⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12658076 | 0.91 | CYP4F2 (0.31) | — | |
| SCHEMBL13923483 | 0.85 | PTGS1 (0.32) | — | |
| SCHEMBL456962 | 0.76 | — | — | |
| SCHEMBL14129059 | 0.76 | KDM4E (0.31) | — | |
| SCHEMBL16079856 | 0.74 | — | — | |
| SCHEMBL27975656 | 0.73 | — | — | |
| SCHEMBL2344033 | 0.72 | HSD17B10 (0.36) | — | |
| SCHEMBL25996523 | 0.72 | CYP3A4 (0.30) | — | |
| SCHEMBL9750749 | 0.72 | — | — | |
| SCHEMBL24806003 | 0.70 | GRIN2D (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8216766-B2 | Polymer, polymer preparation method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-10 | — | — | US | disclosed |
| US-20090246686-A1 | POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-01 | — | — | US | disclosed |