SCHEMBL10453862

SCHEMBL10453862

COC(=O)c1cnn(C)c1/N=N/c1c(C)nn(-c2cc(O)nc(-n3nc(C)c(/N=N/c4c(C(=O)C=O)cnn4C)c3N)n2)c1N

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.35
▸ TSHR P16473 2/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ MAPT P10636 3/20 0.31
▸ LMNA P02545 1/20 0.31
▸ NPC1 O15118 2/20 0.30
▸ ALDH1A1 P00352 1/20 0.30
▸ RAB9A P51151 1/20 0.30
▸ CYP1A2 P05177 1/20 0.30
▸ CYP3A4 P08684 1/20 0.30
▸ PKM P14618 1/20 0.30
▸ CYP2C19 P33261 1/20 0.30
▸ TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13159973 0.92 KMT2A (0.33) KMT2ATSHRMAPTLMNANPC1
SCHEMBL13159970 0.90 KMT2A (0.35) KMT2ATSHRMEN1CYP1A2CYP3A4
SCHEMBL13159975 0.89 KMT2A (0.36) KMT2ATSHRMEN1MAPTCYP1A2
SCHEMBL10172914 0.89 — —
SCHEMBL9972793 0.89 KMT2A (0.35) KMT2ATSHRMEN1MAPTLMNA
SCHEMBL13159974 0.88 KMT2A (0.35) KMT2ATSHRMEN1CYP1A2CYP3A4
SCHEMBL13159972 0.88 MAPT (0.32) KMT2AMAPTLMNANPC1ALDH1A1
SCHEMBL13159977 0.87 KMT2A (0.35) KMT2ATSHRMEN1
SCHEMBL10454267 0.87 NPC1 (0.42) KMT2AMAPTLMNANPC1ALDH1A1
SCHEMBL9972788 0.87 MAPT (0.33) KMT2AMAPTLMNANPC1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8835531-B2 Water-based ink composition for inkjet recording FUJIFILM CORPORATION (JP) 2014-09-16 — — US disclosed
US-8426495-B2 Radiation-curable ink composition for inkjet recording, inkjet recording method, and printed matter FUJIFILM CORPORATION (JP) 2013-04-23 — — US disclosed
US-8415409-B2 Radiation-curable ink composition for inkjet recording, inkjet recording method, and printed matter FUJIFILM CORPORATION (JP) 2013-04-09 — — US disclosed
US-8222326-B2 Water-based ink composition for inkjet recording FUJIFILM CORPORATION (JP) 2012-07-17 — — US disclosed
US-20100240812-A1 OIL-BASED INKJET RECORDING INK FUJIFILM CORPORATION (JP) 2010-09-23 — — US disclosed
US-20100221506-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING,INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 — — US disclosed
US-20100221507-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 — — US disclosed
US-20100222472-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-09-02 — — US disclosed
US-20100160504-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-06-24 — — US disclosed
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