Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Miripirium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM1 known ✓ | P11229 | 2/20 | 0.59 |
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.59 |
| ▸ | CHRM3 known ✓ | P20309 | 1/20 | 0.57 |
| ▸ | HTT | P42858 | 4/20 | 0.96 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.73 |
| ▸ | LMNA | P02545 | 2/20 | 0.73 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.73 |
| ▸ | NPC1 | O15118 | 1/20 | 0.73 |
| ▸ | RAB9A | P51151 | 1/20 | 0.73 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.69 |
| ▸ | MEN1 | O00255 | 2/20 | 0.69 |
| ▸ | MAPT | P10636 | 2/20 | 0.69 |
| ▸ | TP53 | P04637 | 1/20 | 0.69 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.69 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.69 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.69 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.69 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.59 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.59 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.59 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL1502898 | 1.00 | HTT (0.96) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| Iodide SCHEMBL9271857 | 1.00 | HTT (0.96) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| Iodide SCHEMBL10323429 | 1.00 | HTT (0.96) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| Iodide SCHEMBL1502868 | 1.00 | HTT (0.96) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| Iodide SCHEMBL1502813 | 1.00 | HTT (0.96) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| SCHEMBL1816189 | 0.98 | HTT (1.00) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| SCHEMBL2330291 | 0.98 | HTT (1.00) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| SCHEMBL2870371 | 0.98 | HTT (1.00) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| SCHEMBL5305098 | 0.98 | HTT (1.00) | HTTSMN1; SMN2LMNAKDM4ENPC1 | |
| SCHEMBL5292972 | 0.98 | HTT (1.00) | HTTSMN1; SMN2LMNAKDM4ENPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2615632-B1 | MICROSTRUCTURE MANUFACTURING METHOD USING TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-05-08 | — | — | EP | disclosed |
| EP-2615631-B1 | METHOD FOR PRODUCING MICROSTRUCTURE USING PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-05-08 | — | — | EP | disclosed |
| CN-103098179-B | The manufacture method for the treatment of fluid with the microstructure using this treatment fluid for suppressing the pattern collapse of microstructure | 三菱瓦斯化学株式会社 | 2016-12-07 | — | — | CN | disclosed |
| US-9334161-B2 | Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-05-10 | — | — | US | disclosed |
| CN-103098180-B | Processing liquid for suppressing pattern collapse of microstructure and method for producing microstructure using same | MITSUBISHI GAS CHEMICAL CO.,INC. (JP) | 2016-03-30 | — | — | CN | disclosed |
| US-8980812-B2 | Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-03-17 | — | — | US | disclosed |
| EP-2615631-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-07-17 | — | — | EP | disclosed |
| EP-2615632-A1 | TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-20130171828-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME | MITSUBISHI GAS CHEMICAL COMPANY , INC. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20130165365-A1 | TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-20120181249-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF FINE METAL STRUCTURE AND METHOD FOR PRODUCING FINE METAL STRUCTURE USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-07-19 | — | — | US | disclosed |