SCHEMBL1023323

SCHEMBL1023323

C1[Se]CC(CSCC2CS2)C(CSCC2CS2)[Se]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7198407 0.53
SCHEMBL5743380 0.41
Water SCHEMBL30705040 0.26
Water SCHEMBL28166207 0.26
SCHEMBL31493171 0.26
SCHEMBL23451398 0.23
Water SCHEMBL30686853 0.21
Water SCHEMBL28996854 0.21
Water SCHEMBL545666 0.21
Water SCHEMBL2197085 0.21

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
EP-1378535-B1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2009-11-11 EP disclosed
US-7446163-B2 Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-11-04 US disclosed
US-7301705-B2 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-11-27 US disclosed
US-7169845-B2 Polymerization regulators and compositions for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-30 US disclosed
US-7091307-B2 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-15 US disclosed
US-7009031-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2006-03-07 US disclosed
US-20050261467-A1 Polymerization regulator and composition for resin TAMURA MASAKI 2005-11-24 US disclosed
US-20030171533-A1 Polymerization regulators and compositions for resin MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2003-09-11 US disclosed
US-20030149231-A1 Episulfide compound and process for producing the same MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2003-08-07 US disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
EP-1270566-A1 EPISULFIDE COMPOUND AND PROCESS FOR PRODUCING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-01-02 EP disclosed
US-6472495-B1 RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-10-29 US disclosed
US-6444146-B2 DISCOLORATION INHIBITION MITSUBISHI GAS CHEMICAL CO. (JP) 2002-09-03 US disclosed
EP-1120667-A2 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-08-01 EP disclosed
US-20010008278-A1 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) 2001-07-19 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed