⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9256297 | 1.00 | — | — | |
| SCHEMBL1760662 | 0.76 | — | — | |
| SCHEMBL23925673 | 0.75 | — | — | |
| SCHEMBL3651955 | 0.73 | — | — | |
| SCHEMBL21526289 | 0.73 | — | — | |
| SCHEMBL25309496 | 0.73 | — | — | |
| SCHEMBL4109384 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL28269975 | 0.73 | — | — | |
| SCHEMBL19316052 | 0.73 | — | — | |
| SCHEMBL23750655 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2413191-A1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-02-01 | — | — | EP | disclosed |