SCHEMBL10272967

SCHEMBL10272967

CC1(C)C2CCC(CNC(=O)C(F)(F)S(=O)(=O)O)C1C2

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.47
CNR2 P34972 6/20 0.41
HDAC6 Q9UBN7 2/20 0.41
MAPK14 Q16539 2/20 0.40
RET P07949 1/20 0.40
CAMK1D Q8IU85 1/20 0.40
SCN9A Q15858 6/20 0.38
HSD11B1 P28845 1/20 0.38
CNR1 P21554 1/20 0.37
SCN5A Q14524 1/20 0.37
TBXA2R P21731 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16301144 0.80 EPHX2 (0.49) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL686863 0.77 SCN9A (0.41) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL24105939 0.76 EPHX2 (0.53) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL10224982 0.76 EPHX2 (0.44) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL3647482 0.75 HDAC6 (0.45) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL3645557 0.75 HDAC6 (0.45) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL16581469 0.75 MAPK14 (0.54) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL3650543 0.75 HDAC6 (0.45) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL24841689 0.74 EPHX2 (0.51) EPHX2CNR2HDAC6MAPK14RET
SCHEMBL24841684 0.74 EPHX2 (0.51) EPHX2CNR2HDAC6MAPK14RET

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023579-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-05-05 US disclosed
US-8647812-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-02-11 US disclosed
US-20130011619-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-01-10 US disclosed
US-8148044-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2012-04-03 US disclosed
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed
US-20100136479-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-06-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100136479-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AFF1, F12, AFF2 EPHX2 1401/4885CNR2 2969/4885HDAC6 2518/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.