEMBL1010901

SCHEMBL1010901

CCC1(C(C)O)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28504089 0.82 EPHX1 (0.35)
SCHEMBL1011516 0.81 EPHX1 (0.31)
SCHEMBL8327276 0.79
SCHEMBL9918180 0.79
SCHEMBL1011269 0.78 EPHX1 (0.32)
SCHEMBL1650764 0.78
SCHEMBL24045113 0.76 DPP4 (0.35)
SCHEMBL1039902 0.75
SCHEMBL13718934 0.75
SCHEMBL2770029 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 432 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4435064-B1 NONAQUEOUS INKJET INK AND METHOD FOR FORMING CURED PRODUCT KONICA MINOLTA INC (JP) 2026-04-22 EP disclosed
US-20260092132-A1 WATER-ABSORBENT RESIN COMPOSITION, WATER-BLOCKING MATERIAL, AND CABLE SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2026-04-02 US disclosed
EP-3312218-B1 POLY (METH) ACRYLIC ACID (SALT) GRANULAR WATER ABSORBENT AND METHOD FOR PRODUCING SAME NIPPON CATALYTIC CHEM IND (JP) 2026-04-01 EP disclosed
EP-4711426-A1 ACTIVE RAY-CURABLE INKJET INK COMPOSITION, METHOD FOR FORMING INSULATING FILM, INSULATING FILM, AND PRINTED WIRING BOARD KONICA MINOLTA, INC. (JP) 2026-03-18 EP disclosed
EP-4700069-A1 PRODUCTION METHOD FOR WATER-ABSORBING RESIN PARTICLES, ABSORBER, AND ABSORBENT ARTICLE Sumitomo Seika Chemicals Co., Ltd. (JP) 2026-02-25 EP disclosed
US-12533658-B2 Water-absorbent resin particles SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2026-01-27 US disclosed
US-12515191-B2 Particulate water-absorbent resin composition SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2026-01-06 US disclosed
EP-4667517-A1 WATER-ABSORBENT RESIN PARTICLES AND PRODUCTION METHOD THEREFOR, ABSORBENT BODY, AND ABSORBENT ARTICLE Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-12-24 EP disclosed
EP-4644489-A1 WATER-ABSORBING RESIN COMPOSITION, WATER-STOPPING MATERIAL, AND CABLE Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-11-05 EP disclosed
US-12427503-B2 Method for producing water absorbent resin particles and aqueous monomer solution SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2025-09-30 US disclosed
US-20020072471-A1 Water-absorbing agent and process for producing the same NIPPON SHOKUBAI CO., LTD. (JP) 2002-06-13 US disclosed
EP-1199327-A2 Water-absorbing agent and process for producing the same Nippon Shokubai Co., Ltd. (JP) 2002-04-24 EP disclosed
US-6284898-B1 DENTAL MATERIAL IVOCLAR AG (LI) 2001-09-04 US disclosed
US-20010002423-A1 Oxetane compound, oxetane copolymer, and process for producing the oxetane compound SUGIYAMA NAOKI (JP) 2001-05-31 US disclosed
EP-1095938-A1 OXETANE COMPOUNDS, OXETANE COPOLYMER, AND PROCESS FOR PRODUCING OXETANE COMPOUNDS JSR Corporation (JP) 2001-05-02 EP disclosed
US-6096903-A Hydrolysable and polymerizable oxetane silanes IVOCLAR AG (LI) 2000-08-01 US disclosed
EP-0867443-A2 Hydrolyzable and polymerizable oxetanesilanes IVOCLAR AG (LI) 1998-09-30 EP disclosed
US-4871484-A Process for the preparation of 2,2-bis-chloro-methylalkanecarboxylic acid chlorides BAYER AKTIENGESELLSCHAFT (DE) 1989-10-03 US disclosed
US-4225483-A Boric acid esters and oxetanes for stabilizing phosphite-free polycarbonates BAYER AKTIENGESELLSCHAFT (DE) 1980-09-30 US disclosed
EP-0001823-A2 Use of esters of boric acid to stabilize phosphite-free polycarbonates, and the obtained stabilized polycarbonate moulding compositions BAYER AG (DE) 1979-05-16 EP disclosed