⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL93335 | 1.00 | — | — | |
| SCHEMBL27028327 | 1.00 | — | — | |
| SCHEMBL10012485 | 1.00 | — | — | |
| SCHEMBL80385 | 0.97 | — | — | |
| SCHEMBL106372 | 0.91 | CYP2C9 (0.32) | — | |
| SCHEMBL5611591 | 0.90 | — | — | |
| SCHEMBL18979342 | 0.88 | — | — | |
| SCHEMBL3888011 | 0.85 | — | — | |
| SCHEMBL29278695 | 0.84 | — | — | |
| SCHEMBL106438 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 267 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260000623-A1 | DRUG DELIVERY BY PORE-MODIFIED MESOPOROUS SILICA NANOPARTICLES | CHAN, Hardy Wai Hong (TW) | 2026-01-01 | — | — | US | claimed |
| CN-112239209-B | Drug delivery via pore-modified mesoporous silica nanoparticles | 奈力生医股份有限公司 | 2024-01-12 | — | — | CN | claimed |
| EP-3766482-B1 | DRUG DELIVERY BY PORE-MODIFIED MESOPOROUS SILICA NANOPARTICLES | NANO TARGETING & THERAPY BIOPHARMA INC (TW) | 2023-11-22 | — | — | EP | claimed |
| US-20210015757-A1 | DRUG DELIVERY BY PORE-MODIFIED MESOPOROUS SILICA NANOPARTICLES | CHAN, Hardy Wai Hong (TW) | 2021-01-21 | — | — | US | claimed |
| EP-3766482-A1 | DRUG DELIVERY BY PORE-MODIFIED MESOPOROUS SILICA NANOPARTICLES | Nano Targeting & Therapy Biopharma Inc. (TW) | 2021-01-20 | — | — | EP | claimed |
| CN-112239209-A | Drug delivery through pore-modified mesoporous silica nanoparticles | 奈力生医股份有限公司 | 2021-01-19 | — | — | CN | claimed |
| US-10809423-B2 | Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-10-20 | — | — | US | claimed |
| CN-107760248-A | The preparation technology of weather-proof waterproof gasket cement | 苏州甫众塑胶有限公司 | 2018-03-06 | — | — | CN | claimed |
| EP-2567940-B1 | METHOD FOR PREPARING CLAYS HAVING NOVEL PHYSICO-CHEMICAL PROPERTIES | ECOLE DE BIOLOGIE IND (EBI) (FR) | 2017-06-21 | — | — | EP | claimed |
| US-20170158910-A1 | COMPOSITION FOR COATING FILM TO PREVENT CONSPICUOUS FINGERPRINTS, COATING FILM TO PREVENT CONSPICUOUS FINGERPRINTS USING THE COMPOSITION, AND ARTICLE HAVING THE COATING FILM | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2017-06-08 | — | — | US | claimed |
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| US-20130260575-A1 | SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-03 | — | — | US | claimed |
| EP-2567940-A1 | Method for preparing clays having novel physical-chemical properties | Ecole De Biologie Industrielle (EBI) (FR) | 2013-03-13 | — | — | EP | claimed |
| US-20120174823-A1 | COMPOSITION FOR COATING FILM TO PREVENT CONSPICUOUS FINGERPRINTS, COATING FILM TO PREVENT CONSPICUOUS FINGERPRINTS USING THE COMPOSITION, AND ARTICLE HAVING THE COATING FILM | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-07-12 | — | — | US | claimed |
| EP-2474577-A1 | Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film | Samsung Electronics Co., Ltd. (KR) | 2012-07-11 | — | — | EP | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| EP-1845132-A2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shinetsu Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238300-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-10-11 | — | — | US | disclosed |