⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13641840 | 0.86 | — | — | |
| SCHEMBL28793317 | 0.83 | — | — | |
| SCHEMBL281731 | 0.71 | — | — | |
| SCHEMBL104958 | 0.69 | — | — | |
| SCHEMBL704968 | 0.69 | — | — | |
| SCHEMBL431902 | 0.67 | — | — | |
| SCHEMBL107853 | 0.67 | — | — | |
| SCHEMBL2110876 | 0.67 | — | — | |
| SCHEMBL34902 | 0.67 | — | — | |
| SCHEMBL1314883 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1116 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| CN-103374708-A | High temperature atomic layer deposition of silicon oxide thin films | AIR PROD & CHEM | 2013-10-30 | — | — | CN | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| EP-0612327-B1 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS | MOBIL OIL CORP (US) | 1997-12-29 | — | — | EP | claimed |
| EP-0669944-B1 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS | MOBIL OIL CORP (US) | 1997-10-15 | — | — | EP | claimed |
| EP-0669944-A4 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS. | MOBIL OIL CORP (US) | 1996-04-24 | — | — | EP | claimed |
| EP-0669944-A1 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS. | MOBIL OIL CORP (US) | 1995-09-06 | — | — | EP | claimed |
| EP-0612327-A1 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS | MOBIL OIL CORPORATION (US) | 1994-08-31 | — | — | EP | claimed |
| EP-0612327-A4 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS. | MOBIL OIL CORP (US) | 1994-07-11 | — | — | EP | claimed |
| WO-1994012542-A1 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS | MOBIL OIL CORPORATION (US) | 1994-06-09 | — | — | WO | claimed |
| US-5258345-A | High-activity polyethylene catalysts | MOBIL OIL CORPORATION (US) | 1993-11-02 | — | — | US | claimed |
| WO-1993009147-A1 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS | MOBIL OIL CORPORATION (US) | 1993-05-13 | — | — | WO | claimed |
| US-4242479-A | CATALYST OF ALUMINUM TRIHALIDE, ORGANOSILOXANE COMPOUND OR ETHER, MAGNESIUM ALCOHOLATE, TITANIUM-HALOGEN AND ORGANOALUMINUM COMPOUNDS | SHOWA YUKA KABUSHIKI KAISHA (JP) | 1980-12-30 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-29 | — | — | US | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592752-A2 | COMPOSITION FOR FORMING METAL-CONTAINING FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-20250237954-A1 | Composition For Forming Metal-Containing Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-20250218768-A1 | Composition For Forming Silicon-Containing Anti-Reflective Film And Patterning Method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-4579345-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING ANTI-REFLECTIVE FILM AND PATTERNING METHOD | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-07-02 | — | — | EP | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-20250188609-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RES CORP (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250166999-A1 | Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-22 | — | — | US | disclosed |
| EP-4557002-A2 | PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-05-21 | — | — | EP | disclosed |
| US-12234312-B2 | Solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-02-25 | — | — | US | disclosed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | disclosed |
| US-20250014890-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | LAM RESEARCH CORPORATION | 2025-01-09 | — | — | US | disclosed |
| US-12174541-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-24 | — | — | US | disclosed |
| CN-119161509-A | Solid catalyst component for olefin polymerization | 住友化学株式会社 | 2024-12-20 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| WO-2024243002-A1 | LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF SILICON OXIDE | LAM RESEARCH CORPORATION (US) | 2024-11-28 | — | — | WO | disclosed |
| US-12109812-B2 | Ink jet printing method and ink jet printing apparatus | SEIKO EPSON CORPORATION (JP) | 2024-10-08 | — | — | US | disclosed |
| US-20240319598-A1 | Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4435515-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-25 | — | — | EP | disclosed |
| US-12085857-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-10 | — | — | US | disclosed |
| CN-118620392-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-09-10 | — | — | CN | disclosed |
| EP-3770209-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-09-04 | — | — | EP | disclosed |
| US-20240262964-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| CN-118402040-A | Low temperature molybdenum deposition assisted by silicon-containing reactants | 朗姆研究公司 | 2024-07-26 | — | — | CN | disclosed |
| CN-118355473-A | Conformal carbon-doped silicon nitride films and methods thereof | 朗姆研究公司 | 2024-07-16 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-12001138-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| EP-4361201-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| US-11934100-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-19 | — | — | US | disclosed |
| US-20240076423-A1 | SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-03-07 | — | — | US | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-3796086-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240030062-A1 | INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND RESISTIVITY REDUCTION | LAM RESEARCH CORPORATION | 2024-01-25 | — | — | US | disclosed |
| US-11840595-B2 | Solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| CN-117121173-A | Integration of fully aligned vias by selective deposition and resistivity reduction | 朗姆研究公司 | 2023-11-24 | — | — | CN | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4250008-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-27 | — | — | EP | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| WO-2023178203-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RESEARCH CORPORATION (US) | 2023-09-21 | — | — | WO | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| EP-3686256-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-06-28 | — | — | EP | disclosed |
| WO-2023102440-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | LAM RESEARCH CORPORATION (US) | 2023-06-08 | — | — | WO | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| EP-4020081-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHINETSU CHEMICAL CO (JP) | 2023-05-17 | — | — | EP | disclosed |
| US-11642653-B2 | Hybrid material for chromatographic separations comprising a superficially porous core and a surrounding material | WATERS TECHNOLOGIES CORPORATION (US) | 2023-05-09 | — | — | US | disclosed |
| EP-4012499-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-11614686-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-03-28 | — | — | US | disclosed |
| US-11592287-B2 | Method for measuring distance of diffusion of curing catalyst | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| US-11555697-B2 | — | — | 2023-01-17 | — | — | US | disclosed |
| WO-2022270336-A1 | METHOD FOR PRODUCING SILICONE POLYMER | 東レ・ファインケミカル株式会社 | 2022-12-29 | — | — | WO | disclosed |
| US-11485824-B2 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-11-01 | — | — | US | disclosed |
| US-11480879-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-25 | — | — | US | disclosed |
| WO-2022221881-A1 | INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND RESISTIVITY REDUCTION | LAM RESEARCH CORPORATION (US) | 2022-10-20 | — | — | WO | disclosed |
| CN-112955514-B | Composition for forming coating film, glass substrate coated with the composition, and touch panel using the glass substrate | 阪田油墨株式会社 | 2022-09-06 | — | — | CN | disclosed |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-11385544-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | disclosed |
| EP-4020081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-29 | — | — | EP | disclosed |
| CN-114660896-A | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2022-06-24 | — | — | CN | disclosed |
| EP-4012499-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-15 | — | — | EP | disclosed |
| US-20220179317-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| CN-114594657-A | Composition for forming silicon-containing resist underlayer film and pattern formation method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |
| CN-114430767-A | Composition for forming coating, laminate coated with the composition, touch panel using the laminate, and method for forming cured coating | 阪田油墨株式会社 | 2022-05-03 | — | — | CN | disclosed |
| CN-114055975-A | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2022-02-18 | — | — | CN | disclosed |
| CN-114057913-A | Solid catalyst component for olefin polymerization | 住友化学株式会社 | 2022-02-18 | — | — | CN | disclosed |
| US-20220032618-A1 | Ink Jet Printing Method And Ink Jet Printing Apparatus | SEIKO EPSON CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | disclosed |
| EP-3736632-B1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | SHINETSU CHEMICAL CO (JP) | 2021-09-22 | — | — | EP | disclosed |
| CN-109641835-B | Method for producing carbamate | 国立研究开发法人产业技术综合研究所 | 2021-07-20 | — | — | CN | disclosed |
| US-20210200098-A1 | PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| EP-3657254-B1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2021-06-16 | — | — | EP | disclosed |
| US-11033507-B2 | Method of synthesis of silica vesicles and use thereof | THE UNIVERSITY OF QUEENSLAND (AU) | 2021-06-15 | — | — | US | disclosed |
| CN-112955514-A | Composition for forming coating film, glass substrate coated with the composition, and touch panel using the glass substrate | 阪田油墨株式会社 | 2021-06-11 | — | — | CN | disclosed |
| EP-3508473-B1 | METHOD FOR PRODUCING CARBAMIC ACID ESTER | AIST (JP) | 2021-05-26 | — | — | EP | disclosed |
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | disclosed |
| WO-2021065211-A1 | COATING FILM-FORMING COMPOSITION, LAMINATE OBTAINED BY COATING SAID COATING FILM-FORMING COMPOSITION, TOUCH PANEL OBTAINED BY USING SAID LAMINATE, AND METHOD FOR FORMING CURED COATING FILM | サカタインクス株式会社 | 2021-04-08 | — | — | WO | disclosed |
| US-20210088908-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-25 | — | — | US | disclosed |
| EP-3796086-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-03-24 | — | — | EP | disclosed |
| CN-112526822-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2021-03-19 | — | — | CN | disclosed |
| US-10916437-B2 | Methods of forming micropatterns and substrate processing apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-02-09 | — | — | US | disclosed |
| CN-112286000-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2021-01-29 | — | — | CN | disclosed |
| US-20210026246-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| EP-3770209-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-01-27 | — | — | EP | disclosed |
| CN-107367784-B | Optical phase difference member and projector | JXTG能源株式会社 | 2020-11-24 | — | — | CN | disclosed |
| EP-3736632-A1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-11-11 | — | — | EP | disclosed |
| CN-111856882-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-111855581-A | Method for determining diffusion distance of hardening catalyst | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| US-20200340806-A1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-29 | — | — | US | disclosed |
| US-20200341377-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-29 | — | — | US | disclosed |
| EP-3067395-B1 | ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER | SEIKO EPSON CORP (JP) | 2020-10-28 | — | — | EP | disclosed |
| EP-3731017-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-10-28 | — | — | EP | disclosed |
| WO-2020209202-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM | 東ソー株式会社 | 2020-10-15 | — | — | WO | disclosed |
| US-10759119-B2 | Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object | SEIKO EPSON CORPORATION (JP) | 2020-09-01 | — | — | US | disclosed |
| US-10752579-B2 | Production method of carbamic acid ester | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2020-08-25 | — | — | US | disclosed |
| US-10737295-B2 | Piezoelectric element, method for producing the same, ultrasound probe, and ultrasound imaging apparatus | Konica Minolta, Inc. (JP) | 2020-08-11 | — | — | US | disclosed |
| EP-3686256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-29 | — | — | EP | disclosed |
| CN-111458980-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2020-07-28 | — | — | CN | disclosed |
| US-20200233303-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-23 | — | — | US | disclosed |
| CN-111423587-A | Thermosetting silicon-containing compound, composition for forming silicon-containing film, and method for forming pattern | 信越化学工业株式会社 | 2020-07-17 | — | — | CN | disclosed |
| EP-3680275-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-15 | — | — | EP | disclosed |
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| CN-108139525-B | Optical phase difference member and projector | JXTG能源株式会社 | 2020-06-26 | — | — | CN | disclosed |
| EP-3657254-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-05-27 | — | — | EP | disclosed |
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| US-10647821-B2 | Production process for silicone polymer | TORAY FINE CHEMICALS CO., LTD. (JP) | 2020-05-12 | — | — | US | disclosed |
| CN-106796317-B | Optical retardation member, composite optical member provided with optical retardation member, and method for producing optical retardation member | 捷客斯能源株式会社 | 2019-12-03 | — | — | CN | disclosed |
| EP-3263224-B1 | DISPENSING NEEDLE AND SYSTEM WITH SUCH A DISPENSING NEEDLE | BOSCH GMBH ROBERT (DE) | 2019-10-02 | — | — | EP | disclosed |
| US-10408984-B2 | Optical phase difference component, composite optical component, incorporating optical phase difference component, and method for manufacturing optical phase difference component | JX NIPPON OIL AND ENERGY CORPORATION (JP) | 2019-09-10 | — | — | US | disclosed |
| US-10392522-B2 | Ultraviolet curable composition and recorded object | SEIKO EPSON CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20190258160-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-08-22 | — | — | US | disclosed |
| EP-3508473-A1 | METHOD FOR PRODUCING CARBAMIC ACID ESTER | National Institute of Advanced Industrial Science and Technology (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-20190198342-A1 | Methods of Forming Micropatterns and Substrate Processing Apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-06-27 | — | — | US | disclosed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | disclosed |
| US-20190185420-A1 | PRODUCTION METHOD OF CARBAMIC ACID ESTER | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2019-06-20 | — | — | US | disclosed |
| US-10300708-B2 | Ink jet composition, housing, and ink jet method | SEIKO EPSON CORPORATION (JP) | 2019-05-28 | — | — | US | disclosed |
| US-10279603-B2 | Production method of recording material, and recording material | SEIKO EPSON CORPORATION (JP) | 2019-05-07 | — | — | US | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| CN-109641835-A | Method for producing carbamate | 国立研究开发法人产业技术综合研究所 | 2019-04-16 | — | — | CN | disclosed |
| US-10242864-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2019-03-26 | — | — | US | disclosed |
| US-20190054704-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20190023848-A1 | PRODUCTION PROCESS FOR SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2019-01-24 | — | — | US | disclosed |
| EP-2518562-B1 | A patterning process | SHINETSU CHEMICAL CO (JP) | 2019-01-16 | — | — | EP | disclosed |
| CN-109219892-A | Luminescence-utraviolet semiconductor devices and its manufacturing method | 住友化学株式会社 | 2019-01-15 | — | — | CN | disclosed |
| CN-106465495-B | Light emitting element | 捷客斯能源株式会社 | 2018-12-28 | — | — | CN | disclosed |
| CN-106256168-B | Film structural component with sag and swell | 捷客斯能源株式会社 | 2018-11-30 | — | — | CN | disclosed |
| US-10137637-B2 | Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object | SEIKO EPSON CORPORATION (JP) | 2018-11-27 | — | — | US | disclosed |
| EP-2426558-B1 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-24 | — | — | EP | disclosed |
| US-10109485-B2 | Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-10-23 | — | — | US | disclosed |
| EP-2657767-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-10 | — | — | EP | disclosed |
| CN-106030838-B | The manufacturing method of semiconductor light-emitting apparatus | 住友化学株式会社 | 2018-09-28 | — | — | CN | disclosed |
| CN-108473684-A | The manufacturing method of siloxane polymer | 东丽精细化工株式会社 | 2018-08-31 | — | — | CN | disclosed |
| US-10053590-B2 | Composition for inkjet and recording material | SEIKO EPSON CORPORATION (JP) | 2018-08-21 | — | — | US | disclosed |
| EP-2826826-B1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2018-08-01 | — | — | EP | disclosed |
| US-20180193879-A1 | PIEZOELECTRIC ELEMENT, METHOD FOR PRODUCING THE SAME, ULTRASOUND PROBE, AND ULTRASOUND IMAGING APPARATUS | Konica Minolta, Inc. (JP) | 2018-07-12 | — | — | US | disclosed |
| US-20180193278-A1 | METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF | THE UNIVERSITY OF QUEENSLAND (AU) | 2018-07-12 | — | — | US | disclosed |
