SCHEMBL1018731

SCHEMBL1018731

[Au+3].[Au+3].[Se-2].[Se-2].[Se-2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29662029 0.82
SCHEMBL29662061 0.82
SCHEMBL29662012 0.82
SCHEMBL29525828 0.71
SCHEMBL18335508 0.71
SCHEMBL7196404 0.50
SCHEMBL14938261 0.50
SCHEMBL9325073 0.50
SCHEMBL1326145 0.50
SCHEMBL443268 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 919 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12129566-B2 Method for preparing hydrogen sulfide from sulfur dioxide by electrochemical reduction CENTRAL SOUTH UNIVERSITY (CN) 2024-10-29 US claimed
US-20220316078-A1 METHOD FOR PREPARING HYDROGEN SULFIDE FROM SULFUR DIOXIDE BY ELECTROCHEMICAL REDUCTION CENTRAL SOUTH UNIVERSITY (CN) 2022-10-06 US claimed
CN-110885078-B Multi-layer graphene using chemical vapor deposition and method for manufacturing the same 纳米基盘柔软电子素子研究团 2022-08-30 CN claimed
US-10755939-B2 Multilayer graphene using chemical vapor deposition and method of manufacturing same CENTER FOR ADVANCED SOFT ELECTRONICS (KR) 2020-08-25 US claimed
CN-109381257-B Laser treatment system combining laser and photothermal treatment 中聚科技股份有限公司 2020-05-19 CN claimed
EP-3626679-A1 METHOD OF MANUFACTURING DOPED MULTILAYER GRAPHENE USING CHEMICAL VAPOR DEPOSITION Center For Advanced Soft Electronics (KR) 2020-03-25 EP claimed
CN-110885078-A Multi-layer graphene using chemical vapor deposition and method for manufacturing the same 纳米基盘柔软电子素子研究团 2020-03-17 CN claimed
US-20200083053-A1 MULTILAYER GRAPHENE USING CHEMICAL VAPOR DEPOSITION AND METHOD OF MANUFACTURING SAME CENTER FOR ADVANCED SOFT ELECTRONICS (KR) 2020-03-12 US claimed
US-9496491-B2 Methods of forming a metal chalcogenide material and related methods of forming a memory cell MICRON TECHNOLOGY, INC. (US) 2016-11-15 US claimed
US-8741688-B2 Methods of forming a metal chalcogenide material MICRON TECHNOLOGY, INC. (US) 2014-06-03 US claimed
EP-0255784-B1 METHOD OF FORMING DYE IMAGE HAVING SUPERIOR RAPID PROCESSING PERFORMANCE KONICA CORPORATION (JP) 1992-07-29 EP claimed
EP-0476345-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1992-03-25 EP claimed
US-4912026-A Containing a heterocyclic iminothioester KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1990-03-27 US claimed
US-4839263-A HETEROCYCLIC IMIDOTHIOESTER; HARDDENING WITH A CHLORO-S-TRIAZINE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-06-13 US claimed
US-4758274-A Silver, tin alloy containing selenide Sato, Atsushige (JP) 1988-07-19 US claimed
EP-0255784-A2 Method of forming dye image having superior rapid processing performance KONICA CORPORATION (JP) 1988-02-10 EP claimed
EP-0255783-A2 Light-sensitive silver halide photographic material feasible for rapid processing KONICA CORPORATION (JP) 1988-02-10 EP claimed
EP-0093002-B1 A DIRECT-POSITIVE SILVER HALIDE PHOTOGRAPHIC MATERIAL KONICA CORPORATION (JP) 1986-07-30 EP claimed
US-4495274-A LOW SPEED MATERIAL KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-01-22 US claimed
EP-0093002-A2 A direct-positive silver halide photographic material KONICA CORPORATION (JP) 1983-11-02 EP claimed