⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10218670 | 0.97 | — | — | |
| SCHEMBL10218671 | 0.97 | — | — | |
| SCHEMBL18407690 | 0.79 | — | — | |
| SCHEMBL12597874 | 0.77 | — | — | |
| SCHEMBL18407691 | 0.77 | — | — | |
| SCHEMBL18407706 | 0.77 | — | — | |
| SCHEMBL19185989 | 0.77 | — | — | |
| SCHEMBL18405582 | 0.75 | — | — | |
| SCHEMBL6683866 | 0.74 | — | — | |
| SCHEMBL10061918 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9718817-B2 | Aryl and heteroaryl ether compounds as ROR gamma modulators | GLENMARK PHARMACEUTICALS S.A. (CH) | 2017-08-01 | — | — | US | disclosed |
| US-9718817-B2 | Aryl and heteroaryl ether compounds as ROR gamma modulators | GLENMARK PHARMACEUTICALS S.A. (CH) | 2017-08-01 | — | — | US | disclosed |
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-20170022195-A1 | ARYL AND HETEROARYL ETHER COMPOUNDS AS ROR GAMMA MODULATORS | GLENMARK PHARMACEUTICALS S.A. (CH) | 2017-01-26 | — | — | US | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9527809-B2 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9519214-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-13 | — | — | US | disclosed |
| US-20130040096-A1 | PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-02-14 | — | — | US | disclosed |
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130011785-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20130011785-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20120321855-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-12-20 | — | — | US | disclosed |
| US-20120282548-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| US-8097610-B2 | Derivative having PPAR agonistic activity | SHIONOGI & CO., LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-20110112118-A1 | 2,4-Diaminoquinazolines for Spinal Muscular Atrophy | FAMILIES OF SPINAL MUSCULAR ATROPHY (US) | 2011-05-12 | — | — | US | disclosed |
| US-7888366-B2 | 2,4-diaminoquinazolines for spinal muscular atrophy | FAMILIES OF SPINAL MUSCULAR ATROPHY (US) | 2011-02-15 | — | — | US | disclosed |
| US-20090286974-A1 | Derivative having ppar agonistic activity | SHIONOGI & CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |