⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706025 | 0.88 | — | — | |
| SCHEMBL705087 | 0.88 | — | — | |
| SCHEMBL4077644 | 0.83 | — | — | |
| SCHEMBL5834060 | 0.83 | — | — | |
| SCHEMBL703773 | 0.83 | — | — | |
| SCHEMBL5833653 | 0.83 | — | — | |
| SCHEMBL703555 | 0.83 | — | — | |
| SCHEMBL4084501 | 0.83 | — | — | |
| SCHEMBL4081232 | 0.83 | — | — | |
| SCHEMBL27730680 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 759 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| CN-103374708-B | High temperature atomic layer deposition of silicon oxide thin films | 气体产品与化学公司 | 2017-05-17 | — | — | CN | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| EP-1655301-B1 | CYCLIC BIOISOSTERS OF PURINE SYSTEM DERIVATIVES AND A PHARMACEUTICAL COMPOSITION BASED THEREON | ZHILOV VALERY KHAZHMURATOVICH (RU) | 2015-03-11 | — | — | EP | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| CN-103374708-A | High temperature atomic layer deposition of silicon oxide thin films | AIR PROD & CHEM | 2013-10-30 | — | — | CN | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| EP-2074998-B1 | Use of cyclic bioisosteres of purine system derivatives for the treatment of diseases caused by disorders of nitrergic and dopaminergic systems | ZHILOV VALERY KHAZHMURATOVICH (RU) | 2013-10-16 | — | — | EP | claimed |
| US-6040101-A | Carrier particles for use in electrostatic image development and electrostatic image developer | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-03-21 | — | — | US | claimed |
| US-6010757-A | BLEND OF ORGANOMETALLIC COMPOUND AND POLYMER | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-01-04 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-0661246-A1 | Process for preparing refractory molded articles and binders therefor | CADIC CORPORATION (JP) | 1995-07-05 | — | — | EP | disclosed |
| EP-0226208-B1 | INSULATING FILM FOR SEMICONDUCTOR, PRODUCTION OF THE SAME AND LIQUID COMPOSITION FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-11-21 | — | — | EP | disclosed |
| EP-0226208-A2 | Insulating film for semiconductor, production of the same and liquid composition for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-06-24 | — | — | EP | disclosed |