⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6314 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL6685964 | 0.86 | — | — | |
| SCHEMBL6248320 | 0.86 | — | — | |
| SCHEMBL317526 | 0.86 | — | — | |
| SCHEMBL8749506 | 0.86 | — | — | |
| SCHEMBL11552862 | 0.86 | — | — | |
| SCHEMBL9751165 | 0.86 | — | — | |
| SCHEMBL11552183 | 0.86 | — | — | |
| Water SCHEMBL22041614 | 0.86 | — | — | |
| SCHEMBL11551443 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-5259095-A | — | — | None | — | — | JP | disclosed |
| US-9617641-B2 | Au-containing layer for charged particle beam processing | FEI COMPANY (US) | 2017-04-11 | — | — | US | disclosed |
| CN-101922000-B | That processes for charged particle beam contains Au layer | FEI CO. (US) | 2015-09-09 | — | — | CN | disclosed |
| EP-2270254-B1 | Au-containing Layer obtainable by Charged Particle Beam Processing | FEI CO (US) | 2014-08-13 | — | — | EP | disclosed |
| EP-2270254-A1 | Au-containing layer obtainable by charged particle beam processing | FEI Company (US) | 2011-01-05 | — | — | EP | disclosed |
| CN-101922000-A | What be used for charged particle beam processing contains the Au layer | FEI CO | 2010-12-22 | — | — | CN | disclosed |
| US-20100316811-A1 | AU-CONTAINING LAYER FOR CHARGED PARTICLE BEAM PROCESSING | FEI COMPANY (US) | 2010-12-16 | — | — | US | disclosed |
| EP-2261395-A1 | Au-containing layer obtainable by charged particle beam processing | FEI COMPANY (US) | 2010-12-15 | — | — | EP | disclosed |
| JP-H05259095-A | CVD METHOD FOR GOLD FILM | MITSUBISHI MATERIALS CORP | 1993-10-08 | — | — | JP | disclosed |
| US-4659426-A | Plasma etching of refractory metals and their silicides | TEXAS INSTRUMENTS INCORPORATED (US) | 1987-04-21 | — | — | US | disclosed |
| US-4024228-A | Process for the preparation of anhydrous gold trichloride | SNAM PROGETTI S.P.A. (IT) | 1977-05-17 | — | — | US | disclosed |
| US-3929973-A | Process for the preparation of carbonyl derivatives | SNAM PROGETTI | 1975-12-30 | — | — | US | disclosed |