Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | NQO2 | P16083 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | MAP2K4 | P45985 | 3/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | MAPKAPK2 | P49137 | 1/20 | 0.36 |
| ▸ | MAPKAPK3 | Q16644 | 1/20 | 0.36 |
| ▸ | MAPK6 | Q16659 | 1/20 | 0.36 |
| ▸ | MAPKAPK5 | Q8IW41 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.35 |
| ▸ | PARP1 | P09874 | 1/20 | 0.35 |
| ▸ | PIM1 | P11309 | 1/20 | 0.35 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29367601 | 1.00 | CYP1A2 (0.39) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| SCHEMBL27708692 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| Potassium SCHEMBL31355025 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| SCHEMBL6365002 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| Ammonia Solution, Strong SCHEMBL1814826 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| SCHEMBL4113875 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| SCHEMBL27906273 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| SCHEMBL1537875 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| SCHEMBL1816466 | 0.98 | CYP1A2 (0.38) | CYP1A2NQO2GAACYP2C9MAP2K4 | |
| Dimethylamine SCHEMBL7818483 | 0.94 | CYP1A2 (0.35) | CYP1A2NQO2GAACYP2C9MAP2K4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 9066 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-28 | — | — | US | claimed |
| CN-122081911-A | High-stability electroless copper plating solution and preparation method and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080874-A | Environment-friendly fluorinating agent for liquid cooling system and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-12630931-B2 | Roughening solution for rolled copper foil and method for producing roughened copper foil | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2026-05-19 | — | — | US | claimed |
| CN-122038059-A | Cleaning composition for removing post-etch residues | 恩特格里斯公司 | 2026-05-15 | — | — | CN | claimed |
| CN-122012170-A | Preparation method of rust-proof and corrosion-proof fully-synthesized magnetic material cutting fluid | 海宁市中科新材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-12590224-B2 | Chemical mechanical polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-03-31 | — | — | US | claimed |
| US-20260071094-A1 | GUANIDINIUM-BASED POLYIONIC LIQUIDS AND THEIR USE AS ADDITIVES FOR CHEMICAL MECHANICAL PLANARIZATION SLURRIES | VERSUM MAT US LLC (US) | 2026-03-12 | — | — | US | claimed |
| US-20260054287-A1 | PASSIVATION COATING ON COPPER METAL SURFACE FOR COPPER WIRE BONDING APPLICATION | UNIV NORTH TEXAS (US) | 2026-02-26 | — | — | US | claimed |
| EP-3631045-B1 | CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-18 | — | — | EP | claimed |
| EP-0029720-A1 | The development of lithographic films | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-06-03 | — | — | EP | claimed |
| US-4269929-A | USING AN AQUEOUS ALKALINE SOLUTION CONTAINING DIHYDROXYBENZENE AND 3-PYRAZOLIDONE DEVELOPERS, A SULFITE PRESERVATIVE AND A CONTRAST-PROMOTING AMINE IN THE PRESENCE OF A HYDRAZIDE; LITHOGRAPHY | EASTMAN KODAK COMPANY (US) | 1981-05-26 | — | — | US | claimed |
| US-4221857-A | DEVELOPER COMPRISING SULFITE ION, A DIHYDROXYBENZENE, AND A HYDRAZIDE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1980-09-09 | — | — | US | claimed |
| US-4211839-A | SILVER HALIDE AND ORGANIC SILVER SALT PREPARED IN AN IMINO COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1980-07-08 | — | — | US | claimed |
| US-4168977-A | CONTAINING HYDRAZIDES, NEGATIVES | FUJI PHOTO FILM CO., LTD. (JP) | 1979-09-25 | — | — | US | claimed |
| US-4158660-A | Process for producing a purified 3,4-toluenediamine product and a mixture of 4- and 5-methylbenzotriazoles from a mixture of ortho-toluenediamine isomers | OLIN CORPORATION (US) | 1979-06-19 | — | — | US | claimed |
| US-4121938-A | Photographic material containing TiO2, soluble Cu(II) salt, and soluble silver salt and the use thereof in physical development | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-24 | — | — | US | claimed |
| US-4113490-A | DEVELOPMENT, AMPLIFYING BATH CONTAINING HYDROGEN PEROXIDE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1978-09-12 | — | — | US | claimed |
| US-4105656-A | PROCESS FOR PREPARING 3-N-MONOSUBSTITUTED AMINO-4-SUBSTITUTED-5-PYRAZOLONES | FUJI PHOTO FILM CO., LTD. (JP) | 1978-08-08 | — | — | US | claimed |
| US-4094682-A | Method for processing light-sensitive silver halide photographic material | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JA) | 1978-06-13 | — | — | US | claimed |