SCHEMBL1023009

SCHEMBL1023009

CC1C[Te]C2(CCCCCS1)SC(C)C[Te]2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1024648 0.98
SCHEMBL1024599 0.93
SCHEMBL1023865 0.85
SCHEMBL1024618 0.74
SCHEMBL1024634 0.63
SCHEMBL637401 0.62
SCHEMBL1024558 0.61
SCHEMBL1025682 0.61
SCHEMBL14268139 0.60
SCHEMBL10879275 0.60 CA1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
EP-1378535-B1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2009-11-11 EP disclosed
EP-1524289-B1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2009-09-16 EP disclosed
EP-1006374-B1 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL CO (JP) 2009-01-07 EP disclosed
US-7446163-B2 Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-11-04 US disclosed
US-7309794-B1 Method of storing episulfide compound MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2007-12-18 US disclosed
US-7301705-B2 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-11-27 US disclosed
US-20070149639-A1 Polymerizable composition, optical material comprising the composition and method for producing the material HORIKOSHI HIROSHI 2007-06-28 US disclosed
US-6534589-B1 Catalytic curing and polymerization of episulfide compound in presence of phenolic compound MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) 2003-03-18 US disclosed
US-6531532-B1 Optical apparatus formed by curing sulfides, intermetallics and 1,2-bis/-epithiopropylthio/ethane to form lenses having large refractive index and optical distortion MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-03-11 US disclosed
EP-1270566-A1 EPISULFIDE COMPOUND AND PROCESS FOR PRODUCING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-01-02 EP disclosed
US-6472495-B1 RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-10-29 US disclosed
US-6444146-B2 DISCOLORATION INHIBITION MITSUBISHI GAS CHEMICAL CO. (JP) 2002-09-03 US disclosed
EP-1120667-A2 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-08-01 EP disclosed
US-20010008278-A1 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) 2001-07-19 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
EP-1046931-A2 Composition for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-10-25 EP disclosed
EP-1006374-A2 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-06-07 EP disclosed