⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2468049 | 0.94 | — | — | |
| SCHEMBL1049795 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL4659825 | 0.59 | — | — | |
| SCHEMBL30894553 | 0.58 | — | — | |
| SCHEMBL2151842 | 0.53 | TSHR (0.43) | — | |
| SCHEMBL8358538 | 0.53 | TSHR (0.43) | — | |
| SCHEMBL3426362 | 0.53 | — | — | |
| SCHEMBL1913 | 0.53 | — | — | |
| SCHEMBL4062894 | 0.47 | — | — | |
| Water SCHEMBL11756523 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 219 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114516863-B | Imide sulfonate photoacid generator with high acid yield, composition and application | 常州强力电子新材料股份有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-115368285-B | oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-115368286-B | Oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-115368287-B | I-line oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-115368340-B | Oxime sulfonate photoacid generator, resist composition containing oxime sulfonate photoacid generator, electronic device and application of oxime sulfonate photoacid generator | 常州强力先端电子材料有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-115368341-B | Oxime sulfonate compound, resist composition containing oxime sulfonate compound, electronic device and application of oxime sulfonate compound | 常州强力先端电子材料有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-116283945-A | Imide sulfonate photoacid generator, resist composition, application thereof and electronic component | 瑞红(苏州)电子化学品股份有限公司 | 2023-06-23 | — | — | CN | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| CN-115942851-A | Organic electroluminescent device | 北京夏禾科技有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-115942767-A | Organic electroluminescent device | 北京夏禾科技有限公司 | 2023-04-07 | — | — | CN | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| US-5731125-A | FOR FORMING RESIST FILM | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0633499-A1 | Radiation sensitive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-11 | — | — | EP | disclosed |