SCHEMBL10454087

SCHEMBL10454087

COC(=O)c1cnn(C)c1/N=N/c1c(C)nn(-c2nc(N(C)C)nc(-n3nc(C)c(/N=N/c4c(C(=O)OC)cnn4C)c3N)n2)c1N

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 8/20 0.38
▸ MEN1 O00255 4/20 0.38
▸ GAA P10253 1/20 0.38
▸ TSHR P16473 2/20 0.33
▸ NPC1 O15118 6/20 0.32
▸ RAB9A P51151 6/20 0.32
▸ HPGD P15428 3/20 0.32
▸ ALDH1A1 P00352 3/20 0.32
▸ CYP1A2 P05177 2/20 0.32
▸ CYP2C19 P33261 2/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ PKM P14618 1/20 0.32
▸ KDM4E B2RXH2 1/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ SPR P35270 1/20 0.32
▸ MAPT P10636 5/20 0.32
▸ TDP1 Q9NUW8 3/20 0.32
▸ SMN1; SMN2 Q16637 2/20 0.31
▸ ALOX12 P18054 1/20 0.31
▸ MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12353617 0.94 KMT2A (0.34) KMT2AMEN1GAA
SCHEMBL9972794 0.94 KMT2A (0.34) KMT2AMEN1GAATSHRNPC1
SCHEMBL10452774 0.91 KMT2A (0.40) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL10452739 0.90 KMT2A (0.39) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL10454086 0.90 KMT2A (0.39) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL10454130 0.89 KMT2A (0.38) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL10454085 0.88 NPC1 (0.38) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL10331433 0.88 KMT2A (0.38) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL20405569 0.87 KMT2A (0.37) KMT2AMEN1TSHRNPC1RAB9A
SCHEMBL10454128 0.86 KMT2A (0.36) KMT2AMEN1TSHRNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8835531-B2 Water-based ink composition for inkjet recording FUJIFILM CORPORATION (JP) 2014-09-16 — — US disclosed
US-8415409-B2 Radiation-curable ink composition for inkjet recording, inkjet recording method, and printed matter FUJIFILM CORPORATION (JP) 2013-04-09 — — US disclosed
US-8393725-B2 Ink set and image forming method FUJIFILM CORPORATION (JP) 2013-03-12 — — US disclosed
US-8222326-B2 Water-based ink composition for inkjet recording FUJIFILM CORPORATION (JP) 2012-07-17 — — US disclosed
US-20100240812-A1 OIL-BASED INKJET RECORDING INK FUJIFILM CORPORATION (JP) 2010-09-23 — — US disclosed
US-20100221506-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING,INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 — — US disclosed
US-20100222472-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-09-02 — — US disclosed
US-20100160504-A1 WATER-BASED INK COMPOSITION FOR INKJET RECORDING FUJIFILM CORPORATION (JP) 2010-06-24 — — US disclosed
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