⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2611774 | 0.84 | — | — | |
| SCHEMBL2958757 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL11528842 | 0.80 | — | — | |
| SCHEMBL12932557 | 0.76 | — | — | |
| SCHEMBL11618748 | 0.74 | — | — | |
| SCHEMBL9496852 | 0.74 | — | — | |
| SCHEMBL11616941 | 0.71 | — | — | |
| SCHEMBL256774 | 0.56 | — | — | |
| Cyclohexane SCHEMBL12475590 | 0.45 | — | — | |
| Cyclooctane SCHEMBL8564806 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230145113-A1 | ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, MODULE AND COMPOUND | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-11 | — | — | US | disclosed |
| US-9874816-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |
| US-20170363961-A9 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9703195-B2 | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound | JSR CORPORATION (JP) | 2017-07-11 | — | — | US | disclosed |
| US-20170115570-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170075219-A1 | ONIUM SALT, PHOTOACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING DEVICE | TOYO GOSEI CO., LTD. (JP) | 2017-03-16 | — | — | US | disclosed |
| US-9587065-B2 | Composition for pattern formation, and pattern-forming method | JSR CORPORATION (JP) | 2017-03-07 | — | — | US | disclosed |
| US-20160202608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20160185999-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2016-06-30 | — | — | US | disclosed |
| US-20130183624-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| US-20130149644-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20130095428-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20130078579-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND | JSR CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8367298-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20120295198-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110014568-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |