SCHEMBL10159853

SCHEMBL10159853

CC(C)(c1ccc(N(CC2CO2)CC2CO2)cc1)c1ccc(N(CC2CO2)CC2CO2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.51
KMT2A Q03164 3/20 0.51
HPGD P15428 3/20 0.51
TSHR P16473 3/20 0.51
MAPT P10636 3/20 0.51
TP53 P04637 2/20 0.51
ALDH1A1 P00352 2/20 0.51
HIF1A Q16665 2/20 0.51
CYP1A2 P05177 1/20 0.51
PPARG P37231 1/20 0.51
LMNA P02545 2/20 0.34
ESR1 P03372 1/20 0.33
CYP3A4 P08684 1/20 0.33
AR P10275 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
HTR6 P50406 1/20 0.33
ESRRG P62508 1/20 0.33
SLC6A3 Q01959 1/20 0.33
ESR2 Q92731 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1290461 1.00 MEN1 (0.51) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL18084085 1.00 MEN1 (0.51) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL6227818 0.91 MEN1 (0.47) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL1976128 0.91 MAPT (0.55) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL17038491 0.89 MEN1 (0.43) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL7132729 0.89 MEN1 (0.44) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL10616339 0.88 MEN1 (0.45) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL16640951 0.88 MEN1 (0.42) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL16641027 0.88 MEN1 (0.42) MEN1KMT2AHPGDTSHRMAPT
SCHEMBL22590731 0.87 MEN1 (0.41) MEN1KMT2AHPGDTSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180016389-A1 WATER-BASED PRIMER COMPOSITION FOR POLYCARBONATE AND POLYCARBONATE BLENDS SIKA TECHNOLOGY AG (CH) 2018-01-18 US disclosed
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20110027591-A1 Aqueous two-component or multicomponent aqueous epoxy resin primer composition SIKA TECHNOLOGY AG (CH) 2011-02-03 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed
US-4038455-A USING N-GLYCIDYL COMPOUNDS INVENTA AG FUR FORSCHUNG UND PATENTVERWERTUNG (CH) 1977-07-26 US disclosed