⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL821860 | 0.62 | — | — | |
| SCHEMBL132811 | 0.62 | — | — | |
| SCHEMBL2112584 | 0.59 | — | — | |
| SCHEMBL20597277 | 0.59 | — | — | |
| SCHEMBL8109489 | 0.59 | — | — | |
| Propynal SCHEMBL9393 | 0.59 | — | — | |
| SCHEMBL18923 | 0.59 | — | — | |
| SCHEMBL1372732 | 0.59 | — | — | |
| SCHEMBL1195989 | 0.59 | — | — | |
| SCHEMBL5613933 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 279 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9227955-B2 | Compound having angiogenesis inhibitory activity, method for preparing same, and pharmaceutical composition comprising same | BORYUNG PHARMACEUTICAL CO., LTD. (KR) | 2016-01-05 | — | — | US | claimed |
| US-8945810-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2015-02-03 | — | — | US | claimed |
| US-20140256711-A1 | Novel Compound Having Angiogenesis Inhibitory Activity, Method for Preparing Same, and Pharmaceutical Composition Comprising Same | BORYUNG PHARMACEUTICAL CO., LTD. (KR) | 2014-09-11 | — | — | US | claimed |
| US-20080227025-A1 | Localized on resist film; peak area of a high molecular weight; flowability of immersion liquid in patterning by exposure; prevention of coating and development defects; resin has perfluoroalkyl, fluorinated alcohol, alkylsilyl structure, cyclic siloxane, sulfonimido and/or bis(carbonyl)methylene groups | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | claimed |
| EP-1970760-A1 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM Corporation (JP) | 2008-09-17 | — | — | EP | claimed |
| EP-0447891-B1 | Thieno(2,3-d)pyrimidine derivatives | BASF AG (DE) | 1994-04-27 | — | — | EP | claimed |
| US-11584810-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin | FUJIFILM CORPORATION (JP) | 2023-02-21 | — | — | US | disclosed |
| CN-109643064-B | Photosensitive or radiation-sensitive resin composition, film thereof, pattern forming method, electronic device manufacturing method, compound, and resin | 富士胶片株式会社 | 2022-07-26 | — | — | CN | disclosed |
| EP-2550562-B1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORP (JP) | 2021-04-21 | — | — | EP | disclosed |
| EP-2539769-B1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORP (JP) | 2021-04-07 | — | — | EP | disclosed |
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| US-10678132-B2 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM CORPORATION (JP) | 2020-06-09 | — | — | US | disclosed |
| US-20190171104-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2019-06-06 | — | — | US | disclosed |
| US-20080227025-A1 | Localized on resist film; peak area of a high molecular weight; flowability of immersion liquid in patterning by exposure; prevention of coating and development defects; resin has perfluoroalkyl, fluorinated alcohol, alkylsilyl structure, cyclic siloxane, sulfonimido and/or bis(carbonyl)methylene groups | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| EP-1970760-A1 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM Corporation (JP) | 2008-09-17 | — | — | EP | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| WO-2008093856-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | WO | disclosed |
| EP-0447891-B1 | Thieno(2,3-d)pyrimidine derivatives | BASF AG (DE) | 1994-04-27 | — | — | EP | disclosed |
| EP-0447891-A1 | Thieno(2,3-d)pyrimidine derivatives | BASF Aktiengesellschaft (DE) | 1991-09-25 | — | — | EP | disclosed |