⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11433423 | 0.85 | — | — | |
| SCHEMBL10800128 | 0.75 | PTAFR (0.31) | — | |
| SCHEMBL26667365 | 0.72 | — | — | |
| SCHEMBL11066598 | 0.67 | — | — | |
| SCHEMBL9105823 | 0.67 | — | — | |
| SCHEMBL22516443 | 0.65 | — | — | |
| Methyl Alcohol SCHEMBL16568696 | 0.65 | — | — | |
| SCHEMBL26667367 | 0.64 | — | — | |
| SCHEMBL4819264 | 0.63 | — | — | |
| SCHEMBL11971993 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120328985-A1 | Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |