⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13116002 | 0.84 | — | — | |
| SCHEMBL26939586 | 0.84 | — | — | |
| SCHEMBL26939366 | 0.81 | — | — | |
| SCHEMBL15946502 | 0.81 | — | — | |
| SCHEMBL13115989 | 0.80 | — | — | |
| SCHEMBL14271528 | 0.79 | — | — | |
| SCHEMBL26939801 | 0.78 | — | — | |
| SCHEMBL17974536 | 0.78 | — | — | |
| SCHEMBL12389954 | 0.78 | — | — | |
| SCHEMBL13496200 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| EP-1225480-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20080051536-A1 | Method for Producing (Co) Polymer Having Carboxyl Group | JSR CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20080051536-A1 | Method for Producing (Co) Polymer Having Carboxyl Group | JSR CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |