SCHEMBL1050487

SCHEMBL1050487

Fc1[c]c(F)c(C(F)(F)F)c(F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3133155 0.88
SCHEMBL1051174 0.79
SCHEMBL17835449 0.79
SCHEMBL1050180 0.75
SCHEMBL28476021 0.75
SCHEMBL1048349 0.75
SCHEMBL1051481 0.75
SCHEMBL1048775 0.74
SCHEMBL28785905 0.74
SCHEMBL3948787 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109560207-A A kind of organic material and its organic electroluminescence device 长春海谱润斯科技有限公司 2019-04-02 CN claimed
US-9766568-B2 Ultraviolet-curable liquid developer CANON KABUSHIKI KAISHA (JP) 2017-09-19 US claimed
US-9056331-B2 Thin layer having composition gradient and production method thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-06-16 US claimed
US-20100021691-A1 THIN LAYER HAVING COMPOSITION GRADIENT AND PRODUCTION METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-01-28 US claimed
CN-114641529-A Method for producing fluorine-containing polymer and composition thereof 大金工业株式会社 2022-06-17 CN disclosed
US-11048188-B2 Developing device having liquid developer movement restriction CANON KABUSHIKI KAISHA (JP) 2021-06-29 US disclosed
EP-3216783-B1 SULFONATE COMPOUND, PHOTOACID GENERATOR, AND PHOTOLITHOGRAPHIC RESIN COMPOSITION SAN APRO LTD (JP) 2021-06-09 EP disclosed
CN-112888676-A Photoacid generators and resin compositions for lithography 三亚普罗股份有限公司 2021-06-01 CN disclosed
CN-106795107-B Sulfonate compound, photoacid generator, and resin composition for lithography 三亚普罗股份有限公司 2021-05-28 CN disclosed
WO-2021085349-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND COMPOSITION THEREOF ダイキン工業株式会社 2021-05-06 WO disclosed
CN-107710077-B Recording material and image forming method 佳能株式会社 2021-03-30 CN disclosed
WO-2021029158-A1 SULFONAMIDE COMPOUND, NONIONIC PHOTOACID GENERATOR, AND PHOTOLITHOGRAPHY RESIN COMPOSITION サンアプロ株式会社 2021-02-18 WO disclosed
US-9056331-B2 Thin layer having composition gradient and production method thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-06-16 US disclosed
US-20120178617-A1 Preparation of Supported Silyl-Capped Silica-Bound Anion Activators and Associated Catalysts EXXONMOBIL CHEMICAL PATENTS INC. 2012-07-12 US disclosed
US-8163854-B2 Preparation of supported silyl-capped silica-bound anion activators and associated catalysts EXXONMOBIL CHEMICAL PATENTS INC. (US) 2012-04-24 US disclosed
US-20110015357-A1 Preparation of Supported Silyl-Capped Silica-Bound Anion Activators and Associated Catalysts EXXONMOBIL CHEMICAL PATENTS INC. 2011-01-20 US disclosed
US-7847038-B2 Preparation of supported silyl-capped silica-bound anion activators and associated catalysts EXXONMOBIL CHEMICAL PATENTS INC. (US) 2010-12-07 US disclosed
US-20100021691-A1 THIN LAYER HAVING COMPOSITION GRADIENT AND PRODUCTION METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-01-28 US disclosed
WO-2009012022-A1 PREPARATION OF SUPPORTED SILYL-CAPPED SILICA SILICA-BOUND ANION ACTIVATORS AND ASSOCIATED CATALYSTS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2009-01-22 WO disclosed
US-20090018290-A1 Preparation of Supported Silyl-Capped Silica-Bound Anion Activators and Associated Catalysts EXXONMOBIL CHEMICAL PATENTS INC. 2009-01-15 US disclosed