SCHEMBL1043151

SCHEMBL1043151

CCCCCCCCCCCCCCCCCC[Si](O)(O)O

nearest known ligand 0.50

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
THRB P10828 1/20 0.50
LMNA P02545 2/20 0.45
ALDH1A1 P00352 2/20 0.45
HSD17B10 Q99714 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
EPHX1 P07099 4/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CES2 O00748 3/20 0.39
CES1 P23141 3/20 0.39
DNM1 Q05193 4/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1686875 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL28684814 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL1686778 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL9744969 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL9622662 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL1686671 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL1687052 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL1686673 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL1686672 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10
SCHEMBL1687021 1.00 TSHR (0.50) TSHRTHRBLMNAALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117417582-A Wear-resistant sole and manufacturing method thereof 福建省莆田市协龙鞋业有限公司 2024-01-19 CN claimed
CN-116682591-A Method for controlling movement of particles in glassy colloid system by using optical tweezers 哈尔滨工业大学(深圳)(哈尔滨工业大学深圳科技创新研究院) 2023-09-01 CN claimed
CN-114512290-B Silicon oil-based magnetic liquid and preparation method thereof 清华大学 2023-04-07 CN claimed
CN-115897221-A Modified polypropylene fiber composite coalescence filler for oil-water separation and preparation method thereof 中国石油化工股份有限公司 2023-04-04 CN claimed
CN-114512290-A Silicon oil-based magnetic liquid and preparation method thereof 清华大学 2022-05-17 CN claimed
CN-111063500-A Modified magnetic nano-particles, non-polar solvent-based magnetic liquid, preparation method and application 中山大学 2020-04-24 CN claimed
US-6890599-B2 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays INTELLECTUAL BUSINESS MACHINES CORPORATION (US) 2005-05-10 US claimed
US-20030211341-A1 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays AU OPTRONICS CORPORATION (TW) 2003-11-13 US claimed
US-6632536-B2 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-10-14 US claimed
US-20020084252-A1 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays AU OPTRONICS CORPORATION (TW) 2002-07-04 US claimed
US-20250362274-A1 SYSTEMS AND METHODS TO DETERMINE PARTITION COEFFICIENTS BETWEEN CRUDE OIL AND AN AQUEOUS PHASE SAUDI ARABIAN OIL CO (SA) 2025-11-27 US disclosed
EP-4523289-A1 THERMAL INSULATION MATERIALS FOR BATTERIES Hollingsworth & Vose Company (US) 2025-03-19 EP disclosed
WO-2025022812-A1 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR PRODUCTION DEVICE 株式会社SCREENホールディングス 2025-01-30 WO disclosed
WO-2025022815-A1 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR PRODUCTION DEVICE 株式会社SCREENホールディングス 2025-01-30 WO disclosed
CN-119174042-A Heat insulating material for battery 霍林斯沃思和沃斯有限公司 2024-12-20 CN disclosed
EP-1621258-A1 METHOD FOR PRODUCING ORGANIC THIN FILM NIPPON SODA CO., LTD. (JP) 2006-02-01 EP disclosed
US-6890599-B2 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays INTELLECTUAL BUSINESS MACHINES CORPORATION (US) 2005-05-10 US disclosed
US-20030211341-A1 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays AU OPTRONICS CORPORATION (TW) 2003-11-13 US disclosed
US-6632536-B2 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-10-14 US disclosed
US-20020084252-A1 Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays AU OPTRONICS CORPORATION (TW) 2002-07-04 US disclosed