⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6430805 | 0.86 | — | — | |
| SCHEMBL1023844 | 0.78 | — | — | |
| SCHEMBL6432098 | 0.70 | — | — | |
| SCHEMBL1022894 | 0.70 | — | — | |
| SCHEMBL6431258 | 0.67 | — | — | |
| SCHEMBL6434677 | 0.65 | — | — | |
| SCHEMBL2770464 | 0.65 | — | — | |
| SCHEMBL4646373 | 0.63 | — | — | |
| SCHEMBL2768043 | 0.63 | — | — | |
| SCHEMBL1275536 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| EP-1319966-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-05-26 | — | — | EP | disclosed |
| EP-1426392-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-02-24 | — | — | EP | disclosed |
| EP-1378535-B1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-11-11 | — | — | EP | disclosed |
| US-7446163-B2 | Polymerization regulator and composition for resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-11-04 | — | — | US | disclosed |
| US-7301705-B2 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-11-27 | — | — | US | disclosed |
| US-7169845-B2 | Polymerization regulators and compositions for resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7091307-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-08-15 | — | — | US | disclosed |
| US-7009031-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20050261467-A1 | Polymerization regulator and composition for resin | TAMURA MASAKI | 2005-11-24 | — | — | US | disclosed |
| EP-1378535-A1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20030171533-A1 | Polymerization regulators and compositions for resin | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2003-09-11 | — | — | US | disclosed |
| US-20030149231-A1 | Episulfide compound and process for producing the same | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1326095-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |
| EP-1270566-A1 | EPISULFIDE COMPOUND AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-6444146-B2 | DISCOLORATION INHIBITION | MITSUBISHI GAS CHEMICAL CO. (JP) | 2002-09-03 | — | — | US | disclosed |
| EP-1120667-A2 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-20010008278-A1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2001-07-19 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |