SCHEMBL10424741

SCHEMBL10424741

CCCCCCCS(=O)(=O)Oc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 1/20 0.50
▸ LTA4H P09960 2/20 0.47
▸ ALPL P05186 3/20 0.46
▸ ALPI P09923 3/20 0.46
▸ MMP1 P03956 1/20 0.43
▸ MMP9 P14780 1/20 0.43
▸ MMP13 P45452 1/20 0.43
▸ CA1 P00915 2/20 0.42
▸ CA2 P00918 2/20 0.42
▸ CA9 Q16790 2/20 0.42
▸ MLNR O43193 1/20 0.41
▸ NR1I2 O75469 1/20 0.41
▸ ESR1 P03372 1/20 0.41
▸ NR3C1 P04150 1/20 0.41
▸ PGR P06401 1/20 0.41
▸ ADRB2 P07550 1/20 0.41
▸ CHRM2 P08172 1/20 0.41
▸ ADRB1 P08588 1/20 0.41
▸ HTR1A P08908 1/20 0.41
▸ ADRA2A P08913 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1403506 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL886892 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL886890 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL11870866 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL127191 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL886882 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL437856 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL886894 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL1962617 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1
SCHEMBL11236927 1.00 KMT2A (0.50) KMT2ALTA4HALPLALPIMMP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103402659-B Apparatus and method for stripping solder metal during recycling of discarded electrical and electronic equipment MYKROLIS CORP. (US) 2016-11-30 — — CN claimed
CN-105274338-A Sustainable process for reclaiming precious metals and base metals from e-waste ADVANCED TECH MATERIALS 2016-01-27 — — CN claimed
CN-101802115-A Water-based dimerized rosin and manufacturing method thereof HEXION SPECIALTY CHEMICALS RES 2010-08-11 — — CN claimed
US-12466989-B2 Microemulsions and uses thereof PETROLIAM NASIONAL BERHAD (PETRONAS) (MY) 2025-11-11 — — US disclosed
CN-118900935-A Composition for copper surface protection, semiconductor intermediate using same, and method for producing semiconductor 三菱瓦斯化学株式会社 2024-11-05 — — CN disclosed
US-20210348048-A1 Microemulsions And Uses Thereof PETROLIAM NASIONAL BERHAD (PETRONAS) (MY) 2021-11-11 — — US disclosed
WO-2020055229-A1 MICROEMULSIONS AND USES THEREOF PETROLIAM NASIONAL BERHAD (PETRONAS) (MY) 2020-03-19 — — WO disclosed
CN-110016284-A Conductive polymer composition, covering product and pattern forming method 信越化学工业株式会社 2019-07-16 — — CN disclosed
CN-108883443-A Integrated electronic waste recycling and recovery system and use process thereof 恩特格里斯公司 2018-11-23 — — CN disclosed
CN-108351458-A Optical film, polarizing film and image display device 柯尼卡美能达株式会社 2018-07-31 — — CN disclosed
CN-106947221-A Conductive polymer composition, cladding product and pattern formation method 信越化学工业株式会社 2017-07-14 — — CN disclosed
CN-101113238-A Conductive composition, and process for producing the same SHINETSU POLYMER CO (JP) 2008-01-30 — — CN disclosed
CN-101040002-A Conductive composition and conductive crosslinked material, capacitor and method for manufacturing same, antistatic coating composition, antistatic coat, antistatic film, optical filter and optical in SHINETSU POLYMER CO (JP) 2007-09-19 — — CN disclosed
CN-101035860-A Conductive composition and method for producing same, antistatic coating, antistatic film, optical filter, optical information recording medium, and capacitor and method for producing same SHINETSU POLYMER CO (JP) 2007-09-12 — — CN disclosed
CN-101023138-A Conductive composition and process for production thereof, antistatic coating material, antistatic membrane, antistatic film, optical filter, optical information recording media, and condenser and pro SHINETSU POLYMER CO (JP) 2007-08-22 — — CN disclosed
CN-1806005-A Conductive composition, conductive coating material, conductive resin, capacitor, photoelectric conversion element, and method for producing same SHINETSU POLYMER CO (JP) 2006-07-19 — — CN disclosed
US-4944893-A FOR SEMICONDUCTORS, ACETYLENIC ALCOHOL TOKYO OHKA KOGYO CO., LTD. (JP) 1990-07-31 — — US disclosed
CN-1008114-B WATER-IN-OIL EMULSION LUBRIZOL CORP (US) 1990-05-23 — — CN disclosed
CN-87101249-A Blasting explosives composition — 1988-07-13 — — CN disclosed
CN-86108192-A The emulsion of Water in oil — 1987-09-09 — — CN disclosed
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