⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22116260 | 0.91 | — | — | |
| SCHEMBL231689 | 0.88 | — | — | |
| SCHEMBL13231948 | 0.82 | — | — | |
| SCHEMBL3135933 | 0.80 | — | — | |
| SCHEMBL13231942 | 0.80 | — | — | |
| SCHEMBL15737430 | 0.77 | — | — | |
| SCHEMBL15737384 | 0.77 | — | — | |
| SCHEMBL2216699 | 0.77 | — | — | |
| SCHEMBL2115098 | 0.77 | TSHR (0.34) | — | |
| SCHEMBL3135744 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8501386-B2 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20120052685-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM-FORMED SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |