SCHEMBL1051763

SCHEMBL1051763

CC1=CC=CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1400770 1.00
SCHEMBL1006515 0.92
SCHEMBL1006517 0.92
SCHEMBL1400960 0.83
SCHEMBL368085 0.83
SCHEMBL27288639 0.81 HDAC3 (0.30)
SCHEMBL9230786 0.81
SCHEMBL11598511 0.81
SCHEMBL29254106 0.79
SCHEMBL8591356 0.78 PTPN1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116284530-B Preparation method and application of butyl rubber 山东京博中聚新材料有限公司 2024-06-07 CN claimed
CN-118005475-A Condensed ring alkane, preparation method thereof and use as jet fuel 青岛科技大学 2024-05-10 CN claimed
CN-116284530-B Preparation method and application of butyl rubber 山东京博中聚新材料有限公司 2024-06-07 CN disclosed
CN-118005475-A Condensed ring alkane, preparation method thereof and use as jet fuel 青岛科技大学 2024-05-10 CN disclosed
CN-116284530-A Preparation method and application of butyl rubber 山东京博中聚新材料有限公司 2023-06-23 CN disclosed
EP-3141538-B1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS VERSUM MAT US LLC (US) 2019-10-30 EP disclosed
EP-2318477-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MAT USA INC (US) 2019-06-05 EP disclosed
EP-3004098-B1 KINASE INHIBITORS CHIESI FARM SPA (IT) 2017-08-09 EP disclosed
EP-3141538-A1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-03-15 EP disclosed
EP-2141141-B1 Improved Process Stability of NBDE Using Substituted Phenol Stabilizers AIR PROD & CHEM (US) 2016-09-28 EP disclosed
EP-1931613-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS (US) 2015-11-11 EP disclosed
US-20090291210-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2009-11-26 US disclosed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
EP-1931746-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
EP-0000534-B1 PROCESS FOR THE PREPARATION OF VINYL OXIRANES BAYER AG (DE) 1982-02-03 EP disclosed
EP-0000534-A1 Process for the preparation of vinyl oxiranes BAYER AG (DE) 1979-02-07 EP disclosed