SCHEMBL1034855

SCHEMBL1034855

OCCOCCOO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29656289 1.00 MEN1 (0.73)
SCHEMBL18858987 1.00 MEN1 (0.73)
SCHEMBL30493331 1.00 MEN1 (0.73)
SCHEMBL1038707 1.00 MEN1 (0.73)
SCHEMBL1037976 1.00 MEN1 (0.73)
SCHEMBL28223090 1.00 MEN1 (0.73)
Triethylene Glycol SCHEMBL2361297 0.93 MEN1 (0.73)
SCHEMBL13344070 0.91 MEN1 (0.61)
SCHEMBL13344072 0.91 MEN1 (0.61)
SCHEMBL19305255 0.86 MEN1 (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106120388-B High-fixation digital textile printing ink composition 台湾永光化学工业股份有限公司 2018-06-19 CN claimed
CN-103447058-A Preparation method for chlorine element modified carbon quantum dot UNIV NORTH CHINA 2013-12-18 CN claimed
EP-2029630-B1 LOW STRESS DENTAL COMPOSITE CONTAINING PHOTOPOLYMERIZABLE AND PHOTOCLEAVABLE RESIN DENTSPLY INT INC (US) 2011-01-26 EP claimed
WO-2010094986-A1 MICRONIZED CAROTENOID PREPARATION AS IMMUNOSTIMULANT FOR CRUSTACEANS INNOVA ANDINA S.A (PE) 2010-08-26 WO claimed
JP-2009540107-A 2009-11-19 JP claimed
EP-2029630-A1 PHOTOPOLYMERIZABLE AND PHOTOCLEAVABLE RESIN AND LOW STRESS COMPOSITE COMPOSITIONS Dentspy International, Inc. (US) 2009-03-04 EP claimed
WO-2008005173-A1 PHOTOPOLYMERIZABLE AND PHOTOCLEAVABLE RESIN AND LOW STRESS COMPOSITE COMPOSITIONS DENTSPLY INTERNATIONAL INC. (US) 2008-01-10 WO claimed
WO-2023176259-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INSULATING FILM 日産化学株式会社 2023-09-21 WO disclosed
WO-2023106101-A1 RESIN COMPOSITION 日産化学株式会社 2023-06-15 WO disclosed
WO-2023106104-A1 PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2023-06-15 WO disclosed
WO-2023106108-A1 PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2023-06-15 WO disclosed
WO-2023074391-A1 POLYMER COMPOSITION, LIQUID CRYSTAL ALIGNING AGENT, RESIN FILM, LIQUID CRYSTAL ALIGNMENT FILM, METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY ELEMENT, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2023-05-04 WO disclosed
EP-3159737-B1 LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ALIGNMENT TREATMENT AGENT NISSAN CHEMICAL CORP (JP) 2021-05-26 EP disclosed
CN-101784823-A Multi-stage sealing gasket BRIDGESTONE CORP 2010-07-21 CN disclosed
CN-101765494-A Method for producing plastic lens HOYA CORP 2010-06-30 CN disclosed
US-20090218548-A1 Electroconductive polymer material, producing method of electroconductive polymer material and electrode material FUJIFILM CORPORATION (JP) 2009-09-03 US disclosed
EP-2029630-A1 PHOTOPOLYMERIZABLE AND PHOTOCLEAVABLE RESIN AND LOW STRESS COMPOSITE COMPOSITIONS Dentspy International, Inc. (US) 2009-03-04 EP disclosed
WO-2008005173-A1 PHOTOPOLYMERIZABLE AND PHOTOCLEAVABLE RESIN AND LOW STRESS COMPOSITE COMPOSITIONS DENTSPLY INTERNATIONAL INC. (US) 2008-01-10 WO disclosed
CN-1192904-C Recordmedium, its preparing process, and imaging method using said record medium CANON KK (JP) 2005-03-16 CN disclosed
CN-1356212-A Recordmedium, its preparing process, and imaging method using said record medium CANON KK (JP) 2002-07-03 CN disclosed