SCHEMBL10495960

SCHEMBL10495960

CS(C)(C)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL777328 0.88
SCHEMBL16099121 0.82
SCHEMBL14993358 0.78
SCHEMBL5174371 0.78
SCHEMBL8750955 0.78
SCHEMBL4612213 0.72
SCHEMBL1187600 0.72
SCHEMBL776961 0.69
SCHEMBL776255 0.69
SCHEMBL777896 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121248450-A Purification method of alkali metal trifluoromethyl sulfinate 湖南有色金属投资有限公司 2026-01-02 CN disclosed
CN-112384507-A Substituted 4-heteroaryloxypyridines and their salts and their use as herbicides 拜耳公司 2021-02-19 CN disclosed
CN-1872084-A Extractive of Chinese globeflower in short petal, effective content of anti inflammation and usage TOXICS & MEDICINES INST A M M (CN) 2006-12-06 CN disclosed
EP-0237446-B1 PROCESS FOR THE PREPARATION OF PERHALOGENOMETHANE SULFINIC AND -SULFONIC ACIDS AND THEIR SALTS RHONE-POULENC CHIMIE (FR) 1989-09-20 EP disclosed
US-4806453-A DIAZO SENSITIZED NOVOLAK AND POLYGLUTARIMIDE; RADIATION, DEVELOPING SELECTIVELY SHIPLEY COMPANY INC. (US) 1989-02-21 US disclosed
EP-0244567-A2 Bilayer photoresist development SHIPLEY COMPANY INC. (US) 1987-11-11 EP disclosed
EP-0237446-A1 Process for the preparation of perhalogenomethane sulfinic and -sulfonic acids and their salts RHONE-POULENC CHIMIE (FR) 1987-09-16 EP disclosed