SCHEMBL1044191

SCHEMBL1044191

CC=CCc1ccccc1O

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 1/20 0.54
HSPA5 P11021 1/20 0.50
IDO1 P14902 2/20 0.47
TSHR P16473 2/20 0.45
CYP2D6 P10635 1/20 0.45
HIF1A Q16665 1/20 0.45
AKR1B1 P15121 1/20 0.43
CA12 O43570 5/20 0.42
CA2 P00918 5/20 0.42
CA9 Q16790 4/20 0.41
MPO P05164 2/20 0.41
KEAP1 Q14145 1/20 0.41
HTR1A P08908 1/20 0.40
SLC6A4 P31645 1/20 0.40
KDM4E B2RXH2 1/20 0.39
HSD17B10 Q99714 1/20 0.39
MAPT P10636 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1044190 1.00 TAAR1 (0.54) TAAR1HSPA5IDO1TSHRCYP2D6
SCHEMBL11437846 0.86 HSPA5 (0.59) TAAR1HSPA5IDO1TSHRCYP2D6
SCHEMBL2787053 0.86 HSPA5 (0.45) TAAR1HSPA5IDO1TSHRCYP2D6
SCHEMBL7559119 0.84 TAAR1 (0.41) TAAR1IDO1CA12CA2CA9
SCHEMBL9744332 0.83 IAPP (0.50) TAAR1HSPA5CA2KDM4EHSD17B10
SCHEMBL9744335 0.83 IAPP (0.50) TAAR1HSPA5CA2KDM4EHSD17B10
SCHEMBL29056126 0.83 TAAR1 (0.55) TAAR1HSPA5IDO1TSHRCYP2D6
SCHEMBL29056125 0.83 TAAR1 (0.55) TAAR1HSPA5IDO1TSHRCYP2D6
SCHEMBL89100 0.83 TAAR1 (0.54) TAAR1HSPA5IDO1TSHRCYP2D6
SCHEMBL4203494 0.82 HSPA5 (0.54) TAAR1HSPA5IDO1TSHRCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120149549-A Lithium ion battery electrolyte and preparation method thereof 鞍山华川电气科技有限公司 2025-06-13 CN claimed
CN-119998268-A Process for preparing 2,6, 7, 8-heptamethyl-3, 6,7, 8-tetrahydro-2H-indeno [4,5-b ] furan and use thereof 国际香料和香精公司 2025-05-13 CN claimed
EP-3141538-B1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS VERSUM MAT US LLC (US) 2019-10-30 EP claimed
EP-3092046-B1 ALKOXYLATED PRODUCT AND USE THEREOF Hexion GmbH (DE) 2018-04-18 EP claimed
EP-3141538-A1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-03-15 EP claimed
EP-3092046-A1 ALKOXYLATED PRODUCT AND USE THEREOF Hexion GmbH (DE) 2016-11-16 EP claimed
EP-2141141-B1 Improved Process Stability of NBDE Using Substituted Phenol Stabilizers AIR PROD & CHEM (US) 2016-09-28 EP claimed
WO-2015104048-A1 ALKOXYLATED PRODUCT AND USE THEREOF Hexion GmbH (DE) 2015-07-16 WO claimed
CN-101591772-B Process stability of nbde using substituted phenol stabilizers AIR PROD & CHEM 2012-07-04 CN claimed
US-8173213-B2 Process stability of NBDE using substituted phenol stabilizers AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-05-08 US claimed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP claimed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO claimed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO claimed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US claimed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US claimed
US-7129311-B2 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-10-31 US claimed
US-20060159861-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-07-20 US claimed
EP-1573086-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES Arch Specialty Chemicals, Inc. (US) 2005-09-14 EP claimed
US-20040127070-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. 2004-07-01 US claimed
WO-2004027110-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES ARCH SPECIALTY CHEMICALS, INC. (US) 2004-04-01 WO claimed