⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22830543 | 0.80 | — | — | |
| SCHEMBL29066933 | 0.80 | — | — | |
| SCHEMBL28397931 | 0.80 | — | — | |
| SCHEMBL28400742 | 0.78 | EPHX1 (0.32) | — | |
| SCHEMBL6338184 | 0.78 | EPHX1 (0.32) | — | |
| SCHEMBL28634314 | 0.77 | TSHR (0.33) | — | |
| SCHEMBL28973877 | 0.77 | EPHX1 (0.34) | — | |
| SCHEMBL15239652 | 0.77 | — | — | |
| SCHEMBL6357243 | 0.76 | — | — | |
| SCHEMBL13462804 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11807758-B2 | Siloxane polymer and method of producing siloxane polymer | JNC CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| WO-2021044802-A1 | COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND METHOD FOR PRODUCING CURED PRODUCT | 株式会社ADEKA | 2021-03-11 | — | — | WO | disclosed |
| WO-2020021969-A1 | COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT | 株式会社ADEKA | 2020-01-30 | — | — | WO | disclosed |
| CN-110072951-A | Printing ink composition, light conversion layer and colour filter | DIC株式会社 | 2019-07-30 | — | — | CN | disclosed |
| US-8367792-B2 | Polysiloxane compound and method of producing the same | JNC CORPORATION (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20120208973-A1 | POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME | OOTAKE NOBUMASA (JP) | 2012-08-16 | — | — | US | disclosed |
| US-8173758-B2 | Polysiloxane compound and method of producing the same | JNC CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20110178313-A1 | POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME | OOTAKE NOBUMASA | 2011-07-21 | — | — | US | disclosed |
| US-7939617-B2 | Silsesquioxane derivative; electronic material, optical material, optoelectronic material, paint, and primer. | CHISSO CORPORATION (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7449539-B2 | Silsesquioxane derivative and production process for the same | CHISSO CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| US-20080171846-A1 | Polysiloxane compound and method of producing the same | JNC CORPORATION (JP) | 2008-07-17 | — | — | US | disclosed |
| US-7319129-B2 | Silsesquioxane derivative and process for producing the same | CHISSO CORPORATION (JP) | 2008-01-15 | — | — | US | disclosed |
| US-20070032454-A1 | Silsesquioxane derivative and production process for the same | JNC CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| US-7169873-B2 | Silsesquioxane derivatives and process for production thereof | CHISSO CORPORATION (JP) | 2007-01-30 | — | — | US | disclosed |