SCHEMBL105282

SCHEMBL105282

CC(C)O[Si](OC(C)C)(C(C)(C)C)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL106946 0.73
SCHEMBL707833 0.73
SCHEMBL429437 0.71
SCHEMBL5005170 0.71
SCHEMBL1052102 0.71
SCHEMBL1314898 0.71
SCHEMBL8953555 0.71
SCHEMBL704771 0.67
SCHEMBL704234 0.67
SCHEMBL704316 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 724 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119119950-A Adhesion promoters for composite materials and methods thereof 波音公司 2024-12-13 CN claimed
CN-116332557-A Multifunctional group type polycarboxylate superplasticizer and preparation method thereof 江苏超力建材科技有限公司 2023-06-27 CN claimed
CN-112126064-A Preparation method of novel solid silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-25 CN claimed
CN-112126067-A Preparation method and application of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2020-12-25 CN claimed
CN-112126065-A Preparation method of solid silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-25 CN claimed
CN-112094414-A Preparation method of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2020-12-18 CN claimed
CN-111925386-A Preparation method of novel silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-11-13 CN claimed
WO-2020022226-A1 COLUMN HARDWARE AND SEPARATION COLUMN, AND METHOD FOR MANUFACTURING SAME ジーエルサイエンス株式会社 2020-01-30 WO claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
JP-4074424-A None JP disclosed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
JP-H0474424-A MANUFACTURE OF SILICON OXIDE FILM OF SEMICONDUCTOR DEVICE KOJUNDO CHEM LAB CO LTD 1992-03-09 JP disclosed
EP-0193280-B1 CATALYST COMPONENT FOR OLEFIN POLYMERIZATION TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1990-03-07 EP disclosed
EP-0195497-B1 CATALYST COMPONENT FOR OLEFIN POLYMERIZATION TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1989-07-12 EP disclosed
EP-0145368-B1 PROCESS FOR PRODUCING PROPYLENE BLOCK COPOLYMERS TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1989-03-08 EP disclosed
US-4072636-A ORGANO-SILICATE MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JA) 1978-02-07 US disclosed