| US-10014451-B2 | Method for producing semiconductor light-emitting device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-07-03 | — | — | US | disclosed |
| US-9976008-B2 | Porous inorganic/organic homogenous copolymeric hybrid materials for chromatographic separations and process for the preparation thereof | WATERS TECHNOLOGIES CORPORATION (US) | 2018-05-22 | — | — | US | disclosed |
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9956726-B2 | Apparatus for producing three-dimensional structure, method of producing three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-9950507-B2 | Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2018-04-24 | — | — | US | disclosed |
| EP-2738229-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-04-18 | — | — | EP | disclosed |
| CN-105453697-B | Light emitting element and method for manufacturing light emitting element | 吉坤日矿日石能源株式会社 | 2018-04-17 | — | — | CN | disclosed |
| US-20180081272-A1 | THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SAME, AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-9920210-B2 | Material including layer produced by ultraviolet-curable composition | SEIKO EPSON CORPORATION (JP) | 2018-03-20 | — | — | US | disclosed |
| EP-2657766-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-9902875-B2 | Composition for forming a coating type BPSG film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9887080-B2 | Method of forming SiOCN material layer and method of fabricating semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-06 | — | — | US | disclosed |
| US-9880470-B2 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-30 | — | — | US | disclosed |
| CN-107637167-A | Light-emitting component | JXTG能源株式会社 | 2018-01-26 | — | — | CN | disclosed |
| EP-2738228-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-3263224-A2 | DISPENSING NEEDLE AND SYSTEM WITH SUCH A DISPENSING NEEDLE | Robert Bosch GmbH (DE) | 2018-01-03 | — | — | EP | disclosed |
| EP-2500775-B1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHINETSU CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | disclosed |
| CN-106134287-B | Optical substrate, the mould for manufacturing optical substrate and the light-emitting component containing optical substrate | 捷客斯能源株式会社 | 2017-12-26 | — | — | CN | disclosed |
| US-9823392-B2 | Optical substrate, mold to be used in optical substrate manufacture, and light emitting element including optical substrate | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-11-21 | — | — | US | disclosed |
| CN-107367784-A | Optical phase difference component and projector | JXTG能源株式会社 | 2017-11-21 | — | — | CN | disclosed |
| US-9771489-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-09-26 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | disclosed |
| US-9732204-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9725611-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20170199313-A1 | OPTICAL PHASE DIFFERENCE COMPONENT, COMPOSITE OPTICAL COMPONENT, INCORPORATING OPTICAL PHASE DIFFERENCE COMPONENT, AND METHOD FOR MANUFACTURING OPTICAL PHASE DIFFERENCE COMPONENT | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170186603-A1 | METHOD OF FORMING SiOCN MATERIAL LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-06-29 | — | — | US | disclosed |
| EP-3178632-A1 | METHOD FOR MANUFACTURING MEMBER HAVING IRREGULAR PATTERN | JX Nippon Oil & Energy Corporation (JP) | 2017-06-14 | — | — | EP | disclosed |
| WO-2017093759-A1 | FUNCTIONALISATION METHOD FOR METAL OXIDE PARTICLES | THE WELDING INSTITUTE (GB) | 2017-06-08 | — | — | WO | disclosed |
| US-20170154766-A1 | SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-01 | — | — | US | disclosed |
| CN-106796317-A | Optical retardation member, composite optical member provided with optical retardation member, and method for producing optical retardation member | 捷客斯能源株式会社 | 2017-05-31 | — | — | CN | disclosed |
| US-9660217-B2 | Light emitting element and method for maufacturing light emitting element | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-05-23 | — | — | US | disclosed |
| US-20170133638-A1 | METHOD FOR MANUFACTURING MEMBER HAVING IRREGULAR PATTERN | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| CN-106660260-A | Method for manufacturing member having concave-convex pattern | 捷客斯能源株式会社 | 2017-05-10 | — | — | CN | disclosed |
| CN-103242701-B | Recording material | 精工爱普生株式会社 | 2017-04-26 | — | — | CN | disclosed |
| US-9630339-B2 | Manufacturing method of three-dimensional structure and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9627204-B2 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| US-9624356-B2 | Ultraviolet absorber, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMIAL CO., LTD (JP) | 2017-04-18 | — | — | US | disclosed |
| CN-104703779-B | Manufacturing method for optical substrate using film shaped mold, manufacturing device, and optical substrate obtained thereby | 吉坤日矿日石能源株式会社 | 2017-04-12 | — | — | CN | disclosed |
| CN-103242713-B | Composition for inkjet and recording material | 精工爱普生株式会社 | 2017-04-12 | — | — | CN | disclosed |
| EP-3145276-A1 | FILM MEMBER HAVING UNEVEN STRUCTURE | JX Nippon Oil & Energy Corporation (JP) | 2017-03-22 | — | — | EP | disclosed |
| US-9597838-B2 | Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-3139705-A1 | LIGHT EMITTER | JX Nippon Oil & Energy Corporation (JP) | 2017-03-08 | — | — | EP | disclosed |
| US-20170058138-A1 | INK JET COMPOSITION, HOUSING, AND INK JET METHOD | SEIKO EPSON CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-9579852-B2 | Method for manufacturing three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2017-02-28 | — | — | US | disclosed |
| US-9580623-B2 | Patterning process using a boron phosphorus silicon glass film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20170054112-A1 | FILM MEMBER HAVING UNEVEN STRUCTURE | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| CN-106465495-A | Light emitting element | 捷客斯能源株式会社 | 2017-02-22 | — | — | CN | disclosed |
| US-20170047554-A1 | LIGHT EMITTER | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-02-16 | — | — | US | disclosed |
| US-20170028743-A1 | PRODUCTION METHOD OF RECORDING MATERIAL, AND RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2017-02-02 | — | — | US | disclosed |
| EP-3125312-A1 | EPITAXIAL GROWTH SUBSTRATE AND LIGHT-EMITTING ELEMENT USING SAME | JX Nippon Oil & Energy Corporation (JP) | 2017-02-01 | — | — | EP | disclosed |
| EP-2599819-B1 | Silicon-containing resist underlayer film-forming composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-02-01 | — | — | EP | disclosed |
| EP-2599818-B1 | Silicon-containing resist underlayer film-forming composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-02-01 | — | — | EP | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9546257-B2 | Porous carbon-heteroatom-silicon inorganic/organic materials for chromatographic separations and process for the preparation thereof | WATERS TECHNOLOGIES CORPORATION (US) | 2017-01-17 | — | — | US | disclosed |
| US-20170012169-A1 | EPITAXIAL GROWTH SUBSTRATE AND LIGHT-EMITTING ELEMENT USING SAME | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-01-12 | — | — | US | disclosed |
| EP-3109909-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE | Sumitomo Chemical Company, Limited (JP) | 2016-12-28 | — | — | EP | disclosed |
| US-9528019-B2 | Ultraviolet-curable inkjet composition and material | SEIKO EPSON CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9527809-B2 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| CN-106256168-A | There is the film structural component of sag and swell | 捷客斯能源株式会社 | 2016-12-21 | — | — | CN | disclosed |
| US-9522979-B2 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | disclosed |
| US-9519214-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-13 | — | — | US | disclosed |
| US-20160359092-A1 | METHOD FOR PRODUCING SEMICONDUCTOR LIGHT-EMITTING DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| CN-102786837-B | Uv-curing type ink jet compositions and printed article | 精工爱普生株式会社 | 2016-12-07 | — | — | CN | disclosed |
| US-9511552-B2 | Manufacturing method for optical substrate using film shaped mold, manufacturing device, and optical substrate obtained thereby | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-20160340532-A1 | MATERIAL INCLUDING LAYER PRODUCED BY ULTRAVIOLET-CURABLE COMPOSITION | SEIKO EPSON CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-20160339602-A1 | METHOD OF MANUFACTURING THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9498975-B2 | Production method of recording material, and recording material | SEIKO EPSON CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| EP-3094160-A1 | OPTICAL SUBSTRATE, MOLD TO BE USED IN OPTICAL SUBSTRATE MANUFACTURE, AND LIGHT EMITTING ELEMENT INCLUDING OPTICAL SUBSTRATE | JX Nippon Oil & Energy Corporation (JP) | 2016-11-16 | — | — | EP | disclosed |
| CN-106134287-A | Optical substrate, for manufacturing the mould of optical substrate and containing the light-emitting component of optical substrate | 捷客斯能源株式会社 | 2016-11-16 | — | — | CN | disclosed |
| US-20160327695-A1 | OPTICAL SUBSTRATE, MOLD TO BE USED IN OPTICAL SUBSTRATE MANUFACTURE, AND LIGHT EMITTING ELEMENT INCLUDING OPTICAL SUBSTRATE | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| EP-2861041-B1 | ORGANIC EL ELEMENT AND METHOD FOR MANUFACTURING SAME | JX NIPPON OIL & ENERGY CORP (JP) | 2016-11-09 | — | — | EP | disclosed |
| US-9490144-B2 | Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20160319144-A1 | COMPOSITION FOR INKJET AND RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| EP-3089550-A1 | LIGHT-EMITTING ELEMENT | JX Nippon Oil & Energy Corporation (JP) | 2016-11-02 | — | — | EP | disclosed |
| CN-104685970-B | Check the device of the substrate with irregular convex-concave surface and use the inspection method of this device | 吉坤日矿日石能源株式会社 | 2016-10-19 | — | — | CN | disclosed |
| US-9470980-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2016-10-18 | — | — | US | disclosed |
| CN-106030838-A | Method for manufacturing semiconductor light emitting device | 住友化学株式会社 | 2016-10-12 | — | — | CN | disclosed |
| US-20160291461-A1 | PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD | FUJIFILM CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| US-9460912-B2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-04 | — | — | US | disclosed |
| CN-105980447-A | Method of synthesis of silica vesicles and use thereof | 昆士兰大学 | 2016-09-28 | — | — | CN | disclosed |
| CN-105965881-A | Three-dimensional modeling apparatus and three-dimensional object manufacturing method | 精工爱普生株式会社 | 2016-09-28 | — | — | CN | disclosed |
| US-20160276152-A1 | PATTERNING PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-09-22 | — | — | US | disclosed |
| US-20160272833-A1 | ULTRAVIOLET-CURABLE INKJET COMPOSITION AND MATERIAL | SEIKO EPSON CORPORATION (JP) | 2016-09-22 | — | — | US | disclosed |
| US-9448477-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20160268555-A1 | LIGHT-EMITTING ELEMENT | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| US-20160263829-A1 | THREE-DIMENSIONAL MODELING APPARATUS, MANUFACTURING METHOD, AND COMPUTER PROGRAM | SEIKO EPSON CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| EP-3067395-A1 | ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER | Seiko Epson Corporation (JP) | 2016-09-14 | — | — | EP | disclosed |
| US-20160257827-A1 | ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT | SEIKO EPSON CORPORATION (JP) | 2016-09-08 | — | — | US | disclosed |
| US-9422442-B2 | Material including print layer produced by ultraviolet-curable composition | SEIKO EPSON CORPORATION (JP) | 2016-08-23 | — | — | US | disclosed |
| EP-2871062-B1 | Production method of recording material, and recording material | SEIKO EPSON CORP (JP) | 2016-08-17 | — | — | EP | disclosed |
| US-9416288-B2 | Inkjet recording method | SEIKO EPSON CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-9415545-B2 | Method of manufacturing three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160229960-A1 | FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| CN-105850228-A | Light-emitting element | 捷客斯能源株式会社 | 2016-08-10 | — | — | CN | disclosed |
| US-9411230-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-09 | — | — | US | disclosed |
| EP-2540780-B1 | Composition for forming resist underlayer film and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2016-07-20 | — | — | EP | disclosed |
| US-9393740-B2 | Method of producing three-dimensional structure, apparatus for producing three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2016-07-19 | — | — | US | disclosed |
| US-9382443-B2 | Metal powder, ultraviolet-curable inkjet composition and recording material | SEIKO EPSON CORPORATION (JP) | 2016-07-05 | — | — | US | disclosed |
| US-20160184736-A1 | CHROMATOGRAPHIC COLUMNS AND SEPARATION DEVICES COMPRISING A SUPERFICIALLY POROUS MATERIAL; AND USE THEREOF FOR SUPERCRITICAL FLUID CHROMATOGRAPHY AND OTHER CHROMATOGRAPHY | WATERS TECHNOLOGIES CORPORATION (US) | 2016-06-30 | — | — | US | disclosed |
| EP-3035774-A1 | LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT | JX Nippon Oil & Energy Corporation (JP) | 2016-06-22 | — | — | EP | disclosed |
| US-20160172624-A1 | LIGHT EMITTING ELEMENT AND METHOD FOR MAUFACTURING LIGHT EMITTING ELEMENT | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| EP-3025791-A1 | METHOD FOR MANUFACTURING SUBSTRATE HAVING TEXTURED STRUCTURE | JX Nippon Oil & Energy Corporation (JP) | 2016-06-01 | — | — | EP | disclosed |
| US-20160141528-A1 | METHOD FOR MANUFACTURING SUBSTRATE HAVING TEXTURED STRUCTURE | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2016-05-19 | — | — | US | disclosed |
| CN-105593316-A | Ultraviolet-curable composition and recorded matter | SEIKO EPSON CORP | 2016-05-18 | — | — | CN | disclosed |
| CN-102540543-B | Manufacture method, liquid crystal display cells and the polymer composition of liquid crystal display cells | JSR CO., LTD. (JP) | 2016-05-18 | — | — | CN | disclosed |
| WO-2016067584-A1 | METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2016-05-06 | — | — | WO | disclosed |
| US-20160107385-A1 | THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING METHOD AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-9312127-B2 | Method for producing semiconductor apparatus substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310319-B2 | Device for inspecting substrate having irregular rough surface and inspection method using same | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20160096977-A1 | COMPOSITION FOR FORMING A COATING TYPE SILICON-CONTAINING FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160096978-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160096943-A1 | POROUS INORGANIC/ORGANIC HOMOGENOUS COPOLYMERIC HYBRID MATERIALS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESS FOR THE PREPARATION THEREOF | WATERS TECHNOLOGIES CORPORATION | 2016-04-07 | — | — | US | disclosed |
| CN-105453697-A | Light emitting element and method for manufacturing light emitting element | JX NIPPON OIL & ENERGY CORP | 2016-03-30 | — | — | CN | disclosed |
| US-9291897-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-03-22 | — | — | US | disclosed |
| CN-105408030-A | Method for manufacturing substrate having uneven structure | JX NIPPON OIL & ENERGY CORP | 2016-03-16 | — | — | CN | disclosed |
| US-20160070174-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-03-10 | — | — | US | disclosed |
| US-20160064220-A1 | METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160053087-A1 | ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-25 | — | — | US | disclosed |
| US-9248693-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9248383-B2 | Composite materials containing nanoparticles and their use in chromatography | WATERS TECHNOLOGIES CORPORATION (US) | 2016-02-02 | — | — | US | disclosed |
| US-20160027946-A1 | OPTICAL DEVICE | JSR CORPORATION (JP) | 2016-01-28 | — | — | US | disclosed |
| US-20160024005-A1 | COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-28 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20160008737-A1 | POROUS INORGANIC/ORGANIC HYBRID MATERIALS WITH ORDERED DOMAINS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESSES FOR THEIR PREPARATION | WATERS INVESTMENTS LIMITED | 2016-01-14 | — | — | US | disclosed |
| US-20160009933-A1 | MATERIAL INCLUDING PRINT LAYER PRODUCED BY ULTRAVIOLET-CURABLE COMPOSITION | SEIKO EPSON CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| EP-2966669-A1 | METHOD OF MANUFACTURING MEMBER HAVING RELIEF STRUCTURE, AND MEMBER HAVING RELIEF STRUCTURE MANUFACTURED THEREBY | JX Nippon Oil & Energy Corporation (JP) | 2016-01-13 | — | — | EP | disclosed |
| US-9233840-B2 | Method for improving self-assembled polymer features | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-12 | — | — | US | disclosed |
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150367326-A1 | POROUS INORGANIC/ORGANIC HYBRID PARTICLES HAVING HIGH ORGANIC CONTENT AND ENHANCED PORE GEOMETRY FOR CHROMATOGRAPHIC SEPARATIONS | WATERS TECHNOLOGIES CORPORATION (US) | 2015-12-24 | — | — | US | disclosed |
| US-9219252-B2 | Organic EL element and method for manufacturing same | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20150362635-A1 | METHOD OF MANUFACTURING MEMBER HAVING RELIEF STRUCTURE, AND MEMBER HAVING RELIEF STRUCTURE MANUFACTURED THEREBY | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
| EP-2955001-A1 | ROLLER DEVICE USING SUCTION ROLLER, AND PRODUCTION METHOD FOR MEMBER HAVING UNEVEN STRUCTURE | JX Nippon Oil & Energy Corporation (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-9211524-B2 | Porous inorganic/organic homogenous copolymeric hybrid materials for chromatographic separations and process for the preparation thereof | WATERS TECHNOLOGIES CORPORATION (US) | 2015-12-15 | — | — | US | disclosed |
| US-20150357204-A1 | QUATERNARY AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150337494-A1 | ROLLER DEVICE USING SUCTION ROLLER, AND PRODUCTION METHOD FOR MEMBER HAVING UNEVEN STRUCTURE | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-20150338732-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| CN-105073387-A | Roller device using suction roller and method for manufacturing member having uneven structure | JX NIPPON OIL & ENERGY CORP | 2015-11-18 | — | — | CN | disclosed |
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| CN-105027259-A | Method for manufacturing member having uneven structure, and member having uneven structure manufactured by the manufacturing method | JX NIPPON OIL & ENERGY CORP | 2015-11-04 | — | — | CN | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20150306822-A1 | METHOD OF MANUFACTURING THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, THREE-DIMENSIONAL FORMATION COMPOSITION, AND THREE-DIMENSIONAL FORMATION MATERIAL | SEIKO EPSON CORPORATION (JP) | 2015-10-29 | — | — | US | disclosed |
| US-9170489-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9169411-B2 | Recording material | SEIKO EPSON CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| EP-2738227-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2015-10-21 | — | — | EP | disclosed |
| CN-103131431-B | MATERIALS FOR DISPLAY, crystal aligning agent and liquid crystal display device | JSR CO., LTD. (JP) | 2015-10-07 | — | — | CN | disclosed |
| US-20150273765-A1 | METHOD OF MANUFACTURING THREE-DIMENSIONAL STRUCTURE AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-10-01 | — | — | US | disclosed |
| US-20150273728-A1 | THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, MANUFACTURING METHOD OF THREE-DIMENSIONAL STRUCTURE, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-10-01 | — | — | US | disclosed |
| US-9145481-B2 | Porous inorganic/organic hybrid materials with ordered domains for chromatographic separations and processes for their preparation | WATERS TECHNOLOGIES CORPORATION (US) | 2015-09-29 | — | — | US | disclosed |
| US-20150266239-A1 | APPARATUS FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, METHOD OF PRODUCING THREE-DIMENSIONAL STRUCTURE, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-24 | — | — | US | disclosed |
| US-20150266240-A1 | APPARATUS FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, METHOD OF PRODUCING THREE-DIMENSIONAL STRUCTURE, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-24 | — | — | US | disclosed |
| CN-104924609-A | Apparatus for producing three-dimensional structure, three-dimensional structure and method of producing three-dimensional structure | SEIKO EPSON CORP | 2015-09-23 | — | — | CN | disclosed |
| US-20150258733-A1 | THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, MANUFACTURING METHOD OF THREE-DIMENSIONAL STRUCTURE, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-17 | — | — | US | disclosed |
| US-20150258705-A1 | MANUFACTURING METHOD OF THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-17 | — | — | US | disclosed |
| US-20150258707-A1 | MANUFACTURING METHOD OF THREE-DIMENSIONAL STRUCTURE AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-17 | — | — | US | disclosed |
| US-20150258706-A1 | THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, MANUFACTURING METHOD OF THREE-DIMENSIONAL STRUCTURE, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-17 | — | — | US | disclosed |
| US-20150258734-A1 | METHOD OF PRODUCING THREE-DIMENSIONAL STRUCTURE, APPARATUS FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-17 | — | — | US | disclosed |
| US-20150258723-A1 | THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2015-09-17 | — | — | US | disclosed |
| CN-102311739-B | The manufacture method of liquid crystal aligning agent, liquid crystal display device and liquid crystal display device | JSR CO., LTD. (JP) | 2015-09-16 | — | — | CN | disclosed |
| CN-104908318-A | Manufacturing method of three-dimensional structure, three-dimensional structure manufacturing apparatus, and three-dimensional structure | SEIKO EPSON CORP | 2015-09-16 | — | — | CN | disclosed |
| CN-104908317-A | Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORP | 2015-09-16 | — | — | CN | disclosed |
| US-20150251352-A1 | THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING DEVICE, METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150253662-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150251336-A1 | THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING DEVICE, METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150246483-A1 | THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING DEVICE, MANUFACTURING METHOD OF THREE-DIMENSIONAL SHAPED OBJECT, AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-09-03 | — | — | US | disclosed |
| EP-2623569-B1 | Composition for inkjet and recording material | SEIKO EPSON CORP (JP) | 2015-09-02 | — | — | EP | disclosed |
| US-9120083-B2 | Porous inorganic/organic hybrid particles having high organic content and enhanced pore geometry for chromatographic separations | WATERS TECHNOLOGIES CORPORATION (US) | 2015-09-01 | — | — | US | disclosed |
| US-20150239147-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20150239179-A1 | APPARATUS FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, METHOD OF MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20150239175-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-08-27 | — | — | US | disclosed |
| EP-2910363-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | Seiko Epson Corporation (JP) | 2015-08-26 | — | — | EP | disclosed |
| CN-104859146-A | Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object | SEIKO EPSON CORP | 2015-08-26 | — | — | CN | disclosed |
| US-20150231798-A1 | APPARATUS FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, METHOD OF MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-08-20 | — | — | US | disclosed |
| CN-104842555-A | Apparatus for manufacturing three-dimensional shaped object, method of manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORP | 2015-08-19 | — | — | CN | disclosed |
| EP-2905120-A1 | MANUFACTURING METHOD FOR OPTICAL SUBSTRATE USING FILM SHAPED MOLD, MANUFACTURING DEVICE, AND OPTICAL SUBSTRATE OBTAINED THEREBY | JX Nippon Oil & Energy Corporation (JP) | 2015-08-12 | — | — | EP | disclosed |
| EP-2903397-A1 | DEVICE FOR INSPECTING SUBSTRATE HAVING IRREGULAR ROUGH SURFACE AND INSPECTION METHOD USING SAME | JX Nippon Oil & Energy Corporation (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2623570-B1 | Ultraviolet-curable composition for inkjet and recording material | SEIKO EPSON CORP (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-20150210016-A1 | METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150202829-A1 | MANUFACTURING METHOD FOR OPTICAL SUBSTRATE USING FILM SHAPED MOLD, MANUFACTURING DEVICE, AND OPTICAL SUBSTRATE OBTAINED THEREBY | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2015-07-23 | — | — | US | disclosed |
| EP-2560049-B1 | Composition for forming a silicon-containing resist underlayer film and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2015-07-22 | — | — | EP | disclosed |
| US-9080069-B2 | Composition for inkjet and recording material | SEIKO EPSON CORPORATION (JP) | 2015-07-14 | — | — | US | disclosed |
| US-20150192529-A1 | DEVICE FOR INSPECTING SUBSTRATE HAVING IRREGULAR ROUGH SURFACE AND INSPECTION METHOD USING SAME | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2015-07-09 | — | — | US | disclosed |
| US-9075309-B2 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20150185612-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-20150185610-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-9069247-B2 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20150165679-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20150165680-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20150158249-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-06-11 | — | — | US | disclosed |
| CN-104703779-A | Manufacturing method for optical substrate using film shaped mold, manufacturing device, and optical substrate obtained thereby | JX NIPPON OIL & ENERGY CORP | 2015-06-10 | — | — | CN | disclosed |
| US-9050624-B2 | Film-forming composition for imprinting, method of manufacturing a structure, and structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| CN-104685970-A | Device for inspecting substrate having irregular rough surface and inspection method using same | JX NIPPON OIL & ENERGY CORP | 2015-06-03 | — | — | CN | disclosed |
| US-20150145935-A1 | INKJET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| CN-104647754-A | Three-dimensional shaped object, three-dimensional shaped object manufacturing method and apparatus, method of controlling three-dimensional shaped object manufacturing apparatus, and program for controlling three-dimensional shaped object manufacturing apparatus | SEIKO EPSON CORP | 2015-05-27 | — | — | CN | disclosed |
| US-20150140295-A1 | METHOD OF MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, THREE-DIMENSIONAL SHAPED OBJECT, THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING APPARATUS, METHOD OF CONTROLLING THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING APPARATUS, AND PROGRAM FOR CONTROLLING THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2015-05-21 | — | — | US | disclosed |
| EP-2871062-A1 | Production method of recording material, and recording material | Seiko Epson Corporation (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-20150125671-A1 | PRODUCTION METHOD OF RECORDING MATERIAL, AND RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2015-05-07 | — | — | US | disclosed |
| US-20150125673-A1 | METAL POWDER, ULTRAVIOLET-CURABLE INKJET COMPOSITION AND RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2015-05-07 | — | — | US | disclosed |
| EP-2168757-B1 | METHOD OF MANUFACTURING A PLASTIC LENS | HOYA CORP (JP) | 2015-04-29 | — | — | EP | disclosed |
| EP-2861041-A1 | ORGANIC EL ELEMENT AND METHOD FOR MANUFACTURING SAME | JX Nippon Oil & Energy Corporation (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-9005883-B2 | Patterning process | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| US-8992790-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-31 | — | — | US | disclosed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | disclosed |
| US-20150060840-A1 | ORGANIC EL ELEMENT AND METHOD FOR MANUFACTURING SAME | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2015-03-05 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| CN-104380843-A | Organic electroluminescent element and method for manufacturing the same | JX NIPPON OIL & ENERGY CORP | 2015-02-25 | — | — | CN | disclosed |
| US-20150044435-A1 | ULTRAVIOLET RAY CURABLE INK JET COMPOSITION AND PRINTED OBJECT | SEIKO EPSON CORP (JP) | 2015-02-12 | — | — | US | disclosed |
| US-8951711-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-8951917-B2 | Composition for forming resist underlayer film and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-8945820-B2 | Silicon-containing resist underlayer film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| EP-2826826-A1 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-01-21 | — | — | EP | disclosed |
| US-8932953-B2 | Composition for forming a silicon-containing resist underlayer film and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-20150004791-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-01 | — | — | US | disclosed |
| EP-2631080-B1 | Recording material | SEIKO EPSON CORP (JP) | 2014-12-31 | — | — | EP | disclosed |
| US-20140363758-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140349224-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-8895638-B2 | Ultraviolet ray curable ink jet composition and printed object | SEIKO EPSON CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20140342289-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-20140329919-A1 | POROUS INORGANIC/ORGANIC HYBRID MATERIALS WITH ORDERED DOMAINS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESSES FOR THEIR PREPARATION | WATERS TECHNOLOGIES CORPORATION (US) | 2014-11-06 | — | — | US | disclosed |
| US-8859450-B2 | Solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859189-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-20140302291-A1 | RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2014-10-09 | — | — | US | disclosed |
| US-8852844-B2 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| CN-101469036-B | Production process of olefin polymerization catalyst component, of olefin polymerization catalyst, and of olefin polymer | SUMITOMO CHEMICAL CO | 2014-09-24 | — | — | CN | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-8835102-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| CN-101792550-B | Production process of propylene block copolymer | SUMITOMO CHEMICAL CO | 2014-09-10 | — | — | CN | disclosed |
| US-8822129-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140228464-A1 | POROUS CARBON-HETEROATOM-SILICON INORGANIC/ORGANIC MATERIALS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESS FOR THE PREPARATION THEREOF | WATERS TECHNOLOGIES CORPORATION (US) | 2014-08-14 | — | — | US | disclosed |
| US-8795819-B2 | Recording material | SEIKO EPSON CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20140212811-A1 | PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| US-20140212796-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| US-8791220-B2 | Porous inorganic/organic homogenous copolymeric hybrid materials for chromatographic separation and process for the preparation thereof | WATERS TECHNOLOGIES CORPORATION (US) | 2014-07-29 | — | — | US | disclosed |
| US-20140205951-A1 | THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SAME, AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-24 | — | — | US | disclosed |
| US-20140193975-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-10 | — | — | US | disclosed |
| US-20140194283-A1 | POROUS INORGANIC/ORGANIC HOMOGENOUS COPOLYMERIC HYBRID MATERIALS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESS FOR THE PREPARATION THEREOF | WATERS TECHNOLOGIES CORPORATION (US) | 2014-07-10 | — | — | US | disclosed |
| US-8771824-B2 | Ultraviolet-curable composition for inkjet and recording material | SEIKO EPSON CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-8759220-B1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-24 | — | — | US | disclosed |
| EP-2172807-B1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-20140154480-A1 | ULTRAVIOLET RAY CURABLE INK COMPOSITION FOR USE IN INK JET METHOD AND PRINTED OBJECT | SEIKO EPSON CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| US-20140154481-A1 | ULTRAVIOLET RAY CURABLE INK COMPOSITION FOR USE IN INK JET METHOD AND PRINTED OBJECT | SEIKO EPSON CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| EP-2738227-A1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | Seiko Epson Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2738228-A1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | Seiko Epson Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2738229-A1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | Seiko Epson Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2172808-B1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-8734906-B2 | Films and method of production thereof | BRISMAT INC. (US) | 2014-05-27 | — | — | US | disclosed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-8715913-B2 | Silicon-containing resist underlayer film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-06 | — | — | US | disclosed |
| US-8697330-B2 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| CN-101812304-B | Liquid crystal aligning agent, liquid crystal display device and fabricating method thereof | JSR CO LTD | 2014-03-19 | — | — | CN | disclosed |
| US-8658277-B2 | Porous inorganic/organic hybrid materials with ordered domains for chromatographic separations and processes for their preparation | WATERS TECHNOLOGIES CORPORATION (US) | 2014-02-25 | — | — | US | disclosed |
| US-8652267-B2 | Coated-type silicon-containing film stripping process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8652750-B2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| CN-101887853-B | Method for producing low-k film, semiconductor device, and method for manufacturing same | ELPIDA MEMORY INC | 2014-02-05 | — | — | CN | disclosed |
| CN-103492499-A | Silica-coating-forming composition for use with inkjets, method for forming silica coating, semiconductor device, and solar-cell system | HITACHI CHEMICAL CO LTD | 2014-01-01 | — | — | CN | disclosed |
| EP-2196858-B1 | Coated-type silicon-containing film stripping process | SHINETSU CHEMICAL CO (JP) | 2013-12-04 | — | — | EP | disclosed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | disclosed |
| US-20130284699-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130284698-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| EP-2657766-A1 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2657767-A1 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2657240-A1 | Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| CN-103374708-A | High temperature atomic layer deposition of silicon oxide thin films | AIR PROD & CHEM | 2013-10-30 | — | — | CN | disclosed |
| US-20130280912-A1 | SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| CN-101016415-B | Composition for forming low refractive index silica-based film | TOKYO OHKA KOGYO CO LTD | 2013-10-16 | — | — | CN | disclosed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | disclosed |
| CN-103289210-A | Polypropylene resin composition and molded body containing same | SUMITOMO CHEMICAL CO | 2013-09-11 | — | — | CN | disclosed |
| EP-2631080-A1 | Recording material | Seiko Epson Corporation (JP) | 2013-08-28 | — | — | EP | disclosed |
| EP-2628744-A1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| EP-2628745-A1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| US-20130206665-A1 | SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS | WATERS TECHNOLOGIES CORPORATION (US) | 2013-08-15 | — | — | US | disclosed |
| US-20130210236-A1 | SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSITION CONTAINING THIS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130210229-A1 | SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMING COMPOSITION CONTAINING THE SAME, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| CN-103242701-A | Recording material | SEIKO EPSON CORP | 2013-08-14 | — | — | CN | disclosed |
| CN-103242702-A | Ultraviolet-curable composition for inkjet and recording material | SEIKO EPSON CORP | 2013-08-14 | — | — | CN | disclosed |
| CN-103242713-A | Composition for inkjet and recording material | SEIKO EPSON CORP | 2013-08-14 | — | — | CN | disclosed |
| EP-2623569-A1 | Composition for inkjet and recording material | Seiko Epson Corporation (JP) | 2013-08-07 | — | — | EP | disclosed |
| EP-2623570-A1 | Ultraviolet-curable composition for inkjet and recording material | Seiko Epson Corporation (JP) | 2013-08-07 | — | — | EP | disclosed |
| US-8501386-B2 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20130196126-A1 | ULTRAVIOLET-CURABLE COMPOSITION FOR INKJET AND RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2013-08-01 | — | — | US | disclosed |
| US-20130196127-A1 | COMPOSITION FOR INKJET AND RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2013-08-01 | — | — | US | disclosed |
| US-20130196125-A1 | RECORDING MATERIAL | SEIKO EPSON CORPORATION (JP) | 2013-08-01 | — | — | US | disclosed |
| US-20130190464-A1 | PROCESS FOR PRODUCING SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-25 | — | — | US | disclosed |
| US-8466229-B2 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD. (JP) | 2013-06-18 | — | — | US | disclosed |
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| CN-101765494-B | Method for producing plastic lens | HOYA CORP | 2013-06-12 | — | — | CN | disclosed |
| EP-2599818-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2599819-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| CN-103131431-A | Display material, liquid crystal alignment agent and liquid crystal display element | JSR CORP | 2013-06-05 | — | — | CN | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137041-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| CN-103087222-A | Olefin polymerization catalyst, process for producing olefin polymer, polypropylene resin composition and article comprising the same | SUMITOMO CHEMICAL CO | 2013-05-08 | — | — | CN | disclosed |
| US-20130109789-A1 | OLEFIN POLYMERIZATION CATALYST, PROCESS FOR PRODUCING OLEFIN POLYMER, POLYPROPYLENE RESIN COMPOSITION AND ARTICLE COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-05-02 | — | — | US | disclosed |
| CN-103044584-A | Method for preparing solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL CO | 2013-04-17 | — | — | CN | disclosed |
| US-20130084438-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | US | disclosed |
| CN-103012628-A | Solid catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO | 2013-04-03 | — | — | CN | disclosed |
| US-8404786-B2 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20130072648-A1 | SOLID CATALYST FOR OLEFIN POLYMERIZATION AND PROCESS FOR PRODUCING OLEFIN POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-03-21 | — | — | US | disclosed |
| EP-1705208-B1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM, AND METHOD FOR FORMING SAME | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| CN-101133364-B | Composition for resist underlayer film and method for producing same | JSR CORP | 2013-03-20 | — | — | CN | disclosed |
| CN-101541534-B | Laminated porous film and separator for nonaqueous electrolyte secondary battery | SUMITOMO CHEMICAL CO | 2013-03-13 | — | — | CN | disclosed |
| US-20130045601-A1 | COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-21 | — | — | US | disclosed |
| EP-2560049-A2 | Composition for forming a silicon-containing resist underlayer film and patterning processing using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-20130040096-A1 | PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-02-14 | — | — | US | disclosed |
| US-8362199-B2 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | HITACHI CHEMICAL CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| CN-101735347-B | Process for producing solid catalyst component precursor for olefin polymerization | SUMITOMO CO LTD | 2013-01-16 | — | — | CN | disclosed |
| US-20130011785-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20130005150-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-03 | — | — | US | disclosed |
| EP-2540780-A1 | Composition for forming resist underlayer film and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-01-02 | — | — | EP | disclosed |
| US-8343711-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-20120321855-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-12-20 | — | — | US | disclosed |
| US-8329376-B2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| US-8322033-B2 | Method for forming a conductive post for a multilayered wiring substrate | SEIKO EPSON CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-20120295076-A1 | ULTRAVIOLET RAY CURABLE INK JET COMPOSITION AND PRINTED OBJECT | SEIKO EPSON CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120282548-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120276483-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |
| EP-2518562-A2 | A patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-10-31 | — | — | EP | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-20120238095-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-2500775-A2 | Patterning process and composition for forming silicon-containing film usable therefor | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-09-19 | — | — | EP | disclosed |
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20120231575-A1 | METHOD FOR PRODUCING SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-2495771-A1 | SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2495770-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-8253251-B2 | Method for producing low-k film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2012-08-28 | — | — | US | disclosed |
| US-20120211076-A1 | SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| CN-101517487-B | Radiation-sensitive composition, method for forming silica-based coating film, device and member having silica-based coating film, and photosensitizer for insulating film | HITACHI CHEMICAL CO LTD | 2012-08-08 | — | — | CN | disclosed |
| US-8236908-B2 | Components and catalysts for the polymerization of olefins | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-07 | — | — | US | disclosed |
| WO-2012096404-A1 | SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-19 | — | — | WO | disclosed |
| CN-102598291-A | Method for manufacturing solar cell | HITACHI CHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102576751-A | Solar cell unit | HITACHI CHEMICAL CO LTD | 2012-07-11 | — | — | CN | disclosed |
| CN-102540543-A | Method for making liquid crystal display element, liquid crystal display element, and polymer composite | JSR CORP | 2012-07-04 | — | — | CN | disclosed |
| CN-101155887-B | Silica-based film-forming composition | TOKYO OHKA KOGYO CO LTD | 2012-06-27 | — | — | CN | disclosed |
| CN-101365736-B | Process for the production of organosilsesquioxanes | WELDING INST | 2012-06-20 | — | — | CN | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20120141789-A1 | POROUS INORGANIC/ORGANIC HYBRID PARTICLES HAVING HIGH ORGANIC CONTENT AND ENHANCED PORE GEOMETRY FOR CHROMATOGRAPHIC SEPARATIONS | WATERS INVESTMENTS LIMITED (US) | 2012-06-07 | — | — | US | disclosed |
| US-20120135146-A1 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES | JSR CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120122036-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2012-05-17 | — | — | US | disclosed |
| US-8173348-B2 | Method of forming pattern and composition for forming of organic thin-film for use therein | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20120103935-A1 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES | JSR CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8138284-B2 | Process for producing propylene block copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-20 | — | — | US | disclosed |
| CN-101541867-B | Porous film and separator for nonaqueous electrolyte secondary battery | SUMITOMO CHEMICAL CO | 2012-03-14 | — | — | CN | disclosed |
| US-20120055860-A1 | HYBRID INORGANIC/ORGANIC MATERIALS HAVING NOVEL SURFACE MODIFICATION; PROCESS FOR THE PREPARATION OF INORGANIC/ORGANIC HYBRID MATERIALS; AND USE OF SAID PARTICLES FOR CHROMATOGRAPHIC SEPARATIONS | WATERS TECHNOLOGIES CORPORATION (US) | 2012-03-08 | — | — | US | disclosed |
| EP-2426558-A1 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-03-07 | — | — | EP | disclosed |
| US-20120052685-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM-FORMED SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8119324-B2 | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film | JSR CORPORATION (JP) | 2012-02-21 | — | — | US | disclosed |
| US-8105970-B2 | Olefin polymerization catalyst component and production process thereof, and production proces of olefin polymerization catalyst and olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20120021190-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-01-26 | — | — | US | disclosed |
| EP-2070975-B1 | POROUS FILM AND SEPARATOR FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SUMITOMO CHEMICAL CO (JP) | 2012-01-25 | — | — | EP | disclosed |
| EP-2067618-B1 | MULTILAYER POROUS FILM AND SEPARATOR FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SUMITOMO CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | disclosed |
| CN-102311739-A | The method of manufacture of liquid crystal aligning agent, liquid crystal display device and liquid crystal display device | JSR CORP | 2012-01-11 | — | — | CN | disclosed |
| US-20110313122-A1 | BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION | MATSUTANI HIROSHI (JP) | 2011-12-22 | — | — | US | disclosed |
| CN-102234341-A | Components and catalysts for the polymerization of olefins | SUMITOMO CHEMICAL CO | 2011-11-09 | — | — | CN | disclosed |
| US-20110269927-A1 | COMPONENTS AND CATALYSTS FOR THE POLYMERIZATION OF OLEFINS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20110269928-A1 | PROCESS FOR PRODUCING SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-03 | — | — | US | disclosed |
| EP-2063319-B1 | Metal oxide-containing film-forming composition, multilayer resist and method of formation of pattern in a substrate | SHINETSU CHEMICAL CO (JP) | 2011-11-02 | — | — | EP | disclosed |
| US-20110254191-A1 | FILM-FORMING COMPOSITION FOR IMPRINTING, METHOD OF MANUFACTURING A STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-20 | — | — | US | disclosed |
| US-8039552-B2 | Process for producing propylene block copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-10-18 | — | — | US | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20110245439-A1 | OLEFIN POLYMERIZATION CATALYST COMPONENT AND PRODUCTION PROCESS THEREOF, AND PRODUCTION PROCES OF OLEFIN POLYMERIZATION CATALYST AND OLEFIN POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-10-06 | — | — | US | disclosed |
| EP-1160848-B1 | Composition for silica-based film formation | JSR CORP (JP) | 2011-10-05 | — | — | EP | disclosed |
| CN-102206295-A | Olefin polymerization catalyst component and production process thereof, and production process of olefin polymerization catalyst and olefin polymer | SUMITOMO CHEMICAL CO | 2011-10-05 | — | — | CN | disclosed |
| US-8029974-B2 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-8030221-B2 | Method for producing low-k l film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-8026038-B2 | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| US-20110223329-A1 | Films and method of production thereof | UNIVERSITY OF QUEENSLAND (AU) | 2011-09-15 | — | — | US | disclosed |
| CN-102187278-A | Photosensitive resin composition, method for forming silica-based coating film, and device and member having silica-based coating film | HITACHI CHEMICAL CO LTD | 2011-09-14 | — | — | CN | disclosed |
| CN-1698018-B | Radiation-curable composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD | 2011-08-31 | — | — | CN | disclosed |
| US-20110165419-A1 | ULTRAHIGH MOLECULAR WEIGHT ETHYLENE-a-OLEFIN OLEFIN COPOLYMER POWDER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-07 | — | — | US | disclosed |
| EP-1981074-B1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2011-06-22 | — | — | EP | disclosed |
| CN-101307209-B | Silicaceous film forming composition, silicaceous film, method for producing the same, and electronic component | HITACHI CHEMICAL CO LTD | 2011-06-08 | — | — | CN | disclosed |
| CN-1957020-B | Organic silica-based film, method for forming the same, wiring structure, semiconductor device, and composition for forming the film | JSR CORP | 2011-06-08 | — | — | CN | disclosed |
| US-7939590-B2 | Composition for forming silica-based coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7939460-B2 | Process for producing solid catalyst component precursor for olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20110077364-A1 | COMPOSITION CONTAINING SILICON-CONTAINING POLYMER, CURED PRODUCT OF THE COMPOSITION, SILICON-CONTAINING POLYMER, AND METHOD OF PRODUCING THE SILICON-CONTAINING POLYMER | JSR CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-7910216-B2 | Process for the production of organosilsesquioxanes | THE WELDING INSTITUTE (GB) | 2011-03-22 | — | — | US | disclosed |
| US-20110049056-A1 | COMPOSITE MATERIALS CONTAINING NANOPARTICLES AND THEIR USE IN CHROMATOGRAPHY | WATERS TECHNOLOGIES CORPORATION (US) | 2011-03-03 | — | — | US | disclosed |
| CN-101394714-B | Method for producing multilayered wiring substrate, multilayered wiring substrate, and electronic apparatus | SEIKO EPSON CORP | 2011-02-23 | — | — | CN | disclosed |
| US-7893538-B2 | Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device | JSR CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| CN-101978008-A | Composition containing silicon-containing polymer and cured product thereof | JSR CORP | 2011-02-16 | — | — | CN | disclosed |
| US-20110034323-A1 | Solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-7879751-B2 | Production process of olefin polymerization catalyst component, of olefin polymerization catalyst, and of olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-01 | — | — | US | disclosed |
| US-7875417-B2 | Heat curable; mixture of hydrolytic condensation of a silicon compound using acid catalyst; second compound is hydrolytic condensation of a silicon compound in presence of basic catalyst; hydroxide or organic acid salt of Group 1a metal; organic acid; alcohol containing ether groups and solvent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-25 | — | — | US | disclosed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | disclosed |
| US-7855043-B2 | Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-21 | — | — | US | disclosed |
| CN-1757445-B | Composition for preparing low dielectric material containing solvent | AIR PROD & CHEM | 2010-12-01 | — | — | CN | disclosed |
| US-20100289143-A1 | METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME | ELPIDA MEMORY, INC (JP) | 2010-11-18 | — | — | US | disclosed |
| CN-101887853-A | Method for producing low-k film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY INC | 2010-11-17 | — | — | CN | disclosed |
| US-20100283133-A1 | FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONSTANT, FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | HAMADA YOSHITAKA | 2010-11-11 | — | — | US | disclosed |
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100273110-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| CN-1950473-B | Insulating film forming composition, preparing method thereof, silica dioxide insulating film and preparing method thereof | JSR CORP | 2010-10-27 | — | — | CN | disclosed |
| CN-1769349-B | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO LTD | 2010-10-06 | — | — | CN | disclosed |
| US-20100239776-A1 | METHOD FOR PRODUCING PLASTIC LENS | HOYA CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| EP-1296365-B1 | Method of film formation | JSR CORP (JP) | 2010-09-22 | — | — | EP | disclosed |
| US-20100233635-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN | JSR CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233482-A1 | Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | HAMADA YOSHITAKA | 2010-09-16 | — | — | US | disclosed |
| US-7786022-B2 | Method for forming insulating film with low dielectric constant | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-31 | — | — | US | disclosed |
| CN-101812304-A | Liquid crystal aligning agent, liquid crystal display device and manufacture method thereof | JSR CO LTD | 2010-08-25 | — | — | CN | disclosed |
| US-20100210765-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-7776397-B2 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| CN-101802713-A | Composition for forming resist underlayer film, process for producing semiconductor device with the same, and additive for composition for forming resist underlayer film | NISSAN CHEMICAL IND LTD | 2010-08-11 | — | — | CN | disclosed |
| CN-101792499-A | Process for producing alpha-olefin polymerization catalyst | SUMITOMO CHEMICAL CO | 2010-08-04 | — | — | CN | disclosed |
| CN-101792550-A | Production process of propylene block copolymer | SUMITOMO CHEMICAL CO | 2010-08-04 | — | — | CN | disclosed |
| US-7754330-B2 | Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20100174038-A1 | PROCESS FOR PRODUCING SOLID CATALYST COMPONENT PRECURSOR FOR OLEFIN POLYMERIZATION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-08 | — | — | US | disclosed |
| US-20100167024-A1 | NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100168341-A1 | PROCESS FOR PRODUCING PROPYLENE BLOCK COPOLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100168327-A1 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100168349-A1 | PROCESS FOR PRODUCING ALPHA-OLEFIN POLYMERIZATION CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-01 | — | — | US | disclosed |
| CN-101765494-A | Method for producing plastic lens | HOYA CORP | 2010-06-30 | — | — | CN | disclosed |
| CN-101759818-A | Process for producing solid catalyst component precursor for olefin polymerization | SUMITOMO CHEMICAL CO | 2010-06-30 | — | — | CN | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100147334-A1 | Coated-type silicon-containing film stripping process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| EP-2196858-A1 | Coated-type silicon-containing film stripping process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
| CN-101735347-A | Process for producing solid catalyst component precursor for olefin polymerization | SUMITOMO CHEMICAL CO | 2010-06-16 | — | — | CN | disclosed |
| US-7736748-B2 | Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same | JSR CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-7732540-B2 | Process for producing olefin copolymerization catalyst and process for producing olefin copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-08 | — | — | US | disclosed |
| CN-101715461-A | Super high molecular weight ethylene-alpha-olefin copolymer powder | SUMITOMO CHEMICAL CO | 2010-05-26 | — | — | CN | disclosed |
| US-20100125125-A1 | PROCESS FOR PRODUCING SOLID CATALYST COMPONENT PRECURSOR FOR OLEFIN POLYMERIZATION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-05-20 | — | — | US | disclosed |
| US-20100119736-A1 | AMBIENT PRESSURE SYNTHESIS OF ZEOLITE FILMS AND THEIR APPLICATION AS CORROSION RESISTANT COATINGS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2010-05-13 | — | — | US | disclosed |
| EP-1138700-B1 | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2010-05-05 | — | — | EP | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |
| EP-1957563-B1 | PROCESS FOR THE PRODUCTION OF ORGANOSILSESQUIOXANES | WELDING INST (GB) | 2010-04-28 | — | — | EP | disclosed |
| US-20100086878-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086872-A1 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086870-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-2172807-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| EP-2172808-A1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-7691931-B2 | Organic-inorganic hybrid material and method of preparing the organic-inorganic hybrid material, and electrophotographic photoreceptor, process cartridge, image forming apparatus and image forming method using the organic-inorganic hybrid material | RICOH COMPANY LTD. (JP) | 2010-04-06 | — | — | US | disclosed |
| EP-2168757-A1 | METHOD FOR PRODUCING PLASTIC LENS | Hoya Corporation (JP) | 2010-03-31 | — | — | EP | disclosed |
| US-7687590-B2 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20100076103-A1 | POROUS CARBON-HETEROATOM-SILICON HYBRID INORGANIC/ORGANIC MATERIALS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESS FOR THE PREPARATION THEREOF | WATERS INVESTMENTS LIMITED (US) | 2010-03-25 | — | — | US | disclosed |
| US-7682701-B2 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2010-03-23 | — | — | US | disclosed |
| US-20100041234-A1 | Process For Restoring Dielectric Properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-20100040953-A1 | POROUS FILM AND SEPARATOR FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-02-18 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20100015515-A1 | LAMINATED POROUS FILM AND SEPARATOR FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20100007025-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100004395-A1 | PROCESS FOR PRODUCING PROPYLENE BLOCK COPOLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-01-07 | — | — | US | disclosed |
| CN-100577270-C | Porous film, and production method and applications thereof | SUMITOMO CHEMICAL CO | 2010-01-06 | — | — | CN | disclosed |
| CN-101619151-A | Process for producing propylene block copolymer | SUMITOMO CHEMICAL CO | 2010-01-06 | — | — | CN | disclosed |
| EP-2135884-A1 | SUPER HIGH MOLECULAR WEIGHT ETHYLENE-ALPHA-OLEFIN COPOLYMER POWDER | Sumitomo Chemical Company, Limited (JP) | 2009-12-23 | — | — | EP | disclosed |
| US-20090311622-A1 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM | JSR CORPORATION (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | PANASONIC CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090294726-A1 | ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090298671-A1 | Compositions for Preparing Low Dielectric Materials Containing Solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-7625642-B2 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | HITACHI CHEMICAL CO., LTD (JP) | 2009-12-01 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| EP-1090967-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORP (JP) | 2009-11-11 | — | — | EP | disclosed |
| CN-101565474-A | Process for producing catalyst for ethylene polymerization and process for producing ethylene polymer | SUMITOMO CHEMICAL CO (JP) | 2009-10-28 | — | — | CN | disclosed |
| US-7605215-B2 | Process for producing olefin copolymerization catalyst and process for producing olefin copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20090251652-A1 | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO., LTD. | 2009-10-08 | — | — | US | disclosed |
| US-20090240017-A1 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-24 | — | — | US | disclosed |
| CN-101541867-A | Porous film and separator for nonaqueous electrolyte secondary battery | SUMITOMO CHEMICAL CO (JP) | 2009-09-23 | — | — | CN | disclosed |
| CN-101541534-A | Laminated porous film and separator for nonaqueous electrolyte secondary battery | SUMITOMO CHEMICAL CO (JP) | 2009-09-23 | — | — | CN | disclosed |
| CN-100537613-C | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2009-09-09 | — | — | CN | disclosed |
| CN-100539037-C | The composition of preparation low dielectric material | AIR PROD & CHEM (US) | 2009-09-09 | — | — | CN | disclosed |
| US-20090220897-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| CN-101517487-A | Radiation-sensitive composition, method for forming silica-based coating film, device and member having silica-based coating film, and photosensitizer for insulating film | HITACHI CHEMICAL CO LTD (JP) | 2009-08-26 | — | — | CN | disclosed |
| US-20090209722-A1 | POROUS INORGANIC/ORGANIC HOMOGENOUS COPOLYMERIC HYBRID MATERIALS FOR CHROMATOGRAPHIC SEPARATION AND PROCESS FOR THE PREPARATION THEREOF | WATERS INVESTMENTS LIMITED (US) | 2009-08-20 | — | — | US | disclosed |
| CN-100522395-C | Solvent for removing residue containing silicon from substrate and removing method for using said solvent | AIR PROD & CHEM (US) | 2009-08-05 | — | — | CN | disclosed |
| US-20090186203-A1 | FILM-FORMING COMPOSITION FOR IMPRINTING, METHOD OF MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| CN-100510961-C | Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2009-07-08 | — | — | CN | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| US-20090171045-A1 | PRODUCTION PROCESS OF OLEFIN POLYMERIZATION CATALYST COMPONENT, OF OLEFIN POLYMERIZATION CATALYST, AND OF OLEFIN POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-02 | — | — | US | disclosed |
| CN-101469036-A | Production process of olefin polymerization catalyst component, of olefin polymerization catalyst, and of olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2009-07-01 | — | — | CN | disclosed |
| CN-101472959-A | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECH HOLDINGS CV (NL) | 2009-07-01 | — | — | CN | disclosed |
| EP-2070975-A1 | POROUS FILM AND SEPARATOR FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Sumitomo Chemical Company, Limited (JP) | 2009-06-17 | — | — | EP | disclosed |
| EP-2067618-A1 | MULTILAYER POROUS FILM AND SEPARATOR FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Sumitomo Chemical Company, Limited (JP) | 2009-06-10 | — | — | EP | disclosed |
| US-20090136869-A1 | METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAINING FILM, METAL OXIDE-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| EP-2063319-A1 | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-05-27 | — | — | EP | disclosed |
| CN-100491486-C | Composition for forming silica coating film, silica coating film and method for producing same, and electronic component | HITACHI CHEMICAL CO LTD (JP) | 2009-05-27 | — | — | CN | disclosed |
| EP-0942007-B1 | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2009-05-13 | — | — | EP | disclosed |
| US-7528207-B2 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20090110838-A1 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090108488-A1 | Process for Production of Hybrid Polymeric Material | KANEKA CORPORATION (JP) | 2009-04-30 | — | — | US | disclosed |
| CN-100480283-C | Process for producing catalyst for alpha-olefin polymerization and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2009-04-22 | — | — | CN | disclosed |
| EP-2048541-A1 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING LOWER-LAYER FILM | JSR Corporation (JP) | 2009-04-15 | — | — | EP | disclosed |
| EP-1127929-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2009-04-15 | — | — | EP | disclosed |
| CN-100478366-C | Solid catalyst component for alpha-olefin polymerization, process for producing catalyst therefor, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2009-04-15 | — | — | CN | disclosed |
| US-7514151-B2 | Insulating film and method for forming the same, and film-forming composition | JSR CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090077798-A1 | METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| CN-101394714-A | Method for producing multilayered wiring substrate, multilayered wiring substrate, and electronic apparatus | SEIKO EPSON CORP (JP) | 2009-03-25 | — | — | CN | disclosed |
| US-20090071706-A1 | METHOD FOR PRODUCING MULTILAYERED WIRING SUBSTRATE, MULTILAYERED WIRING SUBSTRATE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| EP-2034364-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN | JSR Corporation (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| CN-101365736-A | Process for the production of organosilsesquioxanes | WELDING INST (GB) | 2009-02-11 | — | — | CN | disclosed |
| EP-1845132-B1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHINETSU CHEMICAL CO (JP) | 2009-01-21 | — | — | EP | disclosed |
| US-20090018247-A1 | COMPOSITION FOR FORMING SILICA-BASED COATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-15 | — | — | US | disclosed |
| US-20090018012-A1 | Process for Producing Olefin Copolymerization Catalyst and Process for Producing Olefin Copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-15 | — | — | US | disclosed |
| US-20090011372-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-2011830-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-2011829-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-1867681-B1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHINETSU CHEMICAL CO (JP) | 2008-12-31 | — | — | EP | disclosed |
| US-20080317943-A1 | METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080311285-A1 | CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| EP-1999167-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | Novolen Technology Holdings, C.V. (NL) | 2008-12-10 | — | — | EP | disclosed |
| US-7462678-B2 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-20080290521-A1 | FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONSTANT, FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN ETSU CHEMICAL CO., LTD. | 2008-11-27 | — | — | US | disclosed |
| US-20080292863-A1 | SILOXANE POLYMER, PREPARATION METHOD THEREOF, POROUS-FILM FORMING COATING SOLUTION CONTAINING THE POLYMER, POROUS FILM, AND SEMICONDUCTOR DEVICE USING THE POROUS FILM | SHIN ETSU CHEMICAL CO., LTD. | 2008-11-27 | — | — | US | disclosed |
| CN-101312129-A | Activated chemical process for enhancing material properties of dielectric film | AIR PROD & CHEM (US) | 2008-11-26 | — | — | CN | disclosed |
| CN-101307209-A | Silicaceous film forming composition, silicaceous film, method for producing the same, and electronic component | HITACHI CHEMICAL CO LTD (JP) | 2008-11-19 | — | — | CN | disclosed |
| EP-1832351-B1 | Low dielectric materials and methods for making same | AIR PROD & CHEM (US) | 2008-11-12 | — | — | EP | disclosed |
| US-20080274432-A1 | SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-06 | — | — | US | disclosed |
| US-20080268264-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080264672-A1 | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |
| US-20080269368-A1 | addition-condesation copolymers covalently bonded to silica, ceramics, titanium or zirconium oxide, used for chemical analysis | WATERS INVESTMENTS LIMITED (DE) | 2008-10-30 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1981074-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR Corporation (JP) | 2008-10-15 | — | — | EP | disclosed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080227937-A1 | Process for Producing Olefin Copolymerization Catalyst and Process for Producing Olefin Copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-18 | — | — | US | disclosed |
| CN-101252030-A | Compositions for preparing low dielectric materials containing solvents | AIR PROD & CHEM (US) | 2008-08-27 | — | — | CN | disclosed |
| US-20080199977-A1 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-21 | — | — | US | disclosed |
| EP-1959485-A2 | Activated chemical process for enhancing material properties of dielectric films | Air Products and Chemicals, Inc. (US) | 2008-08-20 | — | — | EP | disclosed |
| EP-1246239-B1 | Method of forming dual damascene structure | JSR CORP (JP) | 2008-07-23 | — | — | EP | disclosed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | disclosed |
| US-20080166478-A1 | Composite Material, Coating Liquid and Manufacturing Method of Composite Material | TOTO LTD. (JP) | 2008-07-10 | — | — | US | disclosed |
| CN-101194187-A | Method for forming antireflection film | HITACHI CHEMICAL CO LTD (JP) | 2008-06-04 | — | — | CN | disclosed |
| US-20080114115-A1 | Composition for forming coating and coating formed of composition | TOKYO OHKA KOGYO CO., LTD | 2008-05-15 | — | — | US | disclosed |
| US-7358300-B2 | Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties | HITACHI CHEMICAL CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| CN-101155887-A | Silica-based film-forming composition | TOKYO OHKA KOGYO CO LTD (JP) | 2008-04-02 | — | — | CN | disclosed |
| CN-101133364-A | Composition for resist underlayer film and method for producing same | JSR CORP (JP) | 2008-02-27 | — | — | CN | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-20080038527-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-7326762-B2 | Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2008-02-05 | — | — | US | disclosed |
| US-20080026322-A1 | Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20080012074-A1 | Low Temperature Sol-Gel Silicates As Dielectrics or Planarization Layers For Thin Film Transistors | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-01-17 | — | — | US | disclosed |
| EP-1535976-B1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| EP-1879234-A2 | Low temperature sol-gel silicates as dielectrics or planarization layers for thin film transistors | Air Products and Chemicals, Inc. (US) | 2008-01-16 | — | — | EP | disclosed |
| CN-100362026-C | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2008-01-16 | — | — | CN | disclosed |
| US-20070299176-A1 | Photodefinable low dielectric constant material and method for making and using same | AIR PRODUCTS AND CHEMICALS, INC. | 2007-12-27 | — | — | US | disclosed |
| EP-1867681-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-12-19 | — | — | EP | disclosed |
| CN-101080317-A | Composite material, coating fluid and method for producing composite material | TOTO LTD (JP) | 2007-11-28 | — | — | CN | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-7294585-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-11-13 | — | — | US | disclosed |
| EP-1295903-B1 | Polymeric material, molded product and methods for their production | ORIENT CHEMICAL IND (JP) | 2007-11-07 | — | — | EP | disclosed |
| EP-1852903-A2 | Compositions for preparing materials with a low dielectric constant | Air Products and Chemicals, Inc. (US) | 2007-11-07 | — | — | EP | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| EP-0918061-B1 | Organic-inorganic hybrid polymer material and process for preparing the same | ORIENT CHEMICAL IND (JP) | 2007-10-31 | — | — | EP | disclosed |
| CN-101063818-A | Top coat for lithography processes | AIR PROD & CHEM (US) | 2007-10-31 | — | — | CN | disclosed |
| EP-1845132-A2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shinetsu Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238300-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-10-11 | — | — | US | disclosed |
| EP-1837173-A1 | COMPOSITE MATERIAL, COATING FLUID AND METHOD FOR PRODUCING COMPOSITE MATERIAL | TOTO LTD. (JP) | 2007-09-26 | — | — | EP | disclosed |
| EP-1837086-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-26 | — | — | EP | disclosed |
| WO-2007106348-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | NOVOLEN TECHNOLOGY HOLDINGS C.V. (NL) | 2007-09-20 | — | — | WO | disclosed |
| US-20070213204-A1 | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECHNOLOGY HOLDINGS C.V. | 2007-09-13 | — | — | US | disclosed |
| EP-1832351-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-12 | — | — | EP | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1826613-A2 | Top coat for lithography processes | Air Products and Chemicals, Inc. (US) | 2007-08-29 | — | — | EP | disclosed |
| US-20070196773-A1 | Top coat for lithography processes | VERSUM MATERIALS US, LLC | 2007-08-23 | — | — | US | disclosed |
| CN-101016414-A | Coloring composition for forming a silica film | TOKYO OHKA KOGYO CO LTD (JP) | 2007-08-15 | — | — | CN | disclosed |
| CN-101016415-A | Composition for forming low refractive index silica-based film | TOKYO OHKA KOGYO CO LTD (JP) | 2007-08-15 | — | — | CN | disclosed |
| US-7256151-B2 | Solid catalyst component for α-olefin polymerization, process for producing catalyst therefor, and process for producing α-olefin polymer | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2007-08-14 | — | — | US | disclosed |
| US-20070185263-A1 | COMPOSITION FOR FORMING SILICA-BASED COATING WITH A LOW REFRACTIVE INDEX | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070185262-A1 | COMPOSITION FOR FORMING COLORED SILICA-BASED COATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-09 | — | — | US | disclosed |
| EP-1376671-B1 | Compositions for preparing materials with a low dielectric constant | AIR PROD & CHEM (US) | 2007-06-20 | — | — | EP | disclosed |
| CN-1320073-C | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO LTD (JP) | 2007-06-06 | — | — | CN | disclosed |
| US-20070122636-A1 | PROCESS FOR THE PRODUCTION OF ORGANOSILSESQUIOXANES | THE WELDING INSTITUTE (GB) | 2007-05-31 | — | — | US | disclosed |
| US-20070100014-A1 | Polypropylene, polypropylene resin composition and foamed article | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-05-03 | — | — | US | disclosed |
| CN-1957020-A | Organic silica-based film, method for forming the same, wiring structure, semiconductor device, and composition for forming the film | JSR CORP (JP) | 2007-05-02 | — | — | CN | disclosed |
| CN-1955202-A | Polypropylene, polypropylene resin composition and foamed article | SUMITOMO CHEMICAL CO (JP) | 2007-05-02 | — | — | CN | disclosed |
| CN-1955196-A | Process for producing catalyst for alpha-olefin polymerization and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2007-05-02 | — | — | CN | disclosed |
| CN-1954017-A | Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation | JSR CORP (JP) | 2007-04-25 | — | — | CN | disclosed |
| CN-1950473-A | Insulating film forming composition, preparing method thereof, silica dioxide insulating film and preparing method thereof | JSR CORP (JP) | 2007-04-18 | — | — | CN | disclosed |
| US-7205030-B2 | Method for forming porous film | SANYO ELECTRIC CO., LTD. (JP) | 2007-04-17 | — | — | US | disclosed |
| CN-1307219-C | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2007-03-28 | — | — | CN | disclosed |
| EP-1138701-B1 | Process for producing catalyst for ethylene polymerization and process for producing ethylene polymer | SUMITOMO CHEMICAL CO (JP) | 2007-03-21 | — | — | EP | disclosed |
| CN-1303112-C | Process for producing alpha-olefine polymerized catayst and alpha-olefine polymers | SUMITOMO CHEMICAL CO (JP) | 2007-03-07 | — | — | CN | disclosed |
| CN-1911968-A | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2007-02-14 | — | — | CN | disclosed |
| US-20070031687-A1 | Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| US-20070027287-A1 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070020467-A1 | Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070021580-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1088868-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORP (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746139-A1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746122-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746123-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-20070015892-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-18 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7157542-B2 | produced by polymerizing an unsaturated reactive silicon-containing monomer and a compatible unsaturated monomer (especially ethylene) using a macropolymerization initiator having a polycondensation segment (especially polycarbonate) | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| EP-1295924-B1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORP (JP) | 2006-12-13 | — | — | EP | disclosed |
| US-20060275614-A1 | Insulating film and method for forming the same, and film-forming composition | JSR CORPORATION (JP) | 2006-12-07 | — | — | US | disclosed |
| CN-1288174-C | Process for producing alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2006-12-06 | — | — | CN | disclosed |
| US-7135532-B2 | Titanium compound reduced with organomagnesium; product contacted with electron donor, halogen/groupIVA, acid halide, and Titanium-halide compounds to form coordination catalyst | SUNITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-11-14 | — | — | US | disclosed |
| US-20060249713-A1 | Compositions for preparing low dielectric materials | VERSUM MATERIALS US, LLC | 2006-11-09 | — | — | US | disclosed |
| EP-1719793-A1 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20060234031-A1 | Porous film, and production method and applications thereof | SUMITOMO CHEMICAL COMPANY, LIMITED | 2006-10-19 | — | — | US | disclosed |
| CN-1846840-A | Porous film, and production method and applications thereof | SUMITOMO CHEMICAL CO (JP) | 2006-10-18 | — | — | CN | disclosed |
| US-7122880-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-10-17 | — | — | US | disclosed |
| EP-1253175-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-10-11 | — | — | EP | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| EP-1705208-A1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705206-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705207-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| US-7108954-B2 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-7109142-B2 | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-09-19 | — | — | US | disclosed |
| CN-1273869-C | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2006-09-06 | — | — | CN | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20060183055-A1 | Method for defining a feature on a substrate | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | disclosed |
| EP-1691410-A2 | Method for defining a feature on a substrate | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | disclosed |
| EP-1122770-B1 | Silica-based insulating film and its manufacture | JSR CORP (JP) | 2006-08-09 | — | — | EP | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20060122303-A1 | Organic-inorganic hybrid material and method of preparing the organic-inorganic hybrid material, and electrophotographic photoreceptor, process cartridge, image forming apparatus and image forming method using the organic-inorganic hybrid material | RICOH COMPANY, LTD. (JP) | 2006-06-08 | — | — | US | disclosed |
| US-20060110610-A1 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-05-25 | — | — | US | disclosed |
| US-7049263-B2 | Process for producing catalyst for α-olefin polymerization and process for producing α-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-05-23 | — | — | US | disclosed |
| CN-1772771-A | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2006-05-17 | — | — | CN | disclosed |
| US-20060100405-A1 | Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material | ARAKAWA MOTOOMI | 2006-05-11 | — | — | US | disclosed |
| CN-1769349-A | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO LTD (JP) | 2006-05-10 | — | — | CN | disclosed |
| CN-1252094-C | Process for preparing solid product, solid catalyst and olefine polymerization cataly st, and process for preparing olefine polymers | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1757445-A | Composition for preparing low dielectric material containing solvent | AIR PROD & CHEM (US) | 2006-04-12 | — | — | CN | disclosed |
| US-7026053-B2 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-04-11 | — | — | US | disclosed |
| EP-1640399-A1 | POLYCARBONATE OR POLYESTER HAVING REACTIVE SILICON-CONTAINING GROUP AND ORGANIC/INORGANIC HYBRID POLYMERIC MATERIAL | Orient Chemical Industries, Ltd. (JP) | 2006-03-29 | — | — | EP | disclosed |
| CN-1247620-C | Solid catalyst component for olefine polymerization and its preparation, process for preparing olefine polymerization catalyst and process for preparing olefine polymer | SUMITOMO CHEMICAL CO (JP) | 2006-03-29 | — | — | CN | disclosed |
| EP-1045290-B1 | Composition for resist underlayer film and method for producing the same | JSR CORP (JP) | 2006-03-15 | — | — | EP | disclosed |
| CN-1245664-C | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORP (JP) | 2006-03-15 | — | — | CN | disclosed |
| US-7011868-B2 | Fluorine-free plasma curing process for porous low-k materials | AXCELIS TECHNOLOGIES, INC. (US) | 2006-03-14 | — | — | US | disclosed |
| US-20060052566-A1 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-09 | — | — | US | disclosed |
| EP-1146092-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-03-08 | — | — | EP | disclosed |
| US-20060047034-A1 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-02 | — | — | US | disclosed |
| CN-1739190-A | Fluorine-free plasma curing method for porous Low-K material | AXCELIS TECH INC (US) | 2006-02-22 | — | — | CN | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20060006541-A1 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-01-12 | — | — | US | disclosed |
| EP-1615260-A2 | Organic silicon-oxide-based film, composition and method for forming the same, and semiconductor device | JSR Corporation (JP) | 2006-01-11 | — | — | EP | disclosed |
| CN-1714951-A | Solvent for removing residue containing silicon from substrate and removing method for using said solvent | AIR PROD & CHEM (US) | 2006-01-04 | — | — | CN | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| CN-1713787-A | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORP (JP) | 2005-12-28 | — | — | CN | disclosed |
| CN-1232544-C | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2005-12-21 | — | — | CN | disclosed |
| CN-1704434-A | Solid catalyst component for alpha-olefin polymerization, process for producing catalyst therefor, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2005-12-07 | — | — | CN | disclosed |
| US-20050267272-A1 | Solid catalyst component for alpha-olefin polymerization, process for producing catalyst therefor, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-12-01 | — | — | US | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050260420-A1 | Low dielectric materials and methods for making same | VERSUM MATERIALS US, LLC | 2005-11-24 | — | — | US | disclosed |
| US-20050255326-A1 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2005-11-17 | — | — | US | disclosed |
| CN-1698018-A | Radiation-curable composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2005-11-16 | — | — | CN | disclosed |
| CN-1698017-A | Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2005-11-16 | — | — | CN | disclosed |
| US-6965001-B2 | Organic-inorganic hybrid polymer materials with compositional gradient, and processes for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-15 | — | — | US | disclosed |
| EP-1593149-A1 | FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS | Axcelis Technologies, Inc. (US) | 2005-11-09 | — | — | EP | disclosed |
| CN-1690091-A | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2005-11-02 | — | — | CN | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1583141-A2 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-05 | — | — | EP | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| CN-1216320-C | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2005-08-24 | — | — | CN | disclosed |
| US-20050174880-A1 | Melt kneading thermoplastic resin which is polycarbonate, polysiloxane, polysulfone, polyamide, polyacetal, polyethylene terephthalate, or polybutylene terephthalate, with metal alkoxy groups attached; high performance; injection molding; extrusion molding | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-11 | — | — | US | disclosed |
| US-20050176577-A1 | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-08-11 | — | — | US | disclosed |
| EP-1117102-B1 | Method of manufacturing material for forming insulating film | JSR CORP (JP) | 2005-08-10 | — | — | EP | disclosed |
| EP-1058274-B1 | Composition for film formation and material for insulating film formation | JSR CORP (JP) | 2005-07-27 | — | — | EP | disclosed |
| CN-1639283-A | Composition for forming silica coating film, silica coating film and method for producing same, and electronic component | HITACHI CHEMICAL CO LTD (JP) | 2005-07-13 | — | — | CN | disclosed |
| CN-1637097-A | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO LTD (JP) | 2005-07-13 | — | — | CN | disclosed |
| US-6902771-B2 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2005-06-07 | — | — | US | disclosed |
| US-6903041-B2 | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20050118742-A1 | Method for reducing the adhesive properties of MEMS and anti-adhesion-coated device | ROBERT BOSCH GMBH (DE) | 2005-06-02 | — | — | US | disclosed |
| US-20050119394-A1 | Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties | HITACHI CHEMICAL CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| EP-1535976-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-20050112386-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORPORATION (JP) | 2005-05-26 | — | — | US | disclosed |
| US-6890605-B2 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2005-05-10 | — | — | US | disclosed |
| US-20050096415-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20050079973-A1 | Process for producing solid catalyst component and catalyst for alpha-olefin polymerization, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-04-14 | — | — | US | disclosed |
| EP-1520891-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR Corporation (JP) | 2005-04-06 | — | — | EP | disclosed |
| US-20050059542-A1 | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-03-17 | — | — | US | disclosed |
| CN-1191282-C | Solid catalyst component and catalyst for olefin polymerization, its preparing method, and process for preparing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2005-03-02 | — | — | CN | disclosed |
| US-20050042464-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2005-02-24 | — | — | US | disclosed |
| US-6858685-B2 | Solid catalyst component for olefin polymerization, process for producing the same, process for producing catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| CN-1576287-A | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2005-02-09 | — | — | CN | disclosed |
| CN-1185264-C | Method for preparing solid catalyst components and catalyst for alpha-olefin polymerization and process for preparing alpha-olefin polymers | SUMITOMO CHEMICAL CO (JP) | 2005-01-19 | — | — | CN | disclosed |
| US-6841503-B2 | Process for producing solid catalyst component and catalyst for α-olefin polymerization, and process for producing α-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-11 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-6838412-B2 | α-Olefin polymerization catalyst and process for producing α-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6828396-B2 | Coordination catalyst for alpha-olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-12-07 | — | — | US | disclosed |
| US-6828078-B2 | Photoresist for use in optoelectronic and display fields; porosity; optical fibers | JSR CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-6818736-B2 | OBTAINED BY MELT-KNEADING, USING A KNEADING APPARATUS, A RESIN COMPOSITION CONTAINING AN ORGANIC POLYMER HAVING NO METAL ALKOXY GROUP AND A METAL ALKOXIDE COMPOUND; SUITABLE FOR HIGH PERFORMANCE AND HIGH FUNCTION PLASTIC APPLICATIONS | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-20040213911-A1 | Method for forming porous film | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-10-28 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| EP-0972809-B1 | Organic-inorganic hybrid polymer materials with compositional gradient, and processes for preparing the same | ORIENT CHEMICAL IND (JP) | 2004-10-06 | — | — | EP | disclosed |
| US-6800330-B2 | PRODUCT OBTAINED BY HYDROLYZING AND CONDENSING AT LEAST ONE SILANE COMPOUND, A COMPOUND COMPATIBLE WITH OR DISPERSIBLE IN THAT COMPOUND AND HAVING A BOILING POINT OR DECOMPOSITION TEMPERATURE OF 250-450 DEGREES C, SOLVENT | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| EP-1016458-B1 | Photocatalyst comprising organic-inorganic hybrid materials, and processes for preparing the same | ORIENT CHEMICAL IND (JP) | 2004-09-29 | — | — | EP | disclosed |
| CN-1168746-C | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | ס�ѻ�ѧ��ҵ��ʽ���� | 2004-09-29 | — | — | CN | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-6787193-B2 | DECOMPOSITION OF AN ORGANOSILICON COMPOUND | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| CN-1164624-C | Prepn. of alpha-olefine polymerization solid catalyst component and catalyst, and prepn. of alpha-olefine polymers | ס�ѻ�ѧ��ҵ��ʽ���� | 2004-09-01 | — | — | CN | disclosed |
| WO-2004066374-A1 | FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS | AXCELIS TECHNOLOGIES, INC. (US) | 2004-08-05 | — | — | WO | disclosed |
| US-6770326-B2 | COMPRISES POLYSILOXANE GEL AND FILLERS (ALUMINUM OXIDE, ZINC OXIDE, AND BORON NITRIDE) FOR ENCAPSULATING ELECTRONIC CIRCUITRY | LORD CORPORATION | 2004-08-03 | — | — | US | disclosed |
| EP-1437176-A1 | Multilayered organic-inorganic hybrid material and processes for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2004-07-14 | — | — | EP | disclosed |
| US-20040127663-A1 | Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2004-07-01 | — | — | US | disclosed |
| US-6749944-B2 | VAPOR DEPOSITION, OSCILLATION, HEATING USING ORGANOSILICON COMPOUND; FORMING DIELECTRIC | JSR CORPORATION (JP) | 2004-06-15 | — | — | US | disclosed |
| US-20040092679-A1 | Process for producing catalyst for alpha-olefin polymerization and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-05-13 | — | — | US | disclosed |
| EP-1090934-B1 | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL CO (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-6727333-B2 | EFFICIENCY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-04-27 | — | — | US | disclosed |
| CN-1146584-C | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component | ס�ѻ�ѧ��ҵ��ʽ���� | 2004-04-21 | — | — | CN | disclosed |
| CN-1487567-A | Composition for producing low dielectric material | �����Ʒ�뻯ѧ��˾ | 2004-04-07 | — | — | CN | disclosed |
| EP-1398354-A1 | POLYMERIC MATERIAL, MOLDED ARTICLE, AND PROCESSES FOR PRODUCING THESE | Orient Chemical Industries, Ltd. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| US-6703456-B2 | REDUCING TITANIUM COMPOUND WITH ORGANOMAGNESIUM COMPOUND IN PRESENCE OF ORGANOSILICON COMPOUND, AGING SOLID FORMED, HEATING WITH ETHER, TITANIUM TETRACHLORIDE AND ORGANIC ACID HALIDE, CONTACTING WITH ALUMINUM COMPOUND AND ELECTRON DONOR | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-03-09 | — | — | US | disclosed |
| CN-1479769-A | Radiation-sensitive refractive index-changeable composition and refractive index changing method | ������ʱ����ʽ���� | 2004-03-03 | — | — | CN | disclosed |
| US-20040039094-A1 | Coating compositions | WELDING INSTITUTE, THE (GB) | 2004-02-26 | — | — | US | disclosed |
| US-20040028916-A1 | Fluorine-free plasma curing process for porous low-k materials | AXCELIS TECHNOLOGIES, INC. | 2004-02-12 | — | — | US | disclosed |
| US-20040030067-A1 | PROCESS FOR PRODUCING CATALYST FOR ALPHA-OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCING ALPHA-OLEFIN POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-02-12 | — | — | US | disclosed |
| CN-1473858-A | Process for producing alpha-olefine polymerized catayst and alpha-olefine polymers | 住友化学工业株式会社 | 2004-02-11 | — | — | CN | disclosed |
| US-6683139-B2 | MADE BY REDUCING A TITANIUM COMPOUND SUCH AS POLYTITANATE WITH AN ORGANOMAGNESIUM COMPOUND IN THE PRESENCE OF AN ORGANOSILICON COMPOUND HAVING AN SI-O BOND, AN INORGANIC FINE PARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-01-27 | — | — | US | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| US-6680360-B2 | STEREOSPECIFIC POLYMERIZATION CATALYSTS FORMED BY REDUCING TITANIUM COMPOUND WITH ORGANOMAGNESIUM COMPOUNDS IN THE PRESENCE OF ORGANOSILICON COMPOUND AND ACIDS, TO FORM SOLIDS CONTAINING TITANIUM, ORGANOALUMINUM AND SILICON COMPOUNDS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-01-20 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |
| CN-1462300-A | Coating compositions | WELDING INST (GB) | 2003-12-17 | — | — | CN | disclosed |
| US-6645881-B2 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6642352-B2 | Providing a silicon inorganic polymer compound or polyarylenes or polyphenylene ether organic polymer compound, treating the polymeric compound with a zeta-potential producing filter material, and producing curable polymer compound | JSR CORPORATION (JP) | 2003-11-04 | — | — | US | disclosed |
| US-20030195108-A1 | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | KUMAMOTO SHIN-ICHI (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030157340-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| CN-1117773-C | Solid catalyst component for alpha-olefin polymerization, catalyst for alpha-olefin polymerization, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2003-08-13 | — | — | CN | disclosed |
| CN-1432583-A | Process for producing alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2003-07-30 | — | — | CN | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030139063-A1 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | TOSHIBA MEMORY CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030134992-A1 | Process for producing catalyst for alpha -olefin polymerization and process for producing alpha -olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-07-17 | — | — | US | disclosed |
| US-20030130110-A1 | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component for olefin polymerization | MIYATAKE TATSUYA (JP) | 2003-07-10 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| CN-1427306-A | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| US-6576393-B1 | Hydrolysate and/or a condensate of a siloxane compound; compound generating an acid by ultraviolet irradiation and/or heating; adhesion, resistance to a developing solution, decrease in film loss in oxygen ashing of the resist | JSR CORPORATION (JP) | 2003-06-10 | — | — | US | disclosed |
| US-20030104225-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-06-05 | — | — | US | disclosed |
| US-20030100440-A1 | To produce highly stereoregular alpha - olefin polymer containing an extremely little catalyst residue | SATOH MAKOTO (JP) | 2003-05-29 | — | — | US | disclosed |
| US-6566464-B2 | Stereospecifity to improve rigidity of polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-20 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| CN-1107682-C | alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2003-05-07 | — | — | CN | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| CN-1408734-A | Solid catalyst component for olefine polymerization and its preparation, process for preparing olefine polymerization catalyst and process for preparing olefine polymer | SUMITOMO CHEMICAL CO (JP) | 2003-04-09 | — | — | CN | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| US-20030065111-A1 | Solid catalyst component for olefin polymerization, process for producing the same, process for producing catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-04-03 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20030059550-A1 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| US-20030059628-A1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| EP-1295903-A2 | Polymeric material, molded product and methods for their production | Orient Chemical Industries, Ltd. (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1296365-A2 | Method of film formation, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1295924-A2 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-6538079-B2 | Coordination catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-25 | — | — | US | disclosed |
| US-20030050419-A1 | High thermal conductivity spin castable potting compound | LORD CORPORATION | 2003-03-13 | — | — | US | disclosed |
| US-20030045675-A1 | Polymeric material, molded product and methods for their production | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2003-03-06 | — | — | US | disclosed |
| CN-1102600-C | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL CO (JP) | 2003-03-05 | — | — | CN | disclosed |
| US-6521725-B2 | Contacting with one another a solid catalyst containing atleast titanium, magnesium and halogen atoms, an organoaluminum compounds and a compound selected from organoester with atleast two ester group, a cyclic ketone | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-02-18 | — | — | US | disclosed |
| EP-0894098-B1 | HIGH IMPACT LLDPE FILMS | EXXONMOBIL OIL CORP (US) | 2003-02-05 | — | — | EP | disclosed |
| WO-2003004567-A1 | HIGH THERMAL CONDUCTIVITY SPIN CASTABLE POTTING COMPOUND | LORD CORPORATION (US) | 2003-01-16 | — | — | WO | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| US-6503633-B2 | Semiconductors | JSR CORPORATION (JP) | 2003-01-07 | — | — | US | disclosed |
| CN-1388919-A | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2003-01-01 | — | — | CN | disclosed |
| US-20020189495-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| US-20020193243-A1 | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component | NOMURA KOTOHIRO (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6495264-B2 | HYDROLYSIS AND CONDENSATION OF SILANE COMPOUND IN PRESENCE OF WATER AND TETRAALKYLAMMONIUM HYDROXIDES, ALICYCLIC AMINES, AND METAL HYDROXIDES IN SOLVENT FOR FORMING DIELECTRIC LAYER FOR SEMICONDUCTORS | JSR CORPORATION (JP) | 2002-12-17 | — | — | US | disclosed |
| US-6476098-B1 | Organic-inorganic composite material and process for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| US-20020161095-A1 | Olefin polymer composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-10-31 | — | — | US | disclosed |
| EP-1253175-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| US-6472079-B2 | PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). | JSR CORPORATION (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6468937-B1 | CARBOXYL GROUP-CARRYING POLYMER CARRIER PARTICLES HAVE SPHERICAL OR ELLIPTICAL SHAPE; AN ORGANOMETALLIC COMPOUND; A GROUP 4 METAL COMPOUND; A PHENOL COMPOUND; HIGH MOLECULAR WEIGHT,SUPERIOR POWDER PROPERTIES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-22 | — | — | US | disclosed |
| US-6465368-B2 | DISSOLVING POLYMER IN SOLVENT; FORMING DIELECTRIC FILMS | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| US-20020142586-A1 | Method of forming dual damascene structure | JSR CORPORATION (JP) | 2002-10-03 | — | — | US | disclosed |
| EP-1246239-A1 | Method of forming dual damascene structure | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-6458910-B1 | BLOWN FILMS OF LINEAR LOW DENSITY POLYETHYLENE ARE PRODUCED BY A HIGH STALK PROCESS COMPRISING EXTRUDING THE LINEAR LOW DENSITY POLYETHYLENE THROUGH AN ANNULAR DIE TO FORM AN EXTRUDED TUBE OF MOLTEN MATERIAL, COOLING THE EXTRUDED TUBE | EXXONMOBIL OIL CORPORATION | 2002-10-01 | — | — | US | disclosed |
| US-20020128402-A1 | Process for producing solid product, solid catalyst component, and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-09-12 | — | — | US | disclosed |
| US-20020122891-A1 | Organic-inorganic hybrid polymer materials with compositional gradient, and processes for preparing the same | ARAKAWA MOTOOMI (JP) | 2002-09-05 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| CN-1364825-A | Olefine polymer composition | SUMITOMO CHEMICAL CO (JP) | 2002-08-21 | — | — | CN | disclosed |
| CN-1364816-A | Process for preparing solid product, solid catalyst and olefine polymerization cataly st, and process for preparing olefine polymers | SUMITOMO CHEMICAL CO (JP) | 2002-08-21 | — | — | CN | disclosed |
| US-20020086167-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| EP-1219643-A1 | Olefin polymer composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-07-03 | — | — | EP | disclosed |
| EP-1219644-A1 | Process for producing solid product, solid catalyst component, and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6413647-B1 | USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH | JSR CORPORATION (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6410150-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6406794-B1 | POLYETHERSILOXANE COPOLYMER | JSR CORPORATION (JP) | 2002-06-18 | — | — | US | disclosed |
| EP-0748819-B1 | Process for the preparation of alpha-olefin polymerization catalysts and process for producing an alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2002-05-29 | — | — | EP | disclosed |
| US-6395667-B1 | CONTROLLING PARTICLE SIZE | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6395341-B1 | ORGANIC POLYMER AND METAL ALKOXIDE | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20020045693-A1 | Composition for film formation, method of film formation and silica-based film | JSR CORPORATION (JP) | 2002-04-18 | — | — | US | disclosed |
| US-20020020327-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-02-21 | — | — | US | disclosed |
| CN-1077113-C | Catalyst composition | MOBIL OIL CORP (US) | 2002-01-02 | — | — | CN | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-6331501-B1 | COORDINATION CATALYST COMPRIMISING ORGANOSILICON,-MAGNESIUM, -ALUMINUM AND -TITANIUM COMPOUNDS; TITANIUM TETRACHLORIDE, ACYL HALIDE, ESTER AND ETHER; POWDER PROPERTIES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-12-18 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| CN-1319614-A | Method for producing catalyst for ethylene polymerization and method for producing ethylene polymer | SUMITOMO CHEMICAL CO (JP) | 2001-10-31 | — | — | CN | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| US-20010031696-A1 | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-18 | — | — | US | disclosed |
| US-20010031840-A1 | Process for producing catalyst for ethylene polymerization and process for producing ethylene polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-18 | — | — | US | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| CN-1316442-A | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2001-10-10 | — | — | CN | disclosed |
| EP-1138701-A1 | Process for producing catalyst for ethylene polymerization and process for producing ethylene polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-04 | — | — | EP | disclosed |
| EP-1138700-A2 | Process for producing catalyst for olefin polymerization and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-04 | — | — | EP | disclosed |
| US-20010021687-A1 | Solid catalyst component and catalyst for olefin polymerization, and method for producing olefin polymer | KUMAMOTO SHIN-ICHI (JP) | 2001-09-13 | — | — | US | disclosed |
| CN-1312299-A | Method for preparing solid catalyst components and catalyst for alpha-olefin polymerization and process for preparing alpha-olefin polymers | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| CN-1311260-A | Prepn. of alpha-olefine polymerization solid catalyst component and catalyst, and prepn. of alpha-olefine polymers | SUMITOMO CHEM ENG (JP) | 2001-09-05 | — | — | CN | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| US-6281302-B1 | Solid catalyst component, catalyst for olefin polymerization, and method for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-28 | — | — | US | disclosed |
| US-20010016633-A1 | Process for producing solid catalyst component and catalyst for alpha-olefin polymerization, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| US-20010014765-A1 | Process for producing solid catalyst component and catalyst for alpha-olefin polymerization, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-16 | — | — | US | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-6235101-B1 | SILICON HYDROLYZATE, METAL CHELATE, ORGANIC SOLVENT AND BETA DIKETONE FOR FILMS | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| US-6228796-B1 | ORGANIC-INORGANIC HYBRID MATERIAL, SURFACE OF WHICH IS SUPPLIED WITH LAYER HAVING PHOTO-CATALYSIS, WITHOUT PHOTO-DEGRADATION OF SUBSTRATE | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2001-05-08 | — | — | US | disclosed |
| CN-1292390-A | Solid catalyst component and catalyst for olefin polymerization, its preparing method, and process for preparing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 2001-04-25 | — | — | CN | disclosed |
| EP-1090934-A1 | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component for olefin polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| US-6187883-B1 | OBTAINED BY REDUCING A TITANIUM COMPOUND WITH AN ORGANOMAGNESIUM COMPOUND IN THE PRESENCE OF AN ORGANOSILICON COMPOUND AND AN ESTER, THEN TREATING THE SOLID PRODUCT WITH TITANIUM TETRACHLORIDE AND AN ETHER OR AN ORGANIC ACID HALIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0446801-B1 | Solid catalyst component for use in polymerization of alpha-olefins | SUMITOMO CHEMICAL CO (JP) | 2001-02-07 | — | — | EP | disclosed |
| EP-0894098-A4 | HIGH IMPACT LLDPE FILMS | MOBIL OIL CORP (US) | 2001-01-24 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1054035-A2 | Organic-inorganic composite material and process for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-22 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| US-6103854-A | POLYMER HAVING A POLYCARBONATE AND/OR A POLYARYLATE MOIETY AS A MAIN FRAME AND HAVING A METAL ALKOXIDE GROUP AS A FUNCTIONAL GROUP, IS HYDROLYZED AND POLYCONDENSED TO FORM CROSSLINKAGES; HEAT RESISTANCE, HARDNESS, STRENGTH | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2000-08-15 | — | — | US | disclosed |
| EP-1016458-A2 | Photocatalyst comprising organic-inorganic hybrid materials, and processes for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2000-07-05 | — | — | EP | disclosed |
| EP-0761700-B1 | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL CO (JP) | 2000-07-05 | — | — | EP | disclosed |
| US-6057413-A | HEAT SEALING FILM WITH HAZE FORMED BY MELT EXTRUSION OF COPOLYMER IN THE ABSENCE OF SOLVENT IN THE PRESENCE OF CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-02 | — | — | US | disclosed |
| US-6051526-A | α-olefin polymerization catalyst and process for producing α-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0972809-A2 | Organic-inorganic hybrid polymer materials with compositional gradient, and processes for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 2000-01-19 | — | — | EP | disclosed |
| CN-1232828-A | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component | SUMITOMO CHEMICAL CO (JP) | 1999-10-27 | — | — | CN | disclosed |
| EP-0949272-A2 | Solid catalyst component and catalyst for olefin polymerization, process for producing olefin polymer and process for producing solid catalyst component | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-10-13 | — | — | EP | disclosed |
| CN-1230552-A | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1999-10-06 | — | — | CN | disclosed |
| EP-0942007-A2 | Solid catalyst component and catalyst for olefin polymerization, and process for producing olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-09-15 | — | — | EP | disclosed |
| EP-0747400-B1 | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1999-09-08 | — | — | EP | disclosed |
| EP-0921561-A2 | Composition for film formation and film | JSR Corporation (JP) | 1999-06-09 | — | — | EP | disclosed |
| CN-1218814-A | Catalyst for olefine polymerization and process for producing olefine polymers | SUMITOMO CHEMICAL CO (JP) | 1999-06-09 | — | — | CN | disclosed |
| EP-0918061-A2 | Organic-inorganic hybrid polymer material and process for preparing the same | ORIENT CHEMICAL INDUSTRIES, LTD. (JP) | 1999-05-26 | — | — | EP | disclosed |
| EP-0657473-B1 | Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst | SUMITOMO CHEMICAL CO (JP) | 1999-04-21 | — | — | EP | disclosed |
| EP-0736046-B1 | CATALYST COMPOSITION | MOBIL OIL CORP (US) | 1999-03-03 | — | — | EP | disclosed |
| EP-0894098-A1 | HIGH IMPACT LLDPE FILMS | MOBIL OIL CORPORATION (US) | 1999-02-03 | — | — | EP | disclosed |
| CN-1206014-A | Solid catalyst component, catalyst for olefin polymerization, and method for producing olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1999-01-27 | — | — | CN | disclosed |
| US-5854164-A | Method for preparing catalyst component for olefin polymerization, catalyst for olefin polymerization and process for producing olefin polymer with the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5840244-A | EXTRUDING LINEAR LOW DENSITY POLYETHYLENE INTO TUBES OR SPHERES HAVING THIN WALLS | MOBIL OIL CORPORATION (US) | 1998-11-24 | — | — | US | disclosed |
| CN-1174850-A | Solid catalyst component for alpha-olefin polymerization, catalyst for alpha-olefin polymerization, and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1998-03-04 | — | — | CN | disclosed |
| EP-0612327-B1 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS | MOBIL OIL CORP (US) | 1997-12-29 | — | — | EP | disclosed |
| EP-0736046-A4 | CATALYST COMPOSITION | MOBIL OIL CORP (US) | 1997-11-26 | — | — | EP | disclosed |
| WO-1997039035-A1 | HIGH IMPACT LLDPE FILMS | MOBIL OIL CORPORATION (US) | 1997-10-23 | — | — | WO | disclosed |
| EP-0669944-B1 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS | MOBIL OIL CORP (US) | 1997-10-15 | — | — | EP | disclosed |
| CN-1159454-A | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL CO (JP) | 1997-09-17 | — | — | CN | disclosed |
| CN-1154372-A | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1997-07-16 | — | — | CN | disclosed |
| CN-1152582-A | Method for preparing catalyst component for olefin polymerization, catalyst for olefin polymerization and process for producing olefin polymer with catalyst | SUMITOMO CHEMICAL CO (JP) | 1997-06-25 | — | — | CN | disclosed |
| CN-1151407-A | alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1997-06-11 | — | — | CN | disclosed |
| EP-0768322-A1 | Method for preparing catalyst component for olefin polymerization, catalyst for olefin polymerization and process for producing olefin polymer with the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0417346-B1 | Process for producing solid catalyst for use in polymerization of olefins | SUMITOMO CHEMICAL CO (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0761700-A2 | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1997-03-12 | — | — | EP | disclosed |
| US-5608018-A | CONTAINING TRIVALENT TITANIUM COMPOUND MADE BY REDUCING A TETRAVALENT HYDROCARBYLOXYTITANIUM COMPOUND MIXED WITH ORGANOSILOXY COMPOUND AND ESTER BY MEANS OF ORGANOMAGNESIUM COMPOUND, ESTER-TREATING AND ETHER-TICL4-TREATING PRODUCT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-03-04 | — | — | US | disclosed |
| CN-1141305-A | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL CO (JP) | 1997-01-29 | — | — | CN | disclosed |
| EP-0749984-A2 | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-12-27 | — | — | EP | disclosed |
| EP-0748819-A1 | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-12-18 | — | — | EP | disclosed |
| CN-1138337-A | Catalyst composition | MOBIL OIL CORP (US) | 1996-12-18 | — | — | CN | disclosed |
| EP-0747400-A1 | Alpha-olefin polymerization catalyst and process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0736046-A1 | CATALYST COMPOSITION | MOBIL OIL CORPORATION (US) | 1996-10-09 | — | — | EP | disclosed |
| EP-0539937-B1 | Process for producing olefin polymers | SUMITOMO CHEMICAL CO (JP) | 1996-09-18 | — | — | EP | disclosed |
| US-5550094-A | COORDINATION CATALYST | MOBIL OIL CORPORATION (US) | 1996-08-27 | — | — | US | disclosed |
| EP-0397122-B1 | Olefin polymerization catalyst and process for producing ethylene copolymers | SUMITOMO CHEMICAL CO (JP) | 1996-08-07 | — | — | EP | disclosed |
| EP-0669944-A4 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS. | MOBIL OIL CORP (US) | 1996-04-24 | — | — | EP | disclosed |
| CN-1030771-C | Process for preparing particulate elastomers | SUMITOMO CHEMICAL CO (JP) | 1996-01-24 | — | — | CN | disclosed |
| US-5463000-A | Homopolymerizing or copolymerizing with alpha-olefin in gas phase using catalyst system | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-10-31 | — | — | US | disclosed |
| EP-0669944-A1 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS. | MOBIL OIL CORP (US) | 1995-09-06 | — | — | EP | disclosed |
| WO-1995017434-A1 | CATALYST COMPOSITION | MOBIL OIL CORPORATION (US) | 1995-06-29 | — | — | WO | disclosed |
| EP-0657473-A2 | Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-06-14 | — | — | EP | disclosed |
| EP-0543292-B1 | A flame retardant elastomeric composition | WACKER CHEMIE GMBH (DE) | 1995-02-08 | — | — | EP | disclosed |
| EP-0612327-A1 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS | MOBIL OIL CORPORATION (US) | 1994-08-31 | — | — | EP | disclosed |
| US-5336652-A | Treating a support with an organomagnesium compound; contacting with a silane compound and a transitional metal compound | MOBIL OIL CORPORATION (US) | 1994-08-09 | — | — | US | disclosed |
| EP-0612327-A4 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS. | MOBIL OIL CORP (US) | 1994-07-11 | — | — | EP | disclosed |
| WO-1994012542-A1 | CATALYST COMPOSITION FOR USE IN THE PRODUCTION OF LLDPE RESIN PRODUCTS | MOBIL OIL CORPORATION (US) | 1994-06-09 | — | — | WO | disclosed |
| CN-1022757-C | Polymeric olefine hydrocarbon catalyst | SUMITOMO CHEMICAL CO (JP) | 1993-11-17 | — | — | CN | disclosed |
| US-5260372-A | Polysilxoanes | WACKER SILICONES CORPORATION (US) | 1993-11-09 | — | — | US | disclosed |
| US-5258345-A | High-activity polyethylene catalysts | MOBIL OIL CORPORATION (US) | 1993-11-02 | — | — | US | disclosed |
| US-5258449-A | Copolymer of ethylene and 3 to 10 carbon atom olefin films | MOBIL OIL CORPORATION (US) | 1993-11-02 | — | — | US | disclosed |
| EP-0283011-B1 | PROCESS FOR PRODUCING OLEFIN POLYMERS AND CATALYST USED THEREIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-07-14 | — | — | EP | disclosed |
| EP-0543292-A1 | A flame retardant elastomeric composition | WACKER-CHEMIE GMBH (DE) | 1993-05-26 | — | — | EP | disclosed |
| WO-1993009147-A1 | HIGH ACTIVITY POLYETHYLENE CATALYSTS PREPARED WITH ALKOXYSILANE REAGENTS | MOBIL OIL CORPORATION (US) | 1993-05-13 | — | — | WO | disclosed |
| US-5210167-A | Blown film, exhibiting haze, of linear low density copolymer of ethylene and alpha-olefin | MOBIL OIL CORPORATION (US) | 1993-05-11 | — | — | US | disclosed |
| EP-0539937-A1 | Process for producing olefin polymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-05-05 | — | — | EP | disclosed |
| EP-0376084-B1 | PROCESS FOR PRODUCING HIGHLY STEREOSPECIFIC ALPHA-OLEFIN POLYMERS | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-03-17 | — | — | EP | disclosed |
| US-5183873-A | Curing to solid elastomers | WACKER SILICONES CORPORATION (US) | 1993-02-02 | — | — | US | disclosed |
| EP-0306939-B1 | SOLID CATALYST COMPONENT FOR OLEFIN COPOLYMERIZATION AND PROCESS FOR OLEFIN COPOLYMERIZATION USING SAID SOLID CATALYST COMPONENT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-12-09 | — | — | EP | disclosed |
| CN-1019303-B | catalyst component and catalyst for olefin polymerization | SUMITOMO CHEMICAL CO (JP) | 1992-12-02 | — | — | CN | disclosed |
| US-5166280-A | Olefin polymerization catalyst and process for producing ethylene copolymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-11-24 | — | — | US | disclosed |
| CN-1018549-B | PROCESS FOR PRODUCING ALPHA-OLEFINIC POLYMERS | SIMITOMO CHEMICAL CO LTD (JP) | 1992-10-07 | — | — | CN | disclosed |
| CN-1065072-A | Produce the method for olefin polymer and used catalyzer | SUMITOMO CHEMICAL CO (JP) | 1992-10-07 | — | — | CN | disclosed |
| US-5143880-A | Coordination catalyst, stereospecific, durable | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-09-01 | — | — | US | disclosed |
| US-5077250-A | OLEFIN POLYMERIZATION CATALYST AND PROCESS FOR PRODUCING ETHYLENE COPOLYMERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-31 | — | — | US | disclosed |
| EP-0226208-B1 | INSULATING FILM FOR SEMICONDUCTOR, PRODUCTION OF THE SAME AND LIQUID COMPOSITION FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-11-21 | — | — | EP | disclosed |
| US-5051484-A | Process for producing granular thermoplastic elastomer and granular elastomer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-09-24 | — | — | US | disclosed |
| EP-0446801-A2 | Solid catalyst component for use in polymerization of alpha-olefins | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-09-18 | — | — | EP | disclosed |
| US-5023223-A | Coordination catalyst containing organosilicon compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-06-11 | — | — | US | disclosed |
| EP-0417346-A1 | Process for producing solid catalyst for use in polymerization of olefins | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-20 | — | — | EP | disclosed |
| US-4983561-A | COORDINATION CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-01-08 | — | — | US | disclosed |
| CN-1047088-A | Olefin polymerization catalysis and the method for producing ethylene copolymer. | SUMITOMO CHEMICAL CO (JP) | 1990-11-21 | — | — | CN | disclosed |
| EP-0397122-A2 | Olefin polymerization catalyst and process for producing ethylene copolymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-11-14 | — | — | EP | disclosed |
| EP-0376084-A2 | Process for producing highly stereospecific alpha-olefin polymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-07-04 | — | — | EP | disclosed |
| EP-0244678-B1 | PROCESS FOR PRODUCING ALPHA-OLEFIN POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-07-04 | — | — | EP | disclosed |
| US-4916099-A | COORDINATION CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-04-10 | — | — | US | disclosed |
| US-4900706-A | Process for producing olefin polymers and catalyst used therein | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-02-13 | — | — | US | disclosed |
| US-4891411-A | Process for producing olefin polymers and catalyst used therein | SUMTIOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-01-02 | — | — | US | disclosed |
| EP-0196585-B1 | CATALYST AND PROCESS FOR PRODUCING ALPHA-OLEFIN POLYMERS USING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-09-20 | — | — | EP | disclosed |
| CN-1031844-A | Be used for the ingredient of solid catalyst of olefin-copolymerization and use this ingredient of solid catalyst to carry out the method for olefin-copolymerization | SUMITOMO CHEMICAL CO LTD NSK (JP) | 1989-03-22 | — | — | CN | disclosed |
| EP-0306939-A1 | Solid catalyst component for olefin copolymerization and process for olefin copolymerization using said solid catalyst component | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-03-15 | — | — | EP | disclosed |
| CN-88101397-A | Process for producing olefin polymer and catalyst used therefor | — | 1988-09-28 | — | — | CN | disclosed |
| EP-0283011-A2 | Process for producing olefin polymers and catalyst used therein | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-09-21 | — | — | EP | disclosed |
| US-4771023-A | Process for producing olefin polymers and catalyst used therein | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-09-13 | — | — | US | disclosed |
| US-4743665-A | COORDINATION CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-05-10 | — | — | US | disclosed |
| CN-87103082-A | PROCESS FOR PRODUCING ALPHA-OLEFIN POLYMER | — | 1988-03-30 | — | — | CN | disclosed |
| EP-0244678-A1 | Process for producing alpha-olefin polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-11-11 | — | — | EP | disclosed |
| EP-0226208-A2 | Insulating film for semiconductor, production of the same and liquid composition for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-06-24 | — | — | EP | disclosed |
| US-4672050-A | REDUCING A TITANIUM COMPOUND WITH AN ORGANOMAGNESIUM COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-06-09 | — | — | US | disclosed |
| EP-0206817-A1 | Catalyst for producing olefin polymers and polymerization process using the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1986-12-30 | — | — | EP | disclosed |
| EP-0196585-A2 | Catalyst and process for producing alpha-olefin polymers using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1986-10-08 | — | — | EP | disclosed |
| US-4242479-A | CATALYST OF ALUMINUM TRIHALIDE, ORGANOSILOXANE COMPOUND OR ETHER, MAGNESIUM ALCOHOLATE, TITANIUM-HALOGEN AND ORGANOALUMINUM COMPOUNDS | SHOWA YUKA KABUSHIKI KAISHA (JP) | 1980-12-30 | — | — | US | disclosed |
| US-4180636-A | MAGNESIUM HALIDE, TITANIUM COMPOUND ELECTRON DONOR COMPOUND, TRIALKYL ALUMINUM CATALYST | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1979-12-25 | — | — | US | disclosed |
| US-4180636-A | MAGNESIUM HALIDE, TITANIUM COMPOUND ELECTRON DONOR COMPOUND, TRIALKYL ALUMINUM CATALYST | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1979-12-25 | — | — | US | disclosed